JPS5665975A - Surface treatment of metal - Google Patents

Surface treatment of metal

Info

Publication number
JPS5665975A
JPS5665975A JP14263379A JP14263379A JPS5665975A JP S5665975 A JPS5665975 A JP S5665975A JP 14263379 A JP14263379 A JP 14263379A JP 14263379 A JP14263379 A JP 14263379A JP S5665975 A JPS5665975 A JP S5665975A
Authority
JP
Japan
Prior art keywords
base material
arc
frequency wave
pipe
material pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14263379A
Other languages
Japanese (ja)
Inventor
Akihiro Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP14263379A priority Critical patent/JPS5665975A/en
Publication of JPS5665975A publication Critical patent/JPS5665975A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055Arc discharge
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To clean the surface of metal efficiently, by making uniform cationic stream collide against the whole surface and by making various ion infiltrate into the whole surface by arc discharge without melting base material. CONSTITUTION:Base material pipe 1 made of nonmagnetic material is connected to a cathode, and water-cooled electrode 2 is connected to the anode of an arc source 3 and is inserted into the base material pipe 1. A magnetic coil 4 generates a magnetic field 6 around the pipe 1 by a DC power source 5. High frequency wave of about 10 kHz and low frequency wave of about 10Hz are superimposed on the power source 3. When arc is generated in Ar atmosphere, arc column rotates at a high speed, so that oxide film on the surface is broken. The arc column becomes rigid and constant by the component of high frequency pulse current, and treat the base material surface uniformly by the strong treating power of high peak current. Becauses low frequency wave is applied simultaneously, the speed of the arc column is controlled, arc interruption is prevented, and rise in temp. of base material 1 is also controlled. The whole internal surface is cleaned by moving the base material pipe 1 in the direction of an arrow 7.
JP14263379A 1979-11-02 1979-11-02 Surface treatment of metal Pending JPS5665975A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14263379A JPS5665975A (en) 1979-11-02 1979-11-02 Surface treatment of metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14263379A JPS5665975A (en) 1979-11-02 1979-11-02 Surface treatment of metal

Publications (1)

Publication Number Publication Date
JPS5665975A true JPS5665975A (en) 1981-06-04

Family

ID=15319878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14263379A Pending JPS5665975A (en) 1979-11-02 1979-11-02 Surface treatment of metal

Country Status (1)

Country Link
JP (1) JPS5665975A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62294160A (en) * 1986-06-13 1987-12-21 バルツエルス アクチエンゲゼルシヤフト Thermochemical surface treatment of material in reactive gaseous plasma

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62294160A (en) * 1986-06-13 1987-12-21 バルツエルス アクチエンゲゼルシヤフト Thermochemical surface treatment of material in reactive gaseous plasma

Similar Documents

Publication Publication Date Title
JPS56139286A (en) Pulse arc welding equipment
KR900014639A (en) Microwave Plasma Etching Method and Apparatus
BR9303638A (en) Constructive arrangement introduced in hoods for utility vehicles
JPS5665975A (en) Surface treatment of metal
JPS5681678A (en) Method and apparatus for plasma etching
US3248514A (en) Cathodic arc cleaning electrode
JPS5590533A (en) Low temperature plasma treatment of substrate
JPS5758977A (en) Pulse arc welding machine
RU1695704C (en) Method of treating surface articles by arc discharge in vacuum
JPS5685827A (en) Plasma etching treating method and treatment device
JPS5775422A (en) Manufacture device for thin film
SU1722791A1 (en) Method for polishing bodies of revolution
JPS56123381A (en) Method and device for plasma etching
SU778981A1 (en) Electrochemical treatment method
SU1514525A1 (en) Method of electric discharge machining
JPS6414920A (en) Plasma etching apparatus
JPS5635775A (en) Ion beam etching method
JPS57196520A (en) Rinsing method for epitaxial growing apparatus
JPH06293980A (en) Plasma generator for homogeneous plasma processing
JPS6431421A (en) Microwave plasma treatment device
JPS5731476A (en) Mig welding machine
JPS5647574A (en) Plasma etching apparatus
Wilhelmi et al. Nitriding by Pulsed Glow Discharge
JPS6154110B2 (en)
JPS62297456A (en) Apparatus for pretreating strip