JPS57198258A - Surface treating device - Google Patents
Surface treating deviceInfo
- Publication number
- JPS57198258A JPS57198258A JP8115481A JP8115481A JPS57198258A JP S57198258 A JPS57198258 A JP S57198258A JP 8115481 A JP8115481 A JP 8115481A JP 8115481 A JP8115481 A JP 8115481A JP S57198258 A JPS57198258 A JP S57198258A
- Authority
- JP
- Japan
- Prior art keywords
- works
- chamber
- gas
- valve
- constitution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
PURPOSE:To treat surfaces of fine and deep parts which are heretofore difficult to treat uniformly by providing a gaseous pulsation generating device to a device of heating the works in an evacuated vacuum treatment chamber and treating the surfaces with plasma while introducing gaseous hydrocarbon or the like into the chamber. CONSTITUTION:A device for generating pulsation in a working ionization gas such as hydrocarbon in a treatment chamber 1, for example, a pressure controlling valve 11 of the constitution that can change a set pressure intermittently is provided to a gas introducing pipe 9. When a basket 4 contg. many pieces of the works 7 is contained in the chamber 1, a sluice valve 13 closes, and the inside of the chamber 1 is evacuated; at the same time, electric current is conducted to a heater 10. When the works 7 are heated to prescribed temps. by this processing, said gas is introduced through a pipe 9, and cathode potential is applied to the works 7, and plasma is generated in the chamber 1. The surfaces of the works 7 are carburized, but if the gas is pulsated by operating the valve 11, activated particles enter fine and deep parts 5, 6, thereby treating the surfaces around these parts.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8115481A JPS57198258A (en) | 1981-05-29 | 1981-05-29 | Surface treating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8115481A JPS57198258A (en) | 1981-05-29 | 1981-05-29 | Surface treating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57198258A true JPS57198258A (en) | 1982-12-04 |
Family
ID=13738513
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8115481A Pending JPS57198258A (en) | 1981-05-29 | 1981-05-29 | Surface treating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57198258A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6050923A (en) * | 1983-08-31 | 1985-03-22 | Hitachi Ltd | Method of plasma surface treatment and device therefor |
LU90986B1 (en) * | 2002-11-07 | 2004-05-10 | Plasma Metal S A | Process for nitriding articles in bulk. |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5641371A (en) * | 1979-09-14 | 1981-04-18 | Hitachi Ltd | Surface treatment of metal material by glow discharge |
-
1981
- 1981-05-29 JP JP8115481A patent/JPS57198258A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5641371A (en) * | 1979-09-14 | 1981-04-18 | Hitachi Ltd | Surface treatment of metal material by glow discharge |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6050923A (en) * | 1983-08-31 | 1985-03-22 | Hitachi Ltd | Method of plasma surface treatment and device therefor |
JPH0473287B2 (en) * | 1983-08-31 | 1992-11-20 | Hitachi Ltd | |
LU90986B1 (en) * | 2002-11-07 | 2004-05-10 | Plasma Metal S A | Process for nitriding articles in bulk. |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3108900A (en) | Apparatus and process for producing coatings on metals | |
TW215968B (en) | Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber and method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window | |
SE8702410D0 (en) | PROCEDURE FOR THERMOCHEMICAL SURFACE TREATMENT OF MATERIALS IN A REACTIVE GAS PLASMA | |
IE830747L (en) | Plasma treatment process | |
GB2272995B (en) | Method for making or treating a semiconductor | |
JPS6448421A (en) | Ashing method | |
TW200514866A (en) | Processing apparatus and method | |
WO1996021473A3 (en) | Device and methods for plasma sterilization | |
GEP20012393B (en) | Method and Apparatus for Reducing the By-Products in Carbonaceous Materials | |
MY117325A (en) | Method of heat treating object and apparatus for the same. | |
EP0247397A3 (en) | Apparatus for the surface treatment of work pieces | |
JPS5748226A (en) | Plasma processing method and device for the same | |
GB759694A (en) | Improvements in or relating to methods and apparatus for carrying out processes for the treatment of objects and materials employing electric glow discharges | |
JPS57198258A (en) | Surface treating device | |
US3821026A (en) | Scrap metal recovery method and apparatus | |
JPS55125267A (en) | Surface treating method of improving abrasion resistance and corrosion resistance of iron and steel | |
US3650930A (en) | Glow discharge masking process | |
KR910003767A (en) | Heat treatment device | |
FR2332336A1 (en) | Furnace for ion implantation in metals - suitable for nitriding, carburizing and other treatments | |
JPS5735621A (en) | Heat treatment installation for metal | |
TW350981B (en) | Method and system for plasma-processing | |
JPS5760019A (en) | Heat treatment of metal | |
JPS56158420A (en) | Vapor growth device | |
JPS544571A (en) | Plasma treating apparatus | |
JPS5562159A (en) | Vacuum carburizing method |