NO20011224L - Monoliform silikasol, fremgangsmåte ved fremstilling derav og blekkstråleregistreringsmedium - Google Patents

Monoliform silikasol, fremgangsmåte ved fremstilling derav og blekkstråleregistreringsmedium

Info

Publication number
NO20011224L
NO20011224L NO20011224A NO20011224A NO20011224L NO 20011224 L NO20011224 L NO 20011224L NO 20011224 A NO20011224 A NO 20011224A NO 20011224 A NO20011224 A NO 20011224A NO 20011224 L NO20011224 L NO 20011224L
Authority
NO
Norway
Prior art keywords
monoliform
preparation
recording medium
ink jet
jet recording
Prior art date
Application number
NO20011224A
Other languages
English (en)
Norwegian (no)
Other versions
NO20011224D0 (no
Inventor
Yoshitane Watanabe
Yoshiyuki Kashima
Kiyomi Ema
Yutaka Ohmori
Original Assignee
Nissan Chemical Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Ind Ltd filed Critical Nissan Chemical Ind Ltd
Publication of NO20011224D0 publication Critical patent/NO20011224D0/no
Publication of NO20011224L publication Critical patent/NO20011224L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
    • B41M5/52—Macromolecular coatings
    • B41M5/5218—Macromolecular coatings characterised by inorganic additives, e.g. pigments, clays
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146—After-treatment of sols
    • C01B33/148—Concentration; Drying; Dehydration; Stabilisation; Purification
    • C01B33/1485—Stabilisation, e.g. prevention of gelling; Purification
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/12—Preparation of material for subsequent imaging, e.g. corona treatment, simultaneous coating, pre-treatments

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
NO20011224A 1998-09-10 2001-03-09 Monoliform silikasol, fremgangsmåte ved fremstilling derav og blekkstråleregistreringsmedium NO20011224L (no)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP25634598 1998-09-10
JP27369198 1998-09-28
PCT/JP1999/004860 WO2000015552A1 (fr) 1998-09-10 1999-09-08 Solution colloidale de silice moniliforme, procede de production associe et support d'enregistrement de jets d'encre

Publications (2)

Publication Number Publication Date
NO20011224D0 NO20011224D0 (no) 2001-03-09
NO20011224L true NO20011224L (no) 2001-04-25

Family

ID=26542686

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20011224A NO20011224L (no) 1998-09-10 2001-03-09 Monoliform silikasol, fremgangsmåte ved fremstilling derav og blekkstråleregistreringsmedium

Country Status (9)

Country Link
US (1) US6632489B1 (zh)
EP (1) EP1114794A4 (zh)
JP (1) JP4328935B2 (zh)
KR (1) KR100571624B1 (zh)
CN (1) CN1185164C (zh)
CA (1) CA2343260C (zh)
NO (1) NO20011224L (zh)
TW (1) TW498054B (zh)
WO (1) WO2000015552A1 (zh)

Families Citing this family (75)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002000550A1 (fr) * 2000-06-26 2002-01-03 Asahi Kasei Kabushiki Kaisha Particules inorganiques fines et poreuses
FR2819245B1 (fr) * 2001-01-09 2004-11-26 Clariant Nouvelles suspensions aqueuses de silice colloidale anionique de ph neutre et leur procede de preparation, et leurs applications
TWI349024B (en) * 2002-03-19 2011-09-21 Grace W R & Co Coating composition comprising colloidal silica and glossy ink jet recording sheets prepared therefrom
JP4305627B2 (ja) * 2002-03-26 2009-07-29 日産化学工業株式会社 複合ゾル、その製造法及びインクジェット記録媒体
US6830811B2 (en) 2002-10-02 2004-12-14 Dow Corning Corporation Method of preparing hydrophobic partially aggregated colloidal silica
CA2498627A1 (en) * 2002-10-02 2004-04-15 Dow Corning Corporation Filled silicone composition and cured silicone product
US6750273B2 (en) 2002-10-02 2004-06-15 Dow Corning Corporation Filled silicone composition and cured silicone product
DE60320671T2 (de) * 2002-11-12 2009-06-10 Nippon Paper Industries Co. Ltd. Tintenstrahlaufzeichnungsmedium und herstellungsverfahren dafür
JP3884699B2 (ja) * 2002-11-13 2007-02-21 信越化学工業株式会社 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
JP2004161876A (ja) * 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
JP2004161875A (ja) * 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁間膜及び半導体装置
JP2004161877A (ja) * 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
JP4493320B2 (ja) * 2002-12-12 2010-06-30 日揮触媒化成株式会社 シリカゾルの製造方法およびシリカゾル
TWI238894B (en) * 2003-02-21 2005-09-01 Asahi Kasei Corp Laminate containing silica and application composition for forming porous silica layer
JP4139710B2 (ja) * 2003-03-10 2008-08-27 信越化学工業株式会社 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004269693A (ja) * 2003-03-10 2004-09-30 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物及びその製造方法、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004292641A (ja) * 2003-03-27 2004-10-21 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
ES2282855T3 (es) * 2003-03-31 2007-10-16 Nippon Paper Industries Co., Ltd. Medio para impresion por chorro de tinta.
TWI294361B (en) 2003-03-31 2008-03-11 Jujo Paper Co Ltd Thermally sensitive recording medium
JP2004307694A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置。
JP2004307692A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置
JP2004307693A (ja) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
CN100519414C (zh) 2003-05-12 2009-07-29 日挥触媒化成株式会社 制造透明涂布膜的涂布液与具有透明涂布膜的底材与显示装置
DE60325902D1 (de) * 2003-06-03 2009-03-05 Oji Paper Co Tintenstrahlaufzeichnungsblatt
AU2004266919B2 (en) * 2003-08-26 2010-03-04 Nippon Paper Industries Co., Ltd. Process for producing inkjet recording medium
US7083836B2 (en) * 2003-11-10 2006-08-01 Eastman Kodak Company Ink jet recording element and printing method
US7052749B2 (en) * 2004-01-16 2006-05-30 Eastman Kodak Company Inkjet recording element comprising subbing layer and printing method
US7056562B2 (en) * 2004-01-16 2006-06-06 Eastman Kodak Company Non-porous inkjet recording element and printing method
US7052748B2 (en) * 2004-01-16 2006-05-30 Eastman Kodak Company Mordanted inkjet recording element and printing method
US20060044383A1 (en) * 2004-08-25 2006-03-02 Eastman Kodak Company Inkjet recording element with improved interlayer adhesion and a method of printing
JP2006321875A (ja) * 2005-05-18 2006-11-30 Konica Minolta Holdings Inc 記録液、インクジェットプリンタ及びインクジェット記録方法
JP5082203B2 (ja) * 2005-05-18 2012-11-28 コニカミノルタホールディングス株式会社 水性インク、水性インクの製造方法、インクジェットプリンタ及びインクジェット記録方法
JP4921119B2 (ja) * 2005-11-08 2012-04-25 宇部日東化成株式会社 インク受容膜形成用塗工液、その製造方法、インク受容膜、積層基板、配線材料および電磁波シールド材料
US10227238B2 (en) 2006-04-04 2019-03-12 Ecolab Usa Inc. Production and use of polysilicate particulate materials
JP4193872B2 (ja) * 2006-05-19 2008-12-10 ブラザー工業株式会社 インクジェット記録方法
JP2008038090A (ja) 2006-08-09 2008-02-21 Kao Corp インクジェット記録用水系インク
JP5137521B2 (ja) 2006-10-12 2013-02-06 日揮触媒化成株式会社 金平糖状シリカ系ゾルおよびその製造方法
JP4907317B2 (ja) 2006-11-30 2012-03-28 日揮触媒化成株式会社 金平糖状無機酸化物ゾル、その製造方法および前記ゾルを含む研磨剤
KR101429318B1 (ko) * 2007-02-02 2014-08-11 닛산 가가쿠 고교 가부시키 가이샤 반응성 모노머 분산 실리카 졸, 이의 제조방법, 경화용 조성물 및 이의 경화체
AR066831A1 (es) 2007-06-07 2009-09-16 Akzo Nobel Nv Soles a base de silice
JP5602358B2 (ja) 2007-11-30 2014-10-08 日揮触媒化成株式会社 非球状シリカゾル、その製造方法および研磨用組成物
DE102008041466A1 (de) * 2008-08-22 2010-02-25 Wacker Chemie Ag Wäßrige Dispersionen hydrophober Kieselsäuren
CN101747841A (zh) * 2008-12-05 2010-06-23 安集微电子（上海）有限公司 一种化学机械抛光液
MX339544B (es) * 2008-12-18 2016-05-31 Tenedora Nemak Sa De Cv Metodo y composicion de aglomerante para fabricacion de moldes y/o corazones de arena para fundicion.
US8377194B2 (en) 2010-04-08 2013-02-19 Nalco Company Sulfur containing silica particle
US8333835B2 (en) 2010-04-08 2012-12-18 Nalco Company Sulfur containing silica particle
US8845991B2 (en) 2010-04-08 2014-09-30 Ecolab Usa Inc. Silica particle manufacturing process
US8936772B2 (en) 2010-04-08 2015-01-20 Ecolab Usa Inc. Silica containing particle
JP2013043927A (ja) 2011-08-23 2013-03-04 Sumitomo Rubber Ind Ltd ゴム組成物及び空気入りタイヤ
CN105800622B (zh) * 2011-09-16 2019-07-05 日产化学工业株式会社 被纯化了的活性硅酸液和硅溶胶的制造方法
WO2013052876A1 (en) 2011-10-07 2013-04-11 Nalco Company Gas stream treatment process
JP5529909B2 (ja) * 2012-03-08 2014-06-25 住友ゴム工業株式会社 複合体、ゴム組成物及び空気入りタイヤ
JP5927743B2 (ja) * 2012-06-06 2016-06-01 三菱マテリアル株式会社 低屈折率膜形成用組成物の製造方法及び低屈折率膜の形成方法
JP6037807B2 (ja) * 2012-12-05 2016-12-07 日揮触媒化成株式会社 植物成長促進剤
CN103896287B (zh) * 2012-12-28 2016-04-13 上海新安纳电子科技有限公司 一种非球形二氧化硅溶胶及其制备方法
US10087081B2 (en) 2013-03-08 2018-10-02 Ecolab Usa Inc. Process for producing high solids colloidal silica
CN103408027B (zh) * 2013-07-11 2015-05-13 江苏天恒纳米科技股份有限公司 不规则形貌硅溶胶的制备方法及其应用
PL3036192T3 (pl) 2013-08-23 2019-03-29 Akzo Nobel Chemicals International B.V. Zol krzemionkowy
KR101522623B1 (ko) * 2013-10-30 2015-05-26 주식회사 미림 우수한 기능성을 갖는 농업용 코팅 조성물, 이의 제조 방법 및 이를 함유하는 농업용 코팅 필름
KR101806886B1 (ko) 2013-11-19 2017-12-08 동우 화인켐 주식회사 방현 코팅용 조성물 및 이를 이용한 방현 필름
WO2017015180A1 (en) 2015-07-18 2017-01-26 Ecolab Usa Inc. Chemical additives to improve oil separation in stillage process operations
CN107289463A (zh) * 2016-02-24 2017-10-24 张日龙 一种室内建筑采暖炉
JP6870219B2 (ja) * 2016-06-14 2021-05-12 住友ゴム工業株式会社 シリカの形態制御方法
CN109641185B (zh) * 2016-08-23 2021-08-24 日产化学株式会社 含有异形二氧化硅纳米粒子的气体分离膜
US10619083B2 (en) * 2017-02-03 2020-04-14 Saudi Arabian Oil Company Nanosilica dispersion lost circulation material (LCM)
JP2018145339A (ja) 2017-03-08 2018-09-20 三菱マテリアル株式会社 低屈折率膜形成用液組成物及びこれを用いた低屈折率膜の形成方法
JP7102684B2 (ja) * 2017-03-17 2022-07-20 ブラザー工業株式会社 インクセット、記録方法及び定着剤
JP6968631B2 (ja) * 2017-09-07 2021-11-17 扶桑化学工業株式会社 疎水性シリカ粉末及びトナー樹脂粒子
CN114269687B (zh) 2019-09-06 2024-06-21 富士胶片株式会社 组合物、膜、结构体、滤色器、固体摄像元件及图像显示装置
JP2021065825A (ja) * 2019-10-21 2021-04-30 日揮触媒化成株式会社 有機反応触媒用担体粒子分散液および有機反応触媒
WO2022210175A1 (ja) 2021-03-29 2022-10-06 富士フイルム株式会社 黒色感光性組成物、黒色感光性組成物の製造方法、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、ヘッドライトユニット
CN113511879B (zh) * 2021-09-09 2021-11-30 长沙科航特种织造有限公司 一种石英纤维增强石英基复合材料及其制造方法
KR20240033263A (ko) * 2021-10-18 2024-03-12 미쓰비시마테리알덴시카세이가부시키가이샤 표면 처리 실리카 입자 분산 졸 및 그 제조 방법
CN117177941A (zh) * 2022-01-13 2023-12-05 日产化学株式会社 具有粒度分布的硅溶胶和其制造方法
WO2023154511A1 (en) * 2022-02-14 2023-08-17 Intelligent Concrete, LLC Nanosilica topical treatment compositions for rejuventating deteriorated concrete

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2680721A (en) 1952-03-20 1954-06-08 Du Pont Process of increasing the size of unaggregated silica particles in an aqueous silicasuspension
US2900348A (en) 1954-02-02 1959-08-18 Grace W R & Co Preparation of silica sols
JPS60204390A (ja) 1984-03-29 1985-10-15 Mitsubishi Paper Mills Ltd インクジエツト記録用紙
JPS60219084A (ja) 1984-04-16 1985-11-01 Mitsubishi Paper Mills Ltd インクジエツト用記録媒体
JPS6119389A (ja) 1984-07-06 1986-01-28 Mitsubishi Paper Mills Ltd 記録用シ−ト
US5221497A (en) * 1988-03-16 1993-06-22 Nissan Chemical Industries, Ltd. Elongated-shaped silica sol and method for preparing the same
NO300125B1 (no) * 1988-03-16 1997-04-14 Nissan Chemical Ind Ltd Stabil væskeformig silikasol, samt fremgangsmåte ved fremstilling derav
JP2803134B2 (ja) 1988-03-16 1998-09-24 日産化学工業株式会社 細長い形状のシリカゾル及びその製造法
JPH072430B2 (ja) 1988-12-16 1995-01-18 旭硝子株式会社 記録用シート
US4959113C1 (en) 1989-07-31 2001-03-13 Rodel Inc Method and composition for polishing metal surfaces
JP2926915B2 (ja) * 1990-07-05 1999-07-28 日産化学工業株式会社 細長い形状のシリカゾル及びその製法
JP3120449B2 (ja) 1990-11-29 2000-12-25 東レ株式会社 印刷用記録媒体用シート
JP3198164B2 (ja) 1992-09-09 2001-08-13 三菱製紙株式会社 インクジェット記録用シート
JP3517913B2 (ja) * 1993-10-15 2004-04-12 日産化学工業株式会社 細長い形状のシリカゾルの製造法
JP3441142B2 (ja) 1994-02-04 2003-08-25 日産化学工業株式会社 半導体ウェーハーの研磨方法
JPH07276789A (ja) 1994-04-05 1995-10-24 Fuji Photo Film Co Ltd 記録用シート
DE4413341C2 (de) 1994-04-18 1999-08-26 Continental Ag Meßeinrichtung mit einem Magnetfeldsensor zum berührungslosen Erfassen des lichten Abstandes zwischen zwei Bauteilen und deren Verwendung
SG68005A1 (en) 1996-12-02 1999-10-19 Fujimi Inc Polishing composition
JPH10204416A (ja) 1997-01-21 1998-08-04 Fujimi Inkooporeetetsudo:Kk 研磨用組成物
JPH11256499A (ja) * 1998-01-07 1999-09-21 Tokushu Paper Mfg Co Ltd 電気凝固印刷用の記録シート
JP4132432B2 (ja) * 1999-07-02 2008-08-13 日産化学工業株式会社 研磨用組成物

Also Published As

Publication number Publication date
JP4328935B2 (ja) 2009-09-09
KR100571624B1 (ko) 2006-04-17
NO20011224D0 (no) 2001-03-09
CA2343260A1 (en) 2000-03-23
CN1185164C (zh) 2005-01-19
WO2000015552A1 (fr) 2000-03-23
TW498054B (en) 2002-08-11
EP1114794A1 (en) 2001-07-11
CN1316976A (zh) 2001-10-10
US6632489B1 (en) 2003-10-14
KR20010085771A (ko) 2001-09-07
CA2343260C (en) 2007-05-15
EP1114794A4 (en) 2010-02-24

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