NL6614016A - - Google Patents

Info

Publication number
NL6614016A
NL6614016A NL6614016A NL6614016A NL6614016A NL 6614016 A NL6614016 A NL 6614016A NL 6614016 A NL6614016 A NL 6614016A NL 6614016 A NL6614016 A NL 6614016A NL 6614016 A NL6614016 A NL 6614016A
Authority
NL
Netherlands
Application number
NL6614016A
Other versions
NL153374B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL666614016A priority Critical patent/NL153374B/xx
Priority to DE19671789144 priority patent/DE1789144B2/de
Priority to DE19671789146 priority patent/DE1789146B2/de
Priority to DE19671789145 priority patent/DE1789145B2/de
Priority to DE19671789171 priority patent/DE1789171C2/de
Priority to DE1614283A priority patent/DE1614283C3/de
Priority to NO169941A priority patent/NO125653B/no
Priority to GB44763/67A priority patent/GB1208574A/en
Priority to GB2723870A priority patent/GB1208575A/en
Priority to GB2751670A priority patent/GB1208577A/en
Priority to CH1372567A priority patent/CH469358A/de
Priority to GB2751770A priority patent/GB1208578A/en
Priority to GB2723970A priority patent/GB1208576A/en
Priority to DK488667AA priority patent/DK121913B/da
Priority to AT895167A priority patent/AT280349B/de
Priority to BE704674D priority patent/BE704674A/xx
Priority to SE13610/67A priority patent/SE335177B/xx
Priority to FR1549386D priority patent/FR1549386A/fr
Priority to JP6388367A priority patent/JPS5631893B1/ja
Priority to ES345702A priority patent/ES345702A1/es
Publication of NL6614016A publication Critical patent/NL6614016A/xx
Priority to NL7002384A priority patent/NL159817B/xx
Priority to NL7010208A priority patent/NL7010208A/xx
Priority to DE19712105178 priority patent/DE2105178C3/de
Priority to SE197871A priority patent/SE372139B/xx
Priority to CH222571A priority patent/CH526858A/de
Priority to AT130671A priority patent/AT339959B/de
Priority to FR7105551A priority patent/FR2081017A2/fr
Priority to DE19712133980 priority patent/DE2133980C3/de
Priority to FR7125297A priority patent/FR2098323B2/fr
Priority to JP47104047A priority patent/JPS4939308B1/ja
Priority to JP47104048A priority patent/JPS4939309B1/ja
Priority to JP48051237A priority patent/JPS4923071B1/ja
Priority to JP8957074A priority patent/JPS5434596B1/ja
Priority to US05/549,936 priority patent/US3970486A/en
Priority to JP50046613A priority patent/JPS5134274B1/ja
Priority to JP50067701A priority patent/JPS5838937B1/ja
Publication of NL153374B publication Critical patent/NL153374B/xx
Priority to JP11170477A priority patent/JPS5435071B1/ja

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/32—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
    • H01L21/76205—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO in a region being recessed from the surface, e.g. in a recess, groove, tub or trench region
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76202—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO
    • H01L21/76213—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose
    • H01L21/76216—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using a local oxidation of silicon, e.g. LOCOS, SWAMI, SILO introducing electrical inactive or active impurities in the local oxidation region, e.g. to alter LOCOS oxide growth characteristics or for additional isolation purpose introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
    • H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
    • H01L27/0635—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors and diodes, or resistors, or capacitors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484—Connecting portions
    • H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Element Separation (AREA)
  • Bipolar Transistors (AREA)
  • Formation Of Insulating Films (AREA)
  • Level Indicators Using A Float (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
  • Junction Field-Effect Transistors (AREA)
NL666614016A 1966-10-05 1966-10-05 Werkwijze ter vervaardiging van een halfgeleiderinrichting voorzien van een oxydelaag en halfgeleiderinrichting vervaardigd volgens de werkwijze. NL153374B (nl)

Priority Applications (37)

Application Number Priority Date Filing Date Title
NL666614016A NL153374B (nl) 1966-10-05 1966-10-05 Werkwijze ter vervaardiging van een halfgeleiderinrichting voorzien van een oxydelaag en halfgeleiderinrichting vervaardigd volgens de werkwijze.
DE19671789144 DE1789144B2 (de) 1966-10-05 1967-09-29 Verfahren zum Herstellen einer Halbleiteranordnung
DE19671789146 DE1789146B2 (de) 1966-10-05 1967-09-29 Verfahren zum Herstellen einer Halbleiteranordnung
DE19671789145 DE1789145B2 (de) 1966-10-05 1967-09-29 Verfahren zum Herstellen einer Halbleiteranordnung
DE19671789171 DE1789171C2 (de) 1966-10-05 1967-09-29 Verfahren zum Herstellen einer Halbleiteranordnung
DE1614283A DE1614283C3 (de) 1966-10-05 1967-09-29 Verfahren zum Herstellen einer Halbleiteranordnung
NO169941A NO125653B (de) 1966-10-05 1967-10-02
GB44763/67A GB1208574A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices
GB2723870A GB1208575A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices
GB2751670A GB1208577A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices
CH1372567A CH469358A (de) 1966-10-05 1967-10-02 Verfahren zur Herstellung einer Halbleitervorrichtung und nach diesem Verfahren hergestellte Halbleitervorrichtung
GB2751770A GB1208578A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices
GB2723970A GB1208576A (en) 1966-10-05 1967-10-02 Methods of manufacturing semiconductor devices
DK488667AA DK121913B (da) 1966-10-05 1967-10-02 Fremgangsmåde til fremstilling af et halvlederørgan.
AT895167A AT280349B (de) 1966-10-05 1967-10-03 Verfahren zur Herstellung einer Halbleitervorrichtung
BE704674D BE704674A (de) 1966-10-05 1967-10-04
SE13610/67A SE335177B (de) 1966-10-05 1967-10-04
FR1549386D FR1549386A (de) 1966-10-05 1967-10-05
JP6388367A JPS5631893B1 (de) 1966-10-05 1967-10-05
ES345702A ES345702A1 (es) 1966-10-05 1967-10-30 Un metodo de fabricar un dispositivo semiconductor.
NL7002384A NL159817B (nl) 1966-10-05 1970-02-19 Werkwijze ter vervaardiging van een halfgeleiderinrichting.
NL7010208A NL7010208A (de) 1966-10-05 1970-07-10
DE19712105178 DE2105178C3 (de) 1966-10-05 1971-02-04 Integrierte Halbleiterschaltung
SE197871A SE372139B (de) 1966-10-05 1971-02-16
CH222571A CH526858A (de) 1966-10-05 1971-02-16 Verfahren zur Herstellung einer Halbleitervorrichtung und nach diesem Verfahren hergestellte Halbleitervorrichtung
AT130671A AT339959B (de) 1966-10-05 1971-02-16 Verfahren zum herstellen einer integrierten monolithischen halbleiteranordnung mit versenkter isolierschicht
FR7105551A FR2081017A2 (en) 1966-10-05 1971-02-18 Fabrication of a semiconductor device
DE19712133980 DE2133980C3 (de) 1966-10-05 1971-07-08 Verfahren zur Herstellung einer integrierten Halbleiterschaltung
FR7125297A FR2098323B2 (de) 1966-10-05 1971-07-09
JP47104048A JPS4939309B1 (de) 1966-10-05 1972-10-19
JP47104047A JPS4939308B1 (de) 1966-10-05 1972-10-19
JP48051237A JPS4923071B1 (de) 1966-10-05 1973-05-10
JP8957074A JPS5434596B1 (de) 1966-10-05 1974-08-06
US05/549,936 US3970486A (en) 1966-10-05 1975-02-14 Methods of producing a semiconductor device and a semiconductor device produced by said method
JP50046613A JPS5134274B1 (de) 1966-10-05 1975-04-18
JP50067701A JPS5838937B1 (de) 1966-10-05 1975-06-06
JP11170477A JPS5435071B1 (de) 1966-10-05 1977-09-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL666614016A NL153374B (nl) 1966-10-05 1966-10-05 Werkwijze ter vervaardiging van een halfgeleiderinrichting voorzien van een oxydelaag en halfgeleiderinrichting vervaardigd volgens de werkwijze.

Publications (2)

Publication Number Publication Date
NL6614016A true NL6614016A (de) 1968-04-08
NL153374B NL153374B (nl) 1977-05-16

Family

ID=19797850

Family Applications (1)

Application Number Title Priority Date Filing Date
NL666614016A NL153374B (nl) 1966-10-05 1966-10-05 Werkwijze ter vervaardiging van een halfgeleiderinrichting voorzien van een oxydelaag en halfgeleiderinrichting vervaardigd volgens de werkwijze.

Country Status (13)

Country Link
US (1) US3970486A (de)
JP (8) JPS5631893B1 (de)
AT (1) AT280349B (de)
BE (1) BE704674A (de)
CH (1) CH469358A (de)
DE (1) DE1614283C3 (de)
DK (1) DK121913B (de)
ES (1) ES345702A1 (de)
FR (1) FR1549386A (de)
GB (1) GB1208574A (de)
NL (1) NL153374B (de)
NO (1) NO125653B (de)
SE (1) SE335177B (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2056965A1 (en) * 1969-08-04 1971-05-07 Rca Corp Forming si oxide regions on si semiconductor - substrate
FR2076125A1 (de) * 1970-01-15 1971-10-15 Philips Nv
USRE28653E (en) * 1968-04-23 1975-12-16 Method of fabricating semiconductor devices
US6093620A (en) * 1971-02-02 2000-07-25 National Semiconductor Corporation Method of fabricating integrated circuits with oxidized isolation

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5696402A (en) * 1965-09-28 1997-12-09 Li; Chou H. Integrated circuit device
US6849918B1 (en) * 1965-09-28 2005-02-01 Chou H. Li Miniaturized dielectrically isolated solid state device
US7038290B1 (en) 1965-09-28 2006-05-02 Li Chou H Integrated circuit device
US6979877B1 (en) 1965-09-28 2005-12-27 Li Chou H Solid-state device
NL159817B (nl) * 1966-10-05 1979-03-15 Philips Nv Werkwijze ter vervaardiging van een halfgeleiderinrichting.
NL7010208A (de) * 1966-10-05 1972-01-12 Philips Nv
USRE31580E (en) * 1967-06-08 1984-05-01 U.S. Philips Corporation Insulated gate field-effect transistor comprising a mesa channel and a thicker surrounding oxide
FR2058385A1 (en) * 1969-08-20 1971-05-28 Ibm Diode with schottky barrier
DE1952636C3 (de) * 1969-10-18 1981-04-30 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum Herstellen einer Halbleiteranordnung mit einem Schottky-Kontakt
US3698966A (en) * 1970-02-26 1972-10-17 North American Rockwell Processes using a masking layer for producing field effect devices having oxide isolation
GB1362512A (en) * 1970-06-15 1974-08-07 Hitachi Ltd Semiconductor device and method for manufacture
FR2098325B1 (de) * 1970-07-10 1977-04-22 Philips Nv
NL170902C (nl) * 1970-07-10 1983-01-03 Philips Nv Halfgeleiderinrichting, in het bijzonder monolithische geintegreerde halfgeleiderschakeling.
JPS514756B1 (de) * 1970-10-05 1976-02-14
JPS498183A (de) * 1972-05-10 1974-01-24
FR2188304B1 (de) * 1972-06-15 1977-07-22 Commissariat Energie Atomique
DE2318912A1 (de) * 1972-06-30 1974-01-17 Ibm Integrierte halbleiteranordnung
JPS4960684A (de) * 1972-10-12 1974-06-12
JPS5617734B2 (de) * 1973-07-19 1981-04-24
JPS5159853U (de) * 1974-11-06 1976-05-11
JPS5938741B2 (ja) * 1976-07-31 1984-09-19 ティーディーケイ株式会社 半導体装置およびその作製方法
EP0002107A3 (de) * 1977-11-17 1979-09-05 Rca Corporation Verfahren zur Herstellung einer planaren Halbleiteranordnung
GB2042801B (en) * 1979-02-13 1983-12-14 Standard Telephones Cables Ltd Contacting semicnductor devices
US4441941A (en) * 1980-03-06 1984-04-10 Tokyo Shibaura Denki Kabushiki Kaisha Method for manufacturing a semiconductor device employing element isolation using insulating materials
US4274909A (en) * 1980-03-17 1981-06-23 International Business Machines Corporation Method for forming ultra fine deep dielectric isolation
US4317690A (en) * 1980-06-18 1982-03-02 Signetics Corporation Self-aligned double polysilicon MOS fabrication
US4506435A (en) * 1981-07-27 1985-03-26 International Business Machines Corporation Method for forming recessed isolated regions
US4454646A (en) * 1981-08-27 1984-06-19 International Business Machines Corporation Isolation for high density integrated circuits
US4454647A (en) * 1981-08-27 1984-06-19 International Business Machines Corporation Isolation for high density integrated circuits
JPS5873163A (ja) * 1981-10-27 1983-05-02 Toshiba Corp Ｍｏｓ型半導体装置
US4508757A (en) * 1982-12-20 1985-04-02 International Business Machines Corporation Method of manufacturing a minimum bird's beak recessed oxide isolation structure
GB2151844A (en) * 1983-12-20 1985-07-24 Philips Electronic Associated Semiconductor devices
JPS60115416U (ja) * 1984-01-12 1985-08-05 三菱電機株式会社 フラツトキ−型操作ボ−ド
JPS6133323U (ja) * 1984-07-31 1986-02-28 武夫 大坪 キ−ボ−ド表示板
JPS61126696U (de) * 1985-01-28 1986-08-08
US4630356A (en) * 1985-09-19 1986-12-23 International Business Machines Corporation Method of forming recessed oxide isolation with reduced steepness of the birds' neck
US5019526A (en) * 1988-09-26 1991-05-28 Nippondenso Co., Ltd. Method of manufacturing a semiconductor device having a plurality of elements
US5077235A (en) * 1989-01-24 1991-12-31 Ricoh Comany, Ltd. Method of manufacturing a semiconductor integrated circuit device having SOI structure
US4968641A (en) * 1989-06-22 1990-11-06 Alexander Kalnitsky Method for formation of an isolating oxide layer
US4987099A (en) * 1989-12-29 1991-01-22 North American Philips Corp. Method for selectively filling contacts or vias or various depths with CVD tungsten
JP3111500B2 (ja) * 1991-05-09 2000-11-20 富士電機株式会社 誘電体分離ウエハの製造方法
JPH05283710A (ja) * 1991-12-06 1993-10-29 Intel Corp 高電圧ｍｏｓトランジスタ及びその製造方法
US5418176A (en) * 1994-02-17 1995-05-23 United Microelectronics Corporation Process for producing memory devices having narrow buried N+ lines
US5756385A (en) * 1994-03-30 1998-05-26 Sandisk Corporation Dense flash EEPROM cell array and peripheral supporting circuits formed in deposited field oxide with the use of spacers
US5661053A (en) * 1994-05-25 1997-08-26 Sandisk Corporation Method of making dense flash EEPROM cell array and peripheral supporting circuits formed in deposited field oxide with the use of spacers
US5814875A (en) * 1995-01-31 1998-09-29 Nippon Steel Corporation Semiconductor device and method of manufacturing the same apparatus and method for providing semiconductor devices having a field shield element between devices
US20040144999A1 (en) * 1995-06-07 2004-07-29 Li Chou H. Integrated circuit device
US5747357A (en) 1995-09-27 1998-05-05 Mosel Vitelic, Inc. Modified poly-buffered isolation
US5883566A (en) * 1997-02-24 1999-03-16 International Business Machines Corporation Noise-isolated buried resistor

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Publication number Priority date Publication date Assignee Title
US2981877A (en) * 1959-07-30 1961-04-25 Fairchild Semiconductor Semiconductor device-and-lead structure
US3212162A (en) * 1962-01-05 1965-10-19 Fairchild Camera Instr Co Fabricating semiconductor devices
US3165430A (en) * 1963-01-21 1965-01-12 Siliconix Inc Method of ultra-fine semiconductor manufacture
US3279963A (en) * 1963-07-23 1966-10-18 Ibm Fabrication of semiconductor devices
DE1439737B2 (de) * 1964-10-31 1970-05-06 Telefunken Patentverwertungsgesellschaft Mbh, 7900 Ulm Verfahren zum Herstellen einer Halblei teranordnung
US3484313A (en) * 1965-03-25 1969-12-16 Hitachi Ltd Method of manufacturing semiconductor devices
US3442011A (en) * 1965-06-30 1969-05-06 Texas Instruments Inc Method for isolating individual devices in an integrated circuit monolithic bar
US3479237A (en) * 1966-04-08 1969-11-18 Bell Telephone Labor Inc Etch masks on semiconductor surfaces
US3649386A (en) * 1968-04-23 1972-03-14 Bell Telephone Labor Inc Method of fabricating semiconductor devices
US3550292A (en) * 1968-08-23 1970-12-29 Nippon Electric Co Semiconductor device and method of manufacturing the same
JPS4917069A (de) * 1972-06-10 1974-02-15
JPS5232803B2 (de) * 1972-08-15 1977-08-24

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE28653E (en) * 1968-04-23 1975-12-16 Method of fabricating semiconductor devices
FR2056965A1 (en) * 1969-08-04 1971-05-07 Rca Corp Forming si oxide regions on si semiconductor - substrate
FR2076125A1 (de) * 1970-01-15 1971-10-15 Philips Nv
US6093620A (en) * 1971-02-02 2000-07-25 National Semiconductor Corporation Method of fabricating integrated circuits with oxidized isolation

Also Published As

Publication number Publication date
NL153374B (nl) 1977-05-16
JPS4923071B1 (de) 1974-06-13
US3970486A (en) 1976-07-20
CH469358A (de) 1969-02-28
JPS4939308B1 (de) 1974-10-24
AT280349B (de) 1970-04-10
JPS5134274B1 (de) 1976-09-25
ES345702A1 (es) 1969-02-01
DE1614283A1 (de) 1970-05-27
JPS4939309B1 (de) 1974-10-24
JPS5631893B1 (de) 1981-07-24
DE1614283C3 (de) 1983-03-10
GB1208574A (en) 1970-10-14
BE704674A (de) 1968-04-04
JPS5434596B1 (de) 1979-10-27
JPS5435071B1 (de) 1979-10-31
DK121913B (da) 1971-12-20
FR1549386A (de) 1968-12-13
JPS5838937B1 (de) 1983-08-26
SE335177B (de) 1971-05-17
DE1614283B2 (de) 1975-06-05
NO125653B (de) 1972-10-09

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