NL1018251C2 - Organometallische monoacylalkylfosfinen. - Google Patents
Organometallische monoacylalkylfosfinen. Download PDFInfo
- Publication number
- NL1018251C2 NL1018251C2 NL1018251A NL1018251A NL1018251C2 NL 1018251 C2 NL1018251 C2 NL 1018251C2 NL 1018251 A NL1018251 A NL 1018251A NL 1018251 A NL1018251 A NL 1018251A NL 1018251 C2 NL1018251 C2 NL 1018251C2
- Authority
- NL
- Netherlands
- Prior art keywords
- alkyl
- substituted
- oxide
- unsubstituted
- interrupted
- Prior art date
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- 150000003003 phosphines Chemical class 0.000 title claims description 10
- 125000002524 organometallic group Chemical group 0.000 title description 3
- -1 biphenylyl Chemical group 0.000 claims abstract description 537
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 229
- 150000001875 compounds Chemical class 0.000 claims abstract description 181
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 156
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 147
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 118
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 101
- 150000002367 halogens Chemical class 0.000 claims abstract description 100
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 96
- 239000001257 hydrogen Substances 0.000 claims abstract description 85
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims abstract description 70
- 229910052744 lithium Inorganic materials 0.000 claims abstract description 66
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims abstract description 61
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 53
- 150000002431 hydrogen Chemical class 0.000 claims abstract description 49
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims abstract description 44
- 238000002360 preparation method Methods 0.000 claims abstract description 42
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 36
- 125000004430 oxygen atom Chemical group O* 0.000 claims abstract description 29
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 23
- 125000001624 naphthyl group Chemical group 0.000 claims abstract description 21
- 125000004350 aryl cycloalkyl group Chemical group 0.000 claims abstract description 19
- 125000004070 6 membered heterocyclic group Chemical group 0.000 claims abstract description 18
- 125000002373 5 membered heterocyclic group Chemical group 0.000 claims abstract description 17
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 16
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 8
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims description 93
- 238000006243 chemical reaction Methods 0.000 claims description 72
- 238000000576 coating method Methods 0.000 claims description 58
- 229910052799 carbon Inorganic materials 0.000 claims description 54
- 238000000034 method Methods 0.000 claims description 45
- 239000000463 material Substances 0.000 claims description 43
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 claims description 40
- 229910052757 nitrogen Inorganic materials 0.000 claims description 35
- 150000001266 acyl halides Chemical class 0.000 claims description 34
- 238000004519 manufacturing process Methods 0.000 claims description 33
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims description 30
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 29
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 28
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 23
- 125000003545 alkoxy group Chemical group 0.000 claims description 23
- 125000003118 aryl group Chemical group 0.000 claims description 23
- 239000003999 initiator Substances 0.000 claims description 23
- 239000002904 solvent Substances 0.000 claims description 23
- 238000007639 printing Methods 0.000 claims description 22
- 229910052801 chlorine Inorganic materials 0.000 claims description 20
- 239000000976 ink Substances 0.000 claims description 20
- 229920000642 polymer Polymers 0.000 claims description 20
- 230000008569 process Effects 0.000 claims description 20
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 19
- 239000011593 sulfur Substances 0.000 claims description 19
- 229910000073 phosphorus hydride Inorganic materials 0.000 claims description 18
- 239000000843 powder Substances 0.000 claims description 18
- 229910052794 bromium Inorganic materials 0.000 claims description 17
- 125000005724 cycloalkenylene group Chemical group 0.000 claims description 17
- 238000007254 oxidation reaction Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 17
- 239000000654 additive Substances 0.000 claims description 16
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 16
- 230000003647 oxidation Effects 0.000 claims description 16
- 239000001301 oxygen Substances 0.000 claims description 16
- 239000007858 starting material Substances 0.000 claims description 16
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 claims description 15
- GJVFBWCTGUSGDD-UHFFFAOYSA-L pentamethonium bromide Chemical compound [Br-].[Br-].C[N+](C)(C)CCCCC[N+](C)(C)C GJVFBWCTGUSGDD-UHFFFAOYSA-L 0.000 claims description 15
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 claims description 14
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 14
- 101100167062 Caenorhabditis elegans chch-3 gene Proteins 0.000 claims description 13
- 230000003287 optical effect Effects 0.000 claims description 13
- 150000003568 thioethers Chemical class 0.000 claims description 13
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 claims description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 10
- 238000007645 offset printing Methods 0.000 claims description 10
- REJGOFYVRVIODZ-UHFFFAOYSA-N phosphanium;chloride Chemical compound P.Cl REJGOFYVRVIODZ-UHFFFAOYSA-N 0.000 claims description 10
- 238000007650 screen-printing Methods 0.000 claims description 10
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 9
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims description 8
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 8
- 239000004305 biphenyl Substances 0.000 claims description 8
- 239000002131 composite material Substances 0.000 claims description 8
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 8
- 125000004414 alkyl thio group Chemical group 0.000 claims description 7
- 235000010290 biphenyl Nutrition 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 150000003254 radicals Chemical class 0.000 claims description 7
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 claims description 6
- 239000000835 fiber Substances 0.000 claims description 6
- 125000000623 heterocyclic group Chemical group 0.000 claims description 6
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 claims description 6
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 6
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 claims description 5
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 claims description 5
- 125000001424 substituent group Chemical group 0.000 claims description 5
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 claims description 5
- 238000012360 testing method Methods 0.000 claims description 5
- UUFQTNFCRMXOAE-UHFFFAOYSA-N 1-methylmethylene Chemical compound C[CH] UUFQTNFCRMXOAE-UHFFFAOYSA-N 0.000 claims description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 239000003094 microcapsule Substances 0.000 claims description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 4
- 230000033458 reproduction Effects 0.000 claims description 4
- 125000005504 styryl group Chemical group 0.000 claims description 4
- 125000004202 aminomethyl group Chemical group [H]N([H])C([H])([H])* 0.000 claims description 3
- 125000001188 haloalkyl group Chemical group 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 125000001422 pyrrolinyl group Chemical group 0.000 claims description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 3
- JCXJVPUVTGWSNB-UHFFFAOYSA-N Nitrogen dioxide Chemical compound O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims description 2
- 125000000304 alkynyl group Chemical group 0.000 claims description 2
- 125000000051 benzyloxy group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])O* 0.000 claims description 2
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 claims description 2
- NLFBCYMMUAKCPC-KQQUZDAGSA-N ethyl (e)-3-[3-amino-2-cyano-1-[(e)-3-ethoxy-3-oxoprop-1-enyl]sulfanyl-3-oxoprop-1-enyl]sulfanylprop-2-enoate Chemical compound CCOC(=O)\C=C\SC(=C(C#N)C(N)=O)S\C=C\C(=O)OCC NLFBCYMMUAKCPC-KQQUZDAGSA-N 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims description 2
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 claims description 2
- 125000001064 morpholinomethyl group Chemical group [H]C([H])(*)N1C([H])([H])C([H])([H])OC([H])([H])C1([H])[H] 0.000 claims description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 claims description 2
- 229910018557 Si O Inorganic materials 0.000 claims 1
- 239000013256 coordination polymer Substances 0.000 claims 1
- 150000002642 lithium compounds Chemical class 0.000 claims 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 claims 1
- 239000000543 intermediate Substances 0.000 abstract description 3
- MDDUHVRJJAFRAU-YZNNVMRBSA-N tert-butyl-[(1r,3s,5z)-3-[tert-butyl(dimethyl)silyl]oxy-5-(2-diphenylphosphorylethylidene)-4-methylidenecyclohexyl]oxy-dimethylsilane Chemical compound C1[C@@H](O[Si](C)(C)C(C)(C)C)C[C@H](O[Si](C)(C)C(C)(C)C)C(=C)\C1=C/CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MDDUHVRJJAFRAU-YZNNVMRBSA-N 0.000 description 266
- 150000002148 esters Chemical class 0.000 description 70
- HLVFKOKELQSXIQ-UHFFFAOYSA-N 1-bromo-2-methylpropane Chemical compound CC(C)CBr HLVFKOKELQSXIQ-UHFFFAOYSA-N 0.000 description 60
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 51
- 229910001392 phosphorus oxide Inorganic materials 0.000 description 49
- VSAISIQCTGDGPU-UHFFFAOYSA-N tetraphosphorus hexaoxide Chemical compound O1P(O2)OP3OP1OP2O3 VSAISIQCTGDGPU-UHFFFAOYSA-N 0.000 description 47
- 239000002253 acid Substances 0.000 description 40
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 39
- XBDQKXXYIPTUBI-UHFFFAOYSA-N Propionic acid Substances CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 38
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 35
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 35
- 239000011248 coating agent Substances 0.000 description 21
- TXBIZRLVIDXDGB-UHFFFAOYSA-N 2-methylpropylphosphane Chemical compound CC(C)CP TXBIZRLVIDXDGB-UHFFFAOYSA-N 0.000 description 19
- 239000000460 chlorine Substances 0.000 description 18
- 229910052751 metal Inorganic materials 0.000 description 18
- 239000002184 metal Substances 0.000 description 18
- 239000000243 solution Substances 0.000 description 17
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 16
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 16
- 229920001577 copolymer Polymers 0.000 description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N acetic acid Substances CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 15
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 15
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 15
- 239000000049 pigment Substances 0.000 description 15
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 15
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 14
- 239000010410 layer Substances 0.000 description 14
- 238000001723 curing Methods 0.000 description 13
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
- 125000004450 alkenylene group Chemical group 0.000 description 12
- 239000000178 monomer Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- 229920005862 polyol Polymers 0.000 description 11
- 239000004808 2-ethylhexylester Substances 0.000 description 10
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 10
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 10
- 150000001335 aliphatic alkanes Chemical class 0.000 description 10
- 238000009472 formulation Methods 0.000 description 10
- WOYWLLHHWAMFCB-UHFFFAOYSA-N 2-ethylhexyl acetate Chemical compound CCCCC(CC)COC(C)=O WOYWLLHHWAMFCB-UHFFFAOYSA-N 0.000 description 9
- WHNQTHDJEZTVHS-UHFFFAOYSA-N 3-(1,3-benzothiazol-2-yl)propanoic acid Chemical compound C1=CC=C2SC(CCC(=O)O)=NC2=C1 WHNQTHDJEZTVHS-UHFFFAOYSA-N 0.000 description 9
- IDNNYZOOKGKJBK-UHFFFAOYSA-N CC(C)C[PH2]=O Chemical compound CC(C)C[PH2]=O IDNNYZOOKGKJBK-UHFFFAOYSA-N 0.000 description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 9
- AZHPCFQBBJISDG-UHFFFAOYSA-N ethyl(oxido)phosphanium Chemical compound CC[PH2]=O AZHPCFQBBJISDG-UHFFFAOYSA-N 0.000 description 9
- 229920000728 polyester Polymers 0.000 description 9
- 150000003077 polyols Chemical class 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 8
- DVIDIZXCFDHODG-UHFFFAOYSA-N cyclopentylphosphane Chemical compound PC1CCCC1 DVIDIZXCFDHODG-UHFFFAOYSA-N 0.000 description 8
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 8
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 238000003756 stirring Methods 0.000 description 8
- 239000000725 suspension Substances 0.000 description 8
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 8
- XVZXOLOFWKSDSR-UHFFFAOYSA-N Cc1cc(C)c([C]=O)c(C)c1 Chemical group Cc1cc(C)c([C]=O)c(C)c1 XVZXOLOFWKSDSR-UHFFFAOYSA-N 0.000 description 7
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 7
- 150000001412 amines Chemical class 0.000 description 7
- 239000012965 benzophenone Substances 0.000 description 7
- 239000011230 binding agent Substances 0.000 description 7
- 239000006185 dispersion Substances 0.000 description 7
- 238000004821 distillation Methods 0.000 description 7
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 7
- 239000000975 dye Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 7
- 229910052753 mercury Inorganic materials 0.000 description 7
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- WEYHWRWGAACKIL-UHFFFAOYSA-N pentylphosphane Chemical compound CCCCCP WEYHWRWGAACKIL-UHFFFAOYSA-N 0.000 description 7
- 229920002635 polyurethane Polymers 0.000 description 7
- 239000004814 polyurethane Substances 0.000 description 7
- 229920006395 saturated elastomer Polymers 0.000 description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 7
- XTFIVUDBNACUBN-UHFFFAOYSA-N 1,3,5-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)N1CN([N+]([O-])=O)CN([N+]([O-])=O)C1 XTFIVUDBNACUBN-UHFFFAOYSA-N 0.000 description 6
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 6
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 6
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 6
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 6
- 150000001350 alkyl halides Chemical class 0.000 description 6
- 239000012964 benzotriazole Substances 0.000 description 6
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 6
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 239000007859 condensation product Substances 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- JLHMVTORNNQCRM-UHFFFAOYSA-N ethylphosphine Chemical compound CCP JLHMVTORNNQCRM-UHFFFAOYSA-N 0.000 description 6
- 239000012442 inert solvent Substances 0.000 description 6
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 150000002903 organophosphorus compounds Chemical class 0.000 description 6
- AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 description 6
- 229920000647 polyepoxide Polymers 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000000600 sorbitol Substances 0.000 description 6
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Classifications
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- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
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- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
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- C07F9/50—Organo-phosphines
- C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
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- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
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- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
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- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
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- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/655—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms
- C07F9/65502—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms the oxygen atom being part of a three-membered ring
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
- C08K5/5397—Phosphine oxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
- A61K6/62—Photochemical radical initiators
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- G—PHYSICS
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Wood Science & Technology (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Materials For Photolithography (AREA)
- Polymerization Catalysts (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH11332000 | 2000-06-08 | ||
| CH11332000 | 2000-06-08 |
Publications (2)
| Publication Number | Publication Date |
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| NL1018251A1 NL1018251A1 (nl) | 2001-12-14 |
| NL1018251C2 true NL1018251C2 (nl) | 2002-02-18 |
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| NL1018251A NL1018251C2 (nl) | 2000-06-08 | 2001-06-08 | Organometallische monoacylalkylfosfinen. |
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| MX (1) | MXPA01005780A (https=) |
| NL (1) | NL1018251C2 (https=) |
| TW (1) | TWI268932B (https=) |
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| GB2365430B (en) * | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
| US20030164580A1 (en) * | 2000-09-14 | 2003-09-04 | Karsten Rinker | Acylphosphine oxide photoinitiators in methacrylate casting resins |
| ES2324983T3 (es) | 2001-08-21 | 2009-08-21 | Ciba Holding Inc. | Oxidos y sulfuros de mono- y bis- acilfosfina batocromicos y su utilizacion como fotoiniciadores. |
| CN1589276A (zh) * | 2001-11-20 | 2005-03-02 | 西巴特殊化学品控股有限公司 | 酰基膦及其衍生物的多聚体 |
| WO2006072071A2 (en) | 2004-12-30 | 2006-07-06 | Phoseon Technology Inc. | Methods and systems relating to light sources for use in industrial processes |
| EP2009676B8 (en) | 2002-05-08 | 2012-11-21 | Phoseon Technology, Inc. | A semiconductor materials inspection system |
| BR0312133A (pt) * | 2002-06-11 | 2005-04-05 | Ciba Sc Holding Ag | Formas dìmeras e multìmeras de óxidos de monoacifosfinas e bis-acifosfinas, processo para a preparação das mesmas, bem como composição fotopolimerizável |
| JP5008978B2 (ja) * | 2003-05-23 | 2012-08-22 | チバ ホールディング インコーポレーテッド | 強力接着性表面被覆 |
| US7819550B2 (en) | 2003-10-31 | 2010-10-26 | Phoseon Technology, Inc. | Collection optics for led array with offset hemispherical or faceted surfaces |
| TWI312583B (en) | 2004-03-18 | 2009-07-21 | Phoseon Technology Inc | Micro-reflectors on a substrate for high-density led array |
| EP1814891B1 (en) * | 2004-11-23 | 2011-01-26 | Basf Se | Bisacylphosphanes and their use as photoinitiators; process for preparing acylphosphanes |
| US20060160917A1 (en) * | 2004-12-21 | 2006-07-20 | Seiko Epson Corporation | Ink composition |
| GB2422678B (en) * | 2005-01-25 | 2009-03-11 | Photocentric Ltd | Method of making a photopolymer plate |
| US8115213B2 (en) | 2007-02-08 | 2012-02-14 | Phoseon Technology, Inc. | Semiconductor light sources, systems, and methods |
| EP2107347B1 (en) * | 2008-04-04 | 2016-08-31 | Sensirion AG | Flow detector with a housing |
| DE202008009068U1 (de) * | 2008-04-07 | 2008-09-18 | Sächsische Walzengravur GmbH | Tiefdruck- oder Prägeform als Sleeve oder Zylinder |
| DE102008029195A1 (de) * | 2008-06-19 | 2009-12-24 | Koenig & Bauer Aktiengesellschaft | Druckplatte zum Aufspannen auf einem Plattenzylinder einer Rotationsdruckmaschine |
| US8678612B2 (en) | 2009-04-14 | 2014-03-25 | Phoseon Technology, Inc. | Modular light source |
| US8653737B2 (en) | 2009-04-14 | 2014-02-18 | Phoseon Technology, Inc. | Controller for semiconductor lighting device |
| US8465172B2 (en) | 2009-12-17 | 2013-06-18 | Phoseon Technology, Inc. | Lighting module with diffractive optical element |
| US8669697B2 (en) | 2010-03-11 | 2014-03-11 | Phoseon Technology, Inc. | Cooling large arrays with high heat flux densities |
| US8591078B2 (en) | 2010-06-03 | 2013-11-26 | Phoseon Technology, Inc. | Microchannel cooler for light emitting diode light fixtures |
| KR101580424B1 (ko) * | 2010-06-30 | 2015-12-24 | 디에스엠 아이피 어셋츠 비.브이. | D1479 안정한 액체 비스(아실)포스핀 광 개시제 및 방사선 경화성 조성물에서 이의 용도 |
| US9357592B2 (en) | 2010-11-18 | 2016-05-31 | Phoseon Technology, Inc. | Light source temperature monitor and control |
| GB201021603D0 (en) * | 2010-12-21 | 2011-02-02 | Fujifilm Imaging Colorants Ltd | Inks & printing process |
| US8872137B2 (en) | 2011-09-15 | 2014-10-28 | Phoseon Technology, Inc. | Dual elliptical reflector with a co-located foci for curing optical fibers |
| US9126432B2 (en) | 2011-09-20 | 2015-09-08 | Phoseon Technology, Inc. | Differential Ultraviolet curing using external optical elements |
| JP6017573B2 (ja) | 2011-10-12 | 2016-11-02 | フォセオン テクノロジー, インコーポレイテッドPhoseon Technology, Inc. | 光ファイバーを硬化するための共同設置焦点を有する多重光収集とレンズの組合せ |
| US8823279B2 (en) | 2011-10-27 | 2014-09-02 | Phoseon Technology, Inc. | Smart FET circuit |
| US8931928B2 (en) | 2011-11-01 | 2015-01-13 | Phoseon Technology, Inc. | Removable window frame for lighting module |
| US8851715B2 (en) | 2012-01-13 | 2014-10-07 | Phoseon Technology, Inc. | Lamp ventilation system |
| US8888336B2 (en) | 2012-02-29 | 2014-11-18 | Phoseon Technology, Inc. | Air deflectors for heat management in a lighting module |
| US8678622B2 (en) | 2012-04-27 | 2014-03-25 | Phoseon Technology, Inc. | Wrap-around window for lighting module |
| DE102012212429A1 (de) | 2012-07-16 | 2014-01-16 | Voco Gmbh | Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials |
| CN105284797A (zh) * | 2014-07-14 | 2016-02-03 | 国家电网公司 | 一种微胶囊型缓释驱鸟合剂的制备方法 |
| WO2018144054A1 (en) | 2017-02-06 | 2018-08-09 | Hewlett-Packard Development Company, L.P. | 3d printing |
| CN110177678B (zh) | 2017-02-06 | 2021-08-27 | 惠普发展公司,有限责任合伙企业 | 包含金属双(二硫醇烯)配合物的熔合剂 |
| WO2018194542A1 (en) | 2017-04-17 | 2018-10-25 | Hewlett-Packard Development Company, L.P. | Fusing agent(s) |
| EP3409680B1 (en) * | 2017-05-30 | 2021-01-06 | IGM Group B.V. | Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides |
| TWI782066B (zh) | 2017-08-03 | 2022-11-01 | 德商漢高股份有限及兩合公司 | 可固化的聚矽氧光學透明黏著劑及其用途 |
| WO2019037016A1 (en) * | 2017-08-24 | 2019-02-28 | Henkel IP & Holding GmbH | SILICONE POLYMER PHOTO-INITIATOR AND USES THEREOF |
| CN111527170B (zh) | 2017-12-27 | 2022-12-09 | 汉高股份有限及两合公司 | 光学透明的压敏粘合剂及其用途 |
| EP3861002B1 (en) | 2018-10-01 | 2023-11-29 | Dow Toray Co., Ltd. | Organosilicon compound, method for producing thereof, and use thereof |
| EP3686252A1 (en) * | 2019-01-24 | 2020-07-29 | Agfa-Gevaert Nv | Radiation curable inkjet ink for manufacturing printed circuit boards |
| US12517285B2 (en) * | 2020-05-14 | 2026-01-06 | 3M Innovative Properties Company | Multilayer optical films comprising at least one fluorinated (co)polymer layer made using a fluorinated photoinitiator, and methods of making and using the same |
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| DE2909992A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen |
| DE2909994A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Acylphosphinoxidverbindungen, ihre herstellung und verwendung |
| DE2830927A1 (de) * | 1978-07-14 | 1980-01-31 | Basf Ag | Acylphosphinoxidverbindungen und ihre verwendung |
| DE3020092A1 (de) * | 1980-05-27 | 1981-12-10 | Basf Ag, 6700 Ludwigshafen | Acylphosphinverbindungen und ihre verwendung |
| DE3034697A1 (de) | 1980-09-15 | 1982-05-06 | Basf Ag, 6700 Ludwigshafen | Acylphosphinsulfidverbindungen, ihre herstellung und verwendung |
| DE3139984A1 (de) | 1981-10-08 | 1983-04-28 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von acylphosphinoxiden |
| DE3443221A1 (de) * | 1984-11-27 | 1986-06-05 | ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld | Bisacylphosphinoxide, ihre herstellung und verwendung |
| US5218009A (en) | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
| KR0168316B1 (ko) * | 1989-08-04 | 1999-03-30 | 시바 스페셜티 케미칼스 홀딩 인코포레이티드 | 모노-및 디-아실포스핀 옥사이드 |
| ES2098260T3 (es) * | 1989-08-04 | 1997-05-01 | Ciba Geigy Ag | Oxidos de mono- y diacilfosfina. |
| US5368985A (en) | 1991-01-14 | 1994-11-29 | Ciba-Geigy Corporation | Bisacylphosphine sulfides |
| EP0495752B1 (de) * | 1991-01-14 | 1995-03-01 | Ciba-Geigy Ag | Bisacylphosphinsulfide |
| EP0495751A1 (de) * | 1991-01-14 | 1992-07-22 | Ciba-Geigy Ag | Bisacylphosphine |
| GB9104050D0 (en) * | 1991-02-27 | 1991-04-17 | Ciba Geigy Ag | Compounds |
| RU2091385C1 (ru) * | 1991-09-23 | 1997-09-27 | Циба-Гейги АГ | Бисацилфосфиноксиды, состав и способ нанесения покрытий |
| ES2059261B1 (es) | 1992-10-08 | 1995-11-16 | Ciba Geigy Ag | Alquil-bisacilfosfinoxidos. |
| ZA941879B (en) | 1993-03-18 | 1994-09-19 | Ciba Geigy | Curing compositions containing bisacylphosphine oxide photoinitiators |
| TW381106B (en) | 1994-09-02 | 2000-02-01 | Ciba Sc Holding Ag | Alkoxyphenyl-substituted bisacylphosphine oxides |
| CA2197787A1 (en) | 1994-09-08 | 1996-03-14 | David George Leppard | Novel acylphosphine oxides |
| US5744511A (en) * | 1995-04-19 | 1998-04-28 | Tokuyama Corporation | Visible ray polymerization initiator and visible ray polymerizable composition |
| CH691970A5 (de) | 1996-03-04 | 2001-12-14 | Ciba Sc Holding Ag | Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen. |
| SG53043A1 (en) | 1996-08-28 | 1998-09-28 | Ciba Geigy Ag | Molecular complex compounds as photoinitiators |
| JPH11199610A (ja) * | 1998-01-16 | 1999-07-27 | Showa Denko Kk | 光硬化性組成物及び組成物中のビスアシルホスフィンオキサイド系化合物の安定化方法 |
| DE19907957A1 (de) | 1998-02-27 | 1999-09-02 | Ciba Geigy Ag | Pigmentierte photohärtbare Zusammensetzung |
| DE19812859A1 (de) * | 1998-03-24 | 1999-09-30 | Basf Ag | Photoinitiatorgemische |
| JP4265871B2 (ja) * | 1998-11-30 | 2009-05-20 | チバ ホールディング インコーポレーテッド | アシルホスフィン類、アシルオキシド類およびアシルスルフィド類の製造方法 |
| EP1106627B1 (en) | 1999-12-08 | 2003-10-29 | Ciba SC Holding AG | Novel phosphine oxide photoinitiator systems and curable compositions with low color |
| JP2001200007A (ja) * | 2000-01-19 | 2001-07-24 | Shin Etsu Chem Co Ltd | 光硬化性樹脂組成物及び光ファイバー用被覆材 |
| GB2360283B (en) * | 2000-02-08 | 2002-08-21 | Ciba Sc Holding Ag | Monoacylarylphosphines and acylphosphine oxides and sulphides |
| GB2365430B (en) * | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
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2001
- 2001-05-24 GB GB0112580A patent/GB2365430B/en not_active Expired - Fee Related
- 2001-05-31 US US09/871,373 patent/US6737549B2/en not_active Expired - Fee Related
- 2001-06-05 DE DE10127171A patent/DE10127171A1/de not_active Withdrawn
- 2001-06-06 CA CA002349829A patent/CA2349829A1/en not_active Abandoned
- 2001-06-06 TW TW090113664A patent/TWI268932B/zh not_active IP Right Cessation
- 2001-06-07 BE BE2001/0389A patent/BE1014218A5/fr not_active IP Right Cessation
- 2001-06-07 IT IT2001MI001201A patent/ITMI20011201A1/it unknown
- 2001-06-07 KR KR1020010031746A patent/KR100829076B1/ko not_active Expired - Fee Related
- 2001-06-07 CN CNB011208988A patent/CN1198831C/zh not_active Expired - Fee Related
- 2001-06-07 FR FR0107438A patent/FR2810041B1/fr not_active Expired - Fee Related
- 2001-06-07 ES ES200101326A patent/ES2194584B1/es not_active Expired - Fee Related
- 2001-06-08 NL NL1018251A patent/NL1018251C2/nl not_active IP Right Cessation
- 2001-06-08 JP JP2001174045A patent/JP4850353B2/ja not_active Expired - Fee Related
- 2001-06-08 BR BRPI0102319-5A patent/BR0102319B1/pt not_active IP Right Cessation
- 2001-06-08 MX MXPA01005780A patent/MXPA01005780A/es active IP Right Grant
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2002
- 2002-10-25 US US10/280,820 patent/US6969733B2/en not_active Expired - Fee Related
- 2002-10-25 US US10/280,819 patent/US7026017B2/en not_active Expired - Fee Related
-
2011
- 2011-06-15 JP JP2011133344A patent/JP2011251965A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2810041A1 (fr) | 2001-12-14 |
| NL1018251A1 (nl) | 2001-12-14 |
| JP4850353B2 (ja) | 2012-01-11 |
| BE1014218A5 (fr) | 2003-06-03 |
| JP2002069085A (ja) | 2002-03-08 |
| US20030139485A1 (en) | 2003-07-24 |
| TWI268932B (en) | 2006-12-21 |
| CA2349829A1 (en) | 2001-12-08 |
| CN1198831C (zh) | 2005-04-27 |
| GB2365430B (en) | 2002-08-28 |
| BR0102319A (pt) | 2002-05-28 |
| KR100829076B1 (ko) | 2008-05-14 |
| US6969733B2 (en) | 2005-11-29 |
| DE10127171A1 (de) | 2001-12-13 |
| ES2194584A1 (es) | 2003-11-16 |
| ES2194584B1 (es) | 2005-03-16 |
| KR20010111021A (ko) | 2001-12-15 |
| FR2810041B1 (fr) | 2009-04-17 |
| GB0112580D0 (en) | 2001-07-18 |
| US6737549B2 (en) | 2004-05-18 |
| GB2365430A (en) | 2002-02-20 |
| US7026017B2 (en) | 2006-04-11 |
| US20020026049A1 (en) | 2002-02-28 |
| BR0102319B1 (pt) | 2012-05-29 |
| US20030130370A1 (en) | 2003-07-10 |
| MXPA01005780A (es) | 2008-02-26 |
| ITMI20011201A1 (it) | 2002-12-07 |
| CN1329005A (zh) | 2002-01-02 |
| JP2011251965A (ja) | 2011-12-15 |
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| AD1B | A search report has been drawn up | ||
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| V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20140101 |