NL1010935C2 - Halfgeleiderinrichting gebruikmakend van een polymeerbevattend fotomasker, en wijze voor de bereiding ervan. - Google Patents

Halfgeleiderinrichting gebruikmakend van een polymeerbevattend fotomasker, en wijze voor de bereiding ervan. Download PDF

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Publication number
NL1010935C2
NL1010935C2 NL1010935A NL1010935A NL1010935C2 NL 1010935 C2 NL1010935 C2 NL 1010935C2 NL 1010935 A NL1010935 A NL 1010935A NL 1010935 A NL1010935 A NL 1010935A NL 1010935 C2 NL1010935 C2 NL 1010935C2
Authority
NL
Netherlands
Prior art keywords
norbornene
carboxylate
formula
polymer
butyl
Prior art date
Application number
NL1010935A
Other languages
English (en)
Dutch (nl)
Other versions
NL1010935A1 (nl
Inventor
Jae Chang Jung
Cheol Kyu Bok
Min Ho Jung
Ki Ho Baik
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Publication of NL1010935A1 publication Critical patent/NL1010935A1/xx
Application granted granted Critical
Publication of NL1010935C2 publication Critical patent/NL1010935C2/nl

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/08—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having condensed rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00—Preparation of carboxylic acid esters
    • C07C67/30—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group
    • C07C67/333—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton
    • C07C67/343—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms
    • C07C67/347—Preparation of carboxylic acid esters by modifying the acid moiety of the ester, such modification not being an introduction of an ester group by isomerisation; by change of size of the carbon skeleton by increase in the number of carbon atoms by addition to unsaturated carbon-to-carbon bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/74—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C69/753—Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring of polycyclic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/04—Anhydrides, e.g. cyclic anhydrides
    • C08F222/06—Maleic anhydride

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
NL1010935A 1997-12-31 1998-12-31 Halfgeleiderinrichting gebruikmakend van een polymeerbevattend fotomasker, en wijze voor de bereiding ervan. NL1010935C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019970081403A KR100520148B1 (ko) 1997-12-31 1997-12-31 신규한바이시클로알켄유도체와이를이용한포토레지스트중합체및이중합체를함유한포토레지스트조성물
KR19970081403 1997-12-31

Publications (2)

Publication Number Publication Date
NL1010935A1 NL1010935A1 (nl) 1999-07-01
NL1010935C2 true NL1010935C2 (nl) 1999-10-28

Family

ID=19530560

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1010935A NL1010935C2 (nl) 1997-12-31 1998-12-31 Halfgeleiderinrichting gebruikmakend van een polymeerbevattend fotomasker, en wijze voor de bereiding ervan.

Country Status (10)

Country Link
US (2) US6312865B1 (zh)
JP (1) JP4183815B2 (zh)
KR (1) KR100520148B1 (zh)
CN (1) CN1129166C (zh)
DE (1) DE19860767A1 (zh)
FR (1) FR2773152B1 (zh)
GB (1) GB2332902B (zh)
IT (1) IT1305110B1 (zh)
NL (1) NL1010935C2 (zh)
TW (1) TW432255B (zh)

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TWI683852B (zh) 2017-12-29 2020-02-01 財團法人工業技術研究院 組成物、包含其之絕緣材料及其製法

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Also Published As

Publication number Publication date
US20010053834A1 (en) 2001-12-20
FR2773152B1 (fr) 2004-09-10
JPH11286469A (ja) 1999-10-19
GB9828031D0 (en) 1999-02-10
NL1010935A1 (nl) 1999-07-01
DE19860767A1 (de) 1999-07-15
FR2773152A1 (fr) 1999-07-02
CN1129166C (zh) 2003-11-26
IT1305110B1 (it) 2001-04-10
CN1221969A (zh) 1999-07-07
GB2332902A (en) 1999-07-07
KR19990061148A (ko) 1999-07-26
ITTO981115A0 (it) 1998-12-30
US6312865B1 (en) 2001-11-06
JP4183815B2 (ja) 2008-11-19
TW432255B (en) 2001-05-01
GB2332902B (en) 2003-03-26
ITTO981115A1 (it) 2000-06-30
US6632903B2 (en) 2003-10-14
KR100520148B1 (ko) 2006-05-12

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