NL1008443C2 - Hoogsmeltende polyamidesamenstelling voor electronicatoepassingen. - Google Patents

Hoogsmeltende polyamidesamenstelling voor electronicatoepassingen. Download PDF

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Publication number
NL1008443C2
NL1008443C2 NL1008443A NL1008443A NL1008443C2 NL 1008443 C2 NL1008443 C2 NL 1008443C2 NL 1008443 A NL1008443 A NL 1008443A NL 1008443 A NL1008443 A NL 1008443A NL 1008443 C2 NL1008443 C2 NL 1008443C2
Authority
NL
Netherlands
Prior art keywords
polyamide
composition according
polyamide composition
aliphatic
compound
Prior art date
Application number
NL1008443A
Other languages
English (en)
Dutch (nl)
Inventor
Johannes Tijssen
Wilhelmus Josephus Maria Sour
Hubertus Gerardus Joz Havenith
Original Assignee
Dsm Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL1008443A priority Critical patent/NL1008443C2/nl
Application filed by Dsm Nv filed Critical Dsm Nv
Priority to AU28603/99A priority patent/AU2860399A/en
Priority to JP2000534608A priority patent/JP4335443B2/ja
Priority to DE69900783T priority patent/DE69900783T2/de
Priority to CNB998054828A priority patent/CN1134508C/zh
Priority to EP99909397A priority patent/EP1060215B1/fr
Priority to PCT/NL1999/000109 priority patent/WO1999045070A1/fr
Priority to KR1020007009628A priority patent/KR100572799B1/ko
Priority to TW088103345A priority patent/TW574316B/zh
Application granted granted Critical
Publication of NL1008443C2 publication Critical patent/NL1008443C2/nl
Priority to US09/654,472 priority patent/US6441072B1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4803Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/02Halogenated hydrocarbons
    • C08K5/03Halogenated hydrocarbons aromatic, e.g. C6H5-CH2-Cl
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • C08L77/06Polyamides derived from polyamines and polycarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L25/00Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
    • C08L25/18Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C08L67/02Polyesters derived from dicarboxylic acids and dihydroxy compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
NL1008443A 1998-03-02 1998-03-02 Hoogsmeltende polyamidesamenstelling voor electronicatoepassingen. NL1008443C2 (nl)

Priority Applications (10)

Application Number Priority Date Filing Date Title
NL1008443A NL1008443C2 (nl) 1998-03-02 1998-03-02 Hoogsmeltende polyamidesamenstelling voor electronicatoepassingen.
JP2000534608A JP4335443B2 (ja) 1998-03-02 1999-03-02 電子用途のための高融点ポリアミド組成物
DE69900783T DE69900783T2 (de) 1998-03-02 1999-03-02 Hochschmelzende polyamidzusammensetzungen für den elektronikbereich
CNB998054828A CN1134508C (zh) 1998-03-02 1999-03-02 电子用途高熔点聚酰胺组合物
AU28603/99A AU2860399A (en) 1998-03-02 1999-03-02 High-melting polyamide composition for electronic applications
EP99909397A EP1060215B1 (fr) 1998-03-02 1999-03-02 Composition polyamide a point de fusion eleve pour applications electroniques
PCT/NL1999/000109 WO1999045070A1 (fr) 1998-03-02 1999-03-02 Composition polyamide a point de fusion eleve pour applications electroniques
KR1020007009628A KR100572799B1 (ko) 1998-03-02 1999-03-02 전자부품에 사용되는 고-용융점 폴리아미드 조성물
TW088103345A TW574316B (en) 1998-03-02 1999-03-02 High-melting polyamide composition for electronic applications
US09/654,472 US6441072B1 (en) 1998-03-02 2000-09-01 High-melting polyamide composition for electronic applications

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1008443 1998-03-02
NL1008443A NL1008443C2 (nl) 1998-03-02 1998-03-02 Hoogsmeltende polyamidesamenstelling voor electronicatoepassingen.

Publications (1)

Publication Number Publication Date
NL1008443C2 true NL1008443C2 (nl) 1999-09-03

Family

ID=19766628

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1008443A NL1008443C2 (nl) 1998-03-02 1998-03-02 Hoogsmeltende polyamidesamenstelling voor electronicatoepassingen.

Country Status (10)

Country Link
US (1) US6441072B1 (fr)
EP (1) EP1060215B1 (fr)
JP (1) JP4335443B2 (fr)
KR (1) KR100572799B1 (fr)
CN (1) CN1134508C (fr)
AU (1) AU2860399A (fr)
DE (1) DE69900783T2 (fr)
NL (1) NL1008443C2 (fr)
TW (1) TW574316B (fr)
WO (1) WO1999045070A1 (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL136965A0 (en) * 2000-06-22 2001-06-14 Bromine Compounds Ltd Flame-retarded polyamides
US6956099B2 (en) * 2003-03-20 2005-10-18 Arizona Chemical Company Polyamide-polyether block copolymer
EP1479728A1 (fr) * 2003-05-22 2004-11-24 DSM IP Assets B.V. Composition de polyamide ignifugée
DE102004054389A1 (de) * 2004-11-11 2006-05-18 Rehau Ag + Co. Polymere Werkstoffzusammensetzung
EP1683830A1 (fr) * 2005-01-12 2006-07-26 DSM IP Assets B.V. Composition à mouler thermostabilisée
EP1681313A1 (fr) * 2005-01-17 2006-07-19 DSM IP Assets B.V. Composition à mouler thermostabilisée
US8455587B2 (en) 2006-12-20 2013-06-04 Toyo Boseki Kabushiki Kaisha Crystalline polyamide-type resin composition
JP5634155B2 (ja) * 2009-07-29 2014-12-03 旭化成ケミカルズ株式会社 ポリアミド組成物
KR101738805B1 (ko) * 2013-09-27 2017-05-22 아사히 가세이 케미칼즈 가부시키가이샤 폴리아미드 수지 조성물 및 성형품
ES2767296T3 (es) 2013-11-28 2020-06-17 Lanxess Deutschland Gmbh Composiciones de poliamida
KR101685771B1 (ko) * 2013-12-10 2016-12-13 주식회사 엘지화학 할로겐계 난연 유리섬유 강화 폴리아미드 수지 조성물, 및 제조방법
BR112019002526B1 (pt) 2016-08-08 2022-09-27 Ticona Llc Composição polimérica termicamente condutora para um dissipador de calor
US20200115551A1 (en) * 2016-12-22 2020-04-16 Dsm Ip Assets B.V. Improved heat and electrically resistive thermoplastic resin compositions
WO2019122139A1 (fr) * 2017-12-20 2019-06-27 Rhodia Operations Composé de moulage de polyamide à haute résistance à la chaleur
CN111875957A (zh) * 2020-06-29 2020-11-03 金发科技股份有限公司 一种聚酰胺组合物及其制备方法和应用

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0172259A2 (fr) * 1983-04-13 1986-02-26 Mitsubishi Gas Chemical Company, Inc. Composition ignifugée de résine de polyamide renforcée par des fibres
EP0481558A1 (fr) * 1990-10-15 1992-04-22 Dsm N.V. Composition de polyamide et de polyester aromatique
WO1996025463A1 (fr) * 1995-02-16 1996-08-22 Dsm N.V. Composition a base de polyamide 4.6

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5256718A (en) * 1990-02-14 1993-10-26 Mitsui Petrochemical Industries, Ltd. Flame retardant polyamide thermoplastic resin composition
JPH04202459A (ja) * 1990-11-30 1992-07-23 Polyplastics Co 難燃性ポリエステル樹脂組成物
US5852165A (en) * 1994-05-31 1998-12-22 Ube Industries, Ltd. Terpolymer polyamide, polyamide resin composition containing the same, and automotive parts obtaining from these
JPH083327A (ja) * 1994-06-21 1996-01-09 Japan Synthetic Rubber Co Ltd コネクター
US5773500A (en) * 1996-05-14 1998-06-30 Amoco Corporation Flame retardant high temperature polyphthalamides having improved thermal stability
US5863974A (en) * 1997-01-28 1999-01-26 General Electric Company Flame retardant polyamide composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0172259A2 (fr) * 1983-04-13 1986-02-26 Mitsubishi Gas Chemical Company, Inc. Composition ignifugée de résine de polyamide renforcée par des fibres
EP0481558A1 (fr) * 1990-10-15 1992-04-22 Dsm N.V. Composition de polyamide et de polyester aromatique
WO1996025463A1 (fr) * 1995-02-16 1996-08-22 Dsm N.V. Composition a base de polyamide 4.6

Also Published As

Publication number Publication date
EP1060215B1 (fr) 2002-01-09
KR100572799B1 (ko) 2006-04-19
KR20010041472A (ko) 2001-05-25
AU2860399A (en) 1999-09-20
JP4335443B2 (ja) 2009-09-30
DE69900783D1 (de) 2002-02-28
TW574316B (en) 2004-02-01
US6441072B1 (en) 2002-08-27
EP1060215A1 (fr) 2000-12-20
CN1134508C (zh) 2004-01-14
WO1999045070A1 (fr) 1999-09-10
CN1298428A (zh) 2001-06-06
DE69900783T2 (de) 2002-09-12
JP2002505365A (ja) 2002-02-19

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Effective date: 20041001