MY177997A - Sputtering target for forming magnetic recording film and method for producing same - Google Patents

Sputtering target for forming magnetic recording film and method for producing same

Info

Publication number
MY177997A
MY177997A MYPI2016701306A MYPI2016701306A MY177997A MY 177997 A MY177997 A MY 177997A MY PI2016701306 A MYPI2016701306 A MY PI2016701306A MY PI2016701306 A MYPI2016701306 A MY PI2016701306A MY 177997 A MY177997 A MY 177997A
Authority
MY
Malaysia
Prior art keywords
sputtering target
magnetic recording
recording film
producing same
forming magnetic
Prior art date
Application number
MYPI2016701306A
Other languages
English (en)
Inventor
Shin-Ichi Ogino
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY177997A publication Critical patent/MY177997A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/04—Alloys based on a platinum group metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C2202/00—Physical properties
    • C22C2202/02—Magnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
MYPI2016701306A 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same MY177997A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013241537 2013-11-22

Publications (1)

Publication Number Publication Date
MY177997A true MY177997A (en) 2020-09-29

Family

ID=53179455

Family Applications (2)

Application Number Title Priority Date Filing Date
MYPI2016701306A MY177997A (en) 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same
MYPI2019002518A MY191633A (en) 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same

Family Applications After (1)

Application Number Title Priority Date Filing Date
MYPI2019002518A MY191633A (en) 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same

Country Status (6)

Country Link
JP (2) JP6125661B2 (ja)
CN (2) CN105793465B (ja)
MY (2) MY177997A (ja)
SG (1) SG11201602163YA (ja)
TW (1) TWI642799B (ja)
WO (1) WO2015076190A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023079857A1 (ja) * 2021-11-05 2023-05-11 Ｊｘ金属株式会社 Ｆｅ－Ｐｔ－Ｃ系スパッタリングターゲット部材、スパッタリングターゲット組立品、成膜方法、及びスパッタリングターゲット部材の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2610575B2 (ja) * 1993-11-25 1997-05-14 株式会社 ジャパンエナジー Ｗ−Ｔｉ合金ターゲット
US20070189916A1 (en) * 2002-07-23 2007-08-16 Heraeus Incorporated Sputtering targets and methods for fabricating sputtering targets having multiple materials
KR100470151B1 (ko) * 2002-10-29 2005-02-05 한국과학기술원 ＦｅＰｔＣ 박막을 이용한 고밀도 자기기록매체 및 그제조방법
JP5590322B2 (ja) * 2010-11-12 2014-09-17 三菱マテリアル株式会社 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法
CN102087858B (zh) * 2010-11-26 2012-07-18 山西师范大学 一种梯度复合磁记录介质及其制备方法
US9945026B2 (en) * 2010-12-20 2018-04-17 Jx Nippon Mining & Metals Corporation Fe-Pt-based sputtering target with dispersed C grains
JP5041262B2 (ja) * 2011-01-31 2012-10-03 三菱マテリアル株式会社 磁気記録媒体膜形成用スパッタリングターゲットおよびその製造方法
JP5912559B2 (ja) * 2011-03-30 2016-04-27 田中貴金属工業株式会社 ＦｅＰｔ−Ｃ系スパッタリングターゲットの製造方法
WO2013046882A1 (ja) * 2011-09-26 2013-04-04 Jx日鉱日石金属株式会社 Ｆｅ－Ｐｔ－Ｃ系スパッタリングターゲット
JP6212419B2 (ja) * 2014-03-17 2017-10-11 株式会社Ｓｕｂａｒｕ エンジンの排気凝縮水排出装置

Also Published As

Publication number Publication date
JP2017197840A (ja) 2017-11-02
CN109943814B (zh) 2021-04-20
JPWO2015076190A1 (ja) 2017-03-16
CN109943814A (zh) 2019-06-28
CN105793465B (zh) 2019-03-22
TWI642799B (zh) 2018-12-01
SG11201602163YA (en) 2016-04-28
JP6125661B2 (ja) 2017-05-17
MY191633A (en) 2022-07-04
WO2015076190A1 (ja) 2015-05-28
TW201531575A (zh) 2015-08-16
CN105793465A (zh) 2016-07-20
JP6484276B2 (ja) 2019-03-13

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