SG11201408794VA - Fe-Co ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING SAME, AND SOFT MAGNETIC THIN FILM LAYER AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING SAME - Google Patents

Fe-Co ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING SAME, AND SOFT MAGNETIC THIN FILM LAYER AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING SAME

Info

Publication number
SG11201408794VA
SG11201408794VA SG11201408794VA SG11201408794VA SG11201408794VA SG 11201408794V A SG11201408794V A SG 11201408794VA SG 11201408794V A SG11201408794V A SG 11201408794VA SG 11201408794V A SG11201408794V A SG 11201408794VA SG 11201408794V A SG11201408794V A SG 11201408794VA
Authority
SG
Singapore
Prior art keywords
same
thin film
recording medium
film layer
target material
Prior art date
Application number
SG11201408794VA
Inventor
Hiroyuki Hasegawa
Toshiyuki Sawada
Noriaki Matsubara
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of SG11201408794VA publication Critical patent/SG11201408794VA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
    • G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0433—Nickel- or cobalt-based alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor
SG11201408794VA 2012-08-14 2013-08-12 Fe-Co ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING SAME, AND SOFT MAGNETIC THIN FILM LAYER AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING SAME SG11201408794VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012179811A JP6050050B2 (en) 2012-08-14 2012-08-14 Fe-Co alloy sputtering target material and method for producing the same
PCT/JP2013/071794 WO2014027636A1 (en) 2012-08-14 2013-08-12 Fe-Co ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING SAME, AND SOFT MAGNETIC THIN FILM LAYER AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING SAME

Publications (1)

Publication Number Publication Date
SG11201408794VA true SG11201408794VA (en) 2015-02-27

Family

ID=50285930

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201408794VA SG11201408794VA (en) 2012-08-14 2013-08-12 Fe-Co ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING SAME, AND SOFT MAGNETIC THIN FILM LAYER AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING SAME

Country Status (6)

Country Link
JP (1) JP6050050B2 (en)
CN (1) CN104508167B (en)
MY (1) MY167435A (en)
SG (1) SG11201408794VA (en)
TW (1) TWI494443B (en)
WO (1) WO2014027636A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6801168B2 (en) * 2014-06-27 2020-12-16 三菱マテリアル株式会社 Sputtering target, optical functional film, and laminated wiring film
JP6483803B2 (en) 2015-03-04 2019-03-20 Ｊｘ金属株式会社 Magnetic material sputtering target and manufacturing method thereof
WO2016157922A1 (en) * 2015-03-27 2016-10-06 日立金属株式会社 Soft magnetic film and sputtering target for forming soft magnetic film
JP6784733B2 (en) * 2018-08-20 2020-11-11 山陽特殊製鋼株式会社 Co-based alloy for soft magnetic layer of magnetic recording medium

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4331182B2 (en) * 2006-04-14 2009-09-16 山陽特殊製鋼株式会社 Soft magnetic target material
US20070253103A1 (en) * 2006-04-27 2007-11-01 Heraeus, Inc. Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target
JP4907259B2 (en) * 2006-08-16 2012-03-28 山陽特殊製鋼株式会社 FeCoB-based target material with Cr added
JP2008121071A (en) * 2006-11-13 2008-05-29 Sanyo Special Steel Co Ltd SOFT MAGNETIC FeCo BASED TARGET MATERIAL
JP5111835B2 (en) * 2006-11-17 2013-01-09 山陽特殊製鋼株式会社 (CoFe) ZrNb / Ta / Hf-based target material and method for producing the same
JP5253781B2 (en) * 2007-09-18 2013-07-31 山陽特殊製鋼株式会社 Alloy target material for soft magnetic film layer in perpendicular magnetic recording media
JP5397755B2 (en) * 2008-06-17 2014-01-22 日立金属株式会社 Fe-Co alloy sputtering target material for soft magnetic film formation
JP5726615B2 (en) * 2010-11-22 2015-06-03 山陽特殊製鋼株式会社 Alloy for seed layer of magnetic recording medium and sputtering target material
US20150034483A1 (en) * 2012-06-06 2015-02-05 Hitachi Metals, Ltd. Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, AND METHOD OF PRODUCING SAME

Also Published As

Publication number Publication date
CN104508167B (en) 2017-08-04
JP2014037569A (en) 2014-02-27
TWI494443B (en) 2015-08-01
TW201413003A (en) 2014-04-01
MY167435A (en) 2018-08-28
WO2014027636A1 (en) 2014-02-20
JP6050050B2 (en) 2016-12-21
CN104508167A (en) 2015-04-08

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