SG2014011274A - Alloy for soft-magnetic thin-film layer on perpendicular magnetic recording medium, and sputtering-target material - Google Patents

Alloy for soft-magnetic thin-film layer on perpendicular magnetic recording medium, and sputtering-target material

Info

Publication number
SG2014011274A
SG2014011274A SG2014011274A SG2014011274A SG2014011274A SG 2014011274 A SG2014011274 A SG 2014011274A SG 2014011274 A SG2014011274 A SG 2014011274A SG 2014011274 A SG2014011274 A SG 2014011274A SG 2014011274 A SG2014011274 A SG 2014011274A
Authority
SG
Singapore
Prior art keywords
sputtering
alloy
soft
recording medium
film layer
Prior art date
Application number
SG2014011274A
Inventor
Toshiyuki Sawada
Noriaki Matsubara
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of SG2014011274A publication Critical patent/SG2014011274A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
    • G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/14—Ferrous alloys, e.g. steel alloys containing titanium or zirconium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/008—Amorphous alloys with Fe, Co or Ni as the major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/02—Amorphous alloys with iron as the major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor
SG2014011274A 2011-08-17 2012-08-14 Alloy for soft-magnetic thin-film layer on perpendicular magnetic recording medium, and sputtering-target material SG2014011274A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011178187A JP5917045B2 (en) 2011-08-17 2011-08-17 Alloy and sputtering target material for soft magnetic thin film layer in perpendicular magnetic recording medium
PCT/JP2012/070665 WO2013024845A1 (en) 2011-08-17 2012-08-14 Alloy for soft-magnetic thin-film layer on perpendicular magnetic recording medium, and sputtering-target material

Publications (1)

Publication Number Publication Date
SG2014011274A true SG2014011274A (en) 2014-04-28

Family

ID=47715162

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2014011274A SG2014011274A (en) 2011-08-17 2012-08-14 Alloy for soft-magnetic thin-film layer on perpendicular magnetic recording medium, and sputtering-target material

Country Status (6)

Country Link
JP (1) JP5917045B2 (en)
CN (1) CN103781933B (en)
MY (1) MY166289A (en)
SG (1) SG2014011274A (en)
TW (1) TWI558831B (en)
WO (1) WO2013024845A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6405261B2 (en) * 2014-05-01 2018-10-17 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
TWI602940B (en) * 2014-06-11 2017-10-21 光洋應用材料科技股份有限公司 Soft-magnetic sputtering target and soft-magnetic sputtering material
AT14576U1 (en) * 2014-08-20 2016-01-15 Plansee Se Metallization for a thin film device, method of making the same and sputtering target
CN106029943B (en) * 2014-09-04 2018-08-31 捷客斯金属株式会社 Sputtering target
TWI646208B (en) * 2015-02-26 2019-01-01 光洋應用材料科技股份有限公司 Amorphous soft-magnetic target and material
TWI619817B (en) * 2016-10-26 2018-04-01 光洋應用材料科技股份有限公司 Co-Fe-Nb-based Sputtering Target

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006265653A (en) * 2005-03-24 2006-10-05 Hitachi Metals Ltd Fe-Co-BASED ALLOY TARGET MATERIAL AND METHOD FOR PRODUCING THE SAME
JP4699194B2 (en) * 2005-12-15 2011-06-08 山陽特殊製鋼株式会社 Method for producing FeCoB-based sputtering target material
TWI369406B (en) * 2006-10-10 2012-08-01 Hitachi Metals Ltd Co-fe-zr based alloy sputtering target material and process for production thereof
JP4953082B2 (en) * 2006-10-10 2012-06-13 日立金属株式会社 Co-Fe-Zr alloy sputtering target material and method for producing the same
JP2008189996A (en) * 2007-02-05 2008-08-21 Hitachi Metals Ltd Co-Fe-BASED ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING THE SAME
JP5253781B2 (en) * 2007-09-18 2013-07-31 山陽特殊製鋼株式会社 Alloy target material for soft magnetic film layer in perpendicular magnetic recording media
JP5605787B2 (en) * 2008-07-14 2014-10-15 山陽特殊製鋼株式会社 Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method
JP2010111943A (en) * 2008-10-10 2010-05-20 Hitachi Metals Ltd Method for producing sputtering target material
JP5714397B2 (en) * 2010-10-26 2015-05-07 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium

Also Published As

Publication number Publication date
WO2013024845A1 (en) 2013-02-21
CN103781933A (en) 2014-05-07
JP2013040377A (en) 2013-02-28
TWI558831B (en) 2016-11-21
JP5917045B2 (en) 2016-05-11
CN103781933B (en) 2017-01-25
MY166289A (en) 2018-06-25
TW201323642A (en) 2013-06-16

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