MY167435A - Fe-co alloy sputtering target material and method for producing same, and soft magnetic thin film layer and perpendicular magnetic recording medium using same - Google Patents

Fe-co alloy sputtering target material and method for producing same, and soft magnetic thin film layer and perpendicular magnetic recording medium using same

Info

Publication number
MY167435A
MY167435A MYPI2015000092A MYPI2015000092A MY167435A MY 167435 A MY167435 A MY 167435A MY PI2015000092 A MYPI2015000092 A MY PI2015000092A MY PI2015000092 A MYPI2015000092 A MY PI2015000092A MY 167435 A MY167435 A MY 167435A
Authority
MY
Malaysia
Prior art keywords
same
target material
sputtering target
thin film
recording medium
Prior art date
Application number
MYPI2015000092A
Inventor
Hiroyuki Hasegawa
Toshiyuki Sawada
Noriaki Matsubara
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of MY167435A publication Critical patent/MY167435A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
    • G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0433—Nickel- or cobalt-based alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PROVIDED IS A FE-CO ALLOY SPUTTERING TARGET MATERIAL THAT DOES NOT CRACK DURING SPUTTERING. THIS FE-CO ALLOY SPUTTERING TARGET MATERIAL IS COMPOSED OF A FE-CO-M ALLOY REPRESENTED BY FORMULA (1): (Fex-Co100-x)100-yMy … (1) WHERE THE ATOMIC RATIOS ARE 0 ≤ X ≤ 100 AND 4 ≤ Y ≤ 28, AND THE ELEMENT M INCLUDES AT LEAST ONE ELEMENT SELECTED FROM NB, TA, MO, W, CR, AND V. THE SPUTTERING TARGET MATERIAL HAS A MICROSTRUCTURE INCLUDING A PHASE BASED ON FE AND CO AND AN INTERMETALLIC COMPOUND PHASE CONTAINING THE ELEMENT M AND AT LEAST ONE OF FE AND CO. THE AREA RATIO OF A EUTECTIC STRUCTURE IN THE OVERALL MICROSTRUCTURE IS 30% OR LESS.
MYPI2015000092A 2012-08-14 2013-08-12 Fe-co alloy sputtering target material and method for producing same, and soft magnetic thin film layer and perpendicular magnetic recording medium using same MY167435A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012179811A JP6050050B2 (en) 2012-08-14 2012-08-14 Fe-Co alloy sputtering target material and method for producing the same

Publications (1)

Publication Number Publication Date
MY167435A true MY167435A (en) 2018-08-28

Family

ID=50285930

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2015000092A MY167435A (en) 2012-08-14 2013-08-12 Fe-co alloy sputtering target material and method for producing same, and soft magnetic thin film layer and perpendicular magnetic recording medium using same

Country Status (6)

Country Link
JP (1) JP6050050B2 (en)
CN (1) CN104508167B (en)
MY (1) MY167435A (en)
SG (1) SG11201408794VA (en)
TW (1) TWI494443B (en)
WO (1) WO2014027636A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6801168B2 (en) * 2014-06-27 2020-12-16 三菱マテリアル株式会社 Sputtering target, optical functional film, and laminated wiring film
SG11201704465WA (en) 2015-03-04 2017-06-29 Jx Nippon Mining & Metals Corp Magnetic material sputtering target and method for producing same
JP6575775B2 (en) * 2015-03-27 2019-09-18 日立金属株式会社 Soft magnetic film
JP6784733B2 (en) * 2018-08-20 2020-11-11 山陽特殊製鋼株式会社 Co-based alloy for soft magnetic layer of magnetic recording medium
WO2024128075A1 (en) * 2022-12-16 2024-06-20 株式会社プロテリアル Sputtering target and production method therefor

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4331182B2 (en) * 2006-04-14 2009-09-16 山陽特殊製鋼株式会社 Soft magnetic target material
US20070253103A1 (en) * 2006-04-27 2007-11-01 Heraeus, Inc. Soft magnetic underlayer in magnetic media and soft magnetic alloy based sputter target
JP4907259B2 (en) * 2006-08-16 2012-03-28 山陽特殊製鋼株式会社 FeCoB-based target material with Cr added
JP2008121071A (en) * 2006-11-13 2008-05-29 Sanyo Special Steel Co Ltd SOFT MAGNETIC FeCo BASED TARGET MATERIAL
JP5111835B2 (en) * 2006-11-17 2013-01-09 山陽特殊製鋼株式会社 (CoFe) ZrNb / Ta / Hf-based target material and method for producing the same
JP5253781B2 (en) * 2007-09-18 2013-07-31 山陽特殊製鋼株式会社 Alloy target material for soft magnetic film layer in perpendicular magnetic recording media
JP5397755B2 (en) * 2008-06-17 2014-01-22 日立金属株式会社 Fe-Co alloy sputtering target material for soft magnetic film formation
JP5726615B2 (en) * 2010-11-22 2015-06-03 山陽特殊製鋼株式会社 Alloy for seed layer of magnetic recording medium and sputtering target material
CN104145043B (en) * 2012-06-06 2015-11-25 日立金属株式会社 Fe-Co based alloy sputtering target material and manufacture method thereof

Also Published As

Publication number Publication date
SG11201408794VA (en) 2015-02-27
JP6050050B2 (en) 2016-12-21
JP2014037569A (en) 2014-02-27
CN104508167A (en) 2015-04-08
WO2014027636A1 (en) 2014-02-20
TW201413003A (en) 2014-04-01
TWI494443B (en) 2015-08-01
CN104508167B (en) 2017-08-04

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