MY190845A - Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material - Google Patents
Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target materialInfo
- Publication number
- MY190845A MY190845A MYPI2018001726A MYPI2018001726A MY190845A MY 190845 A MY190845 A MY 190845A MY PI2018001726 A MYPI2018001726 A MY PI2018001726A MY PI2018001726 A MYPI2018001726 A MY PI2018001726A MY 190845 A MY190845 A MY 190845A
- Authority
- MY
- Malaysia
- Prior art keywords
- alloy
- recording medium
- flux density
- target material
- sputtering target
- Prior art date
Links
- 239000000956 alloy Substances 0.000 title abstract 3
- 229910045601 alloy Inorganic materials 0.000 title abstract 3
- 230000004907 flux Effects 0.000 title 1
- 238000005477 sputtering target Methods 0.000 title 1
- 239000013077 target material Substances 0.000 title 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 229910052733 gallium Inorganic materials 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052698 phosphorus Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
- 229910052727 yttrium Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/14—Ferrous alloys, e.g. steel alloys containing titanium or zirconium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
There is disclosed an alloy for a soft magnetic thin film layer in a magnetic recording medium, wherein the alloy comprises one or more selected from the group consisting of Y, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Ni, Cu, Al, B, C, Si, P, Zn, Ga, Ge, and Sn, and the balance Co and Fe; and in at%, the following formulae (1) to (4): (1) 0.50?Fe%/(Fe%+Co%) 0.90; (2) 5?TAM?19; (3) 18?TAM+TNMs?19; and (4) 1?Ti%+Zr%+Hf%+B%/2 are satisfied, with the proviso that TAM and TNM are: TAM=Y%+Ti%+Zr%+Hf%+V%+Nb%+Ta%+B%/2; and TNM=Cr%+Mo%+W%+Mn%+Ni%/3+Cu%/3+Al%+C%+Si%+P%+Zn%+G a%+Ge%+Sn%, respectively. (Fig. 1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012022096A JP5778052B2 (en) | 2012-02-03 | 2012-02-03 | Alloy for soft magnetic film layer having low saturation magnetic flux density used for magnetic recording medium and sputtering target material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY190845A true MY190845A (en) | 2022-05-12 |
Family
ID=48905411
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2018001726A MY190845A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
| MYPI2018001725A MY188941A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
| MYPI2014702057A MY171769A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2018001725A MY188941A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
| MYPI2014702057A MY171769A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP5778052B2 (en) |
| CN (1) | CN104081455B (en) |
| MY (3) | MY190845A (en) |
| SG (3) | SG10201510619PA (en) |
| TW (1) | TWI547567B (en) |
| WO (1) | WO2013115384A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6116928B2 (en) * | 2013-02-18 | 2017-04-19 | 山陽特殊製鋼株式会社 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| JP6405261B2 (en) * | 2014-05-01 | 2018-10-17 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
| TWI646208B (en) * | 2015-02-26 | 2019-01-01 | 光洋應用材料科技股份有限公司 | Amorphous soft-magnetic target and material |
| JP6442460B2 (en) * | 2016-10-27 | 2018-12-19 | 山陽特殊製鋼株式会社 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| JP6784733B2 (en) * | 2018-08-20 | 2020-11-11 | 山陽特殊製鋼株式会社 | Co-based alloy for soft magnetic layer of magnetic recording medium |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4919162B2 (en) * | 2007-04-10 | 2012-04-18 | 日立金属株式会社 | Fe-Co alloy sputtering target material and method for producing Fe-Co alloy sputtering target material |
| JP2009070444A (en) * | 2007-09-11 | 2009-04-02 | Hitachi Global Storage Technologies Netherlands Bv | Perpendicular magnetic recording medium |
| JP5397755B2 (en) * | 2008-06-17 | 2014-01-22 | 日立金属株式会社 | Fe-Co alloy sputtering target material for soft magnetic film formation |
| JP5605787B2 (en) * | 2008-07-14 | 2014-10-15 | 山陽特殊製鋼株式会社 | Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method |
| JP5425530B2 (en) * | 2009-06-10 | 2014-02-26 | 山陽特殊製鋼株式会社 | CoFeNi alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| JP5385018B2 (en) * | 2009-06-12 | 2014-01-08 | 山陽特殊製鋼株式会社 | Raw material powder for sputtering target material for producing soft magnetic film having high sputtering rate and sputtering target material |
| JP2011181140A (en) * | 2010-03-01 | 2011-09-15 | Hitachi Metals Ltd | Fe-Co BASED ALLOY SOFT MAGNETIC FILM FOR MAGNETIC RECORDING MEDIUM |
-
2012
- 2012-02-03 JP JP2012022096A patent/JP5778052B2/en active Active
-
2013
- 2013-02-01 TW TW102103965A patent/TWI547567B/en not_active IP Right Cessation
- 2013-02-01 MY MYPI2018001726A patent/MY190845A/en unknown
- 2013-02-01 MY MYPI2018001725A patent/MY188941A/en unknown
- 2013-02-01 SG SG10201510619PA patent/SG10201510619PA/en unknown
- 2013-02-01 MY MYPI2014702057A patent/MY171769A/en unknown
- 2013-02-01 SG SG10201609320PA patent/SG10201609320PA/en unknown
- 2013-02-01 CN CN201380007516.2A patent/CN104081455B/en not_active Expired - Fee Related
- 2013-02-01 SG SG11201404317QA patent/SG11201404317QA/en unknown
- 2013-02-01 WO PCT/JP2013/052400 patent/WO2013115384A1/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013161497A (en) | 2013-08-19 |
| CN104081455A (en) | 2014-10-01 |
| TW201402835A (en) | 2014-01-16 |
| TWI547567B (en) | 2016-09-01 |
| MY171769A (en) | 2019-10-29 |
| MY188941A (en) | 2022-01-13 |
| SG10201609320PA (en) | 2016-12-29 |
| CN104081455B (en) | 2017-05-24 |
| SG10201510619PA (en) | 2016-01-28 |
| JP5778052B2 (en) | 2015-09-16 |
| SG11201404317QA (en) | 2014-10-30 |
| WO2013115384A1 (en) | 2013-08-08 |
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