MY180011A - Cofe-based alloy for soft magnetic film layer in perpendicular magnetic recording medium and sputtering target material - Google Patents
Cofe-based alloy for soft magnetic film layer in perpendicular magnetic recording medium and sputtering target materialInfo
- Publication number
- MY180011A MY180011A MYPI2015702518A MYPI2015702518A MY180011A MY 180011 A MY180011 A MY 180011A MY PI2015702518 A MYPI2015702518 A MY PI2015702518A MY PI2015702518 A MYPI2015702518 A MY PI2015702518A MY 180011 A MY180011 A MY 180011A
- Authority
- MY
- Malaysia
- Prior art keywords
- recording medium
- film layer
- cofe
- target material
- sputtering target
- Prior art date
Links
- 239000000956 alloy Substances 0.000 title abstract 5
- 229910045601 alloy Inorganic materials 0.000 title abstract 5
- 238000005477 sputtering target Methods 0.000 title abstract 2
- 239000013077 target material Substances 0.000 title abstract 2
- 229910003321 CoFe Inorganic materials 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 229910052741 iridium Inorganic materials 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 229910052747 lanthanoid Inorganic materials 0.000 abstract 1
- 150000002602 lanthanoids Chemical class 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052762 osmium Inorganic materials 0.000 abstract 1
- 229910052763 palladium Inorganic materials 0.000 abstract 1
- 229910052697 platinum Inorganic materials 0.000 abstract 1
- 229910052702 rhenium Inorganic materials 0.000 abstract 1
- 229910052703 rhodium Inorganic materials 0.000 abstract 1
- 229910052706 scandium Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
- 229910052727 yttrium Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/003—Making ferrous alloys making amorphous alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/02—Amorphous alloys with iron as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
- H01F41/183—Sputtering targets therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
There is provided a CoFe-based alloy and a sputtering target material for a soft magnetic thin film layer in a perpendicular magnetic recording medium. The alloy is an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium, wherein the alloy includes: one or more selected from Ge, Ru, Rh, Pd, Re, Os, Ir and Pt; one or more selected from Sc, Y, lanthanoids (atomic numbers 57 to 71), Ti, Zr, Hf, V, Nb, Ta, Mo, W, and B; and the balance of Co and Fe with unavoidable impurities; and satisfies, in atomic%, all of the following formulae (a) to (d): (a) 0.1 % ? TCR ? 10%; (b) 5% ? TAM ? 25%; (c) 133 ? TCR/2 +TAM+ TNM ? 25%; and (d) 0 ? Fe%/(Fe3 +Co%) ? 0.80. (Fig. 1)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013028726A JP6116928B2 (en) | 2013-02-18 | 2013-02-18 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| PCT/JP2014/053312 WO2014126143A1 (en) | 2013-02-18 | 2014-02-13 | Cofe system alloy for soft magnetic film layers in perpendicular magnetic recording media, and sputtering target material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY180011A true MY180011A (en) | 2020-11-19 |
Family
ID=51354142
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2015702518A MY180011A (en) | 2013-02-18 | 2014-02-13 | Cofe-based alloy for soft magnetic film layer in perpendicular magnetic recording medium and sputtering target material |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP6116928B2 (en) |
| CN (1) | CN105074041B (en) |
| MY (1) | MY180011A (en) |
| SG (1) | SG11201505980UA (en) |
| TW (1) | TWI627286B (en) |
| WO (1) | WO2014126143A1 (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6506659B2 (en) * | 2015-08-24 | 2019-04-24 | 山陽特殊製鋼株式会社 | Amorphous alloy for magnetic recording, sputtering target material and magnetic recording medium |
| CN105200298A (en) * | 2015-09-08 | 2015-12-30 | 杨雯雯 | Nanocrystalline soft magnetic alloy material and preparation method thereof |
| JP6442460B2 (en) * | 2016-10-27 | 2018-12-19 | 山陽特殊製鋼株式会社 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| TWI652356B (en) * | 2017-07-31 | 2019-03-01 | 台耀科技股份有限公司 | Soft magnetic alloy |
| CN107675079A (en) * | 2017-09-30 | 2018-02-09 | 邓宏运 | Colliery disintegrating machine hammer body multicomponent microalloying high toughness wear resistant steel formula and technique |
| JP7096113B2 (en) * | 2018-09-19 | 2022-07-05 | デクセリアルズ株式会社 | Mn-Ta-W-Cu-O-based sputtering target and its manufacturing method |
| JP2020135907A (en) * | 2019-02-18 | 2020-08-31 | 山陽特殊製鋼株式会社 | Spattering target for forming soft magnetic layer of perpendicular magnetic recording medium, and perpendicular magnetic recording medium, and soft magnetic layer thereof |
| CN111139404A (en) * | 2020-01-17 | 2020-05-12 | 陕西新精特钢研精密合金有限公司 | High-strength soft magnetic alloy and manufacturing method thereof |
| JP2021127490A (en) | 2020-02-13 | 2021-09-02 | 山陽特殊製鋼株式会社 | Sputtering target material and method for manufacturing the same |
| CN114807787A (en) * | 2020-09-27 | 2022-07-29 | 浙江大学台州研究院 | Amorphous alloy razor blade and method of making same |
| CN114134472A (en) * | 2020-12-24 | 2022-03-04 | 佛山市中研非晶科技股份有限公司 | Cobalt-based amorphous alloy thin film, preparation method thereof, electromagnetic shielding film and equipment applying cobalt-based amorphous alloy thin film |
| CN115125428B (en) * | 2022-08-09 | 2023-03-10 | 杭州电子科技大学 | Wide-temperature-zone trans-room-temperature Magnetitum material and preparation method and application thereof |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4439253A (en) * | 1982-03-04 | 1984-03-27 | Allied Corporation | Cobalt rich manganese containing near-zero magnetostrictive metallic glasses having high saturation induction |
| JPS5990219A (en) * | 1982-11-12 | 1984-05-24 | Tdk Corp | Magnetic head |
| JPS59182938A (en) * | 1983-04-01 | 1984-10-17 | Sumitomo Special Metals Co Ltd | Amorphous alloy having high magnetic permeability |
| JPH01118244A (en) * | 1987-04-17 | 1989-05-10 | Mitsui Petrochem Ind Ltd | Magneto-optical recording film |
| CA1298704C (en) * | 1987-09-28 | 1992-04-14 | Kunihiko Mizumoto | Magnetooptical recording medium |
| JPH0877544A (en) * | 1994-06-30 | 1996-03-22 | Fuji Electric Co Ltd | Magnetic recording medium and its production |
| JP2001049425A (en) * | 1999-08-05 | 2001-02-20 | Sumitomo Metal Mining Co Ltd | Rare earth element-transition metal series sintered body for sputtering target and its production |
| JP2001312815A (en) * | 2000-04-27 | 2001-11-09 | Showa Denko Kk | Magnetic recording medium, method of manufacturing the same, sputtering target and magnetic recording and reproducing device |
| US20080090106A1 (en) * | 2006-10-13 | 2008-04-17 | David Braunstein | Soft underlayer for perpendicular media with mechanical stability and corrosion resistance |
| JP5031443B2 (en) * | 2007-05-29 | 2012-09-19 | 山陽特殊製鋼株式会社 | Alloy for soft magnetic film layer in perpendicular magnetic recording media |
| JP2010150591A (en) * | 2008-12-25 | 2010-07-08 | Hitachi Metals Ltd | Cobalt-iron based alloy for soft-magnetic film |
| JP5698023B2 (en) * | 2011-02-16 | 2015-04-08 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
| JP5778052B2 (en) * | 2012-02-03 | 2015-09-16 | 山陽特殊製鋼株式会社 | Alloy for soft magnetic film layer having low saturation magnetic flux density used for magnetic recording medium and sputtering target material |
| JP6405261B2 (en) * | 2014-05-01 | 2018-10-17 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
-
2013
- 2013-02-18 JP JP2013028726A patent/JP6116928B2/en active Active
-
2014
- 2014-02-13 MY MYPI2015702518A patent/MY180011A/en unknown
- 2014-02-13 WO PCT/JP2014/053312 patent/WO2014126143A1/en active Application Filing
- 2014-02-13 CN CN201480009279.8A patent/CN105074041B/en active Active
- 2014-02-13 SG SG11201505980UA patent/SG11201505980UA/en unknown
- 2014-02-18 TW TW103105279A patent/TWI627286B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TWI627286B (en) | 2018-06-21 |
| SG11201505980UA (en) | 2015-08-28 |
| CN105074041A (en) | 2015-11-18 |
| JP2014156639A (en) | 2014-08-28 |
| TW201437386A (en) | 2014-10-01 |
| WO2014126143A1 (en) | 2014-08-21 |
| JP6116928B2 (en) | 2017-04-19 |
| CN105074041B (en) | 2018-06-01 |
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