MY182858A - Fe-co-based alloy sputtering target material - Google Patents
Fe-co-based alloy sputtering target materialInfo
- Publication number
- MY182858A MY182858A MYPI2016700480A MYPI2016700480A MY182858A MY 182858 A MY182858 A MY 182858A MY PI2016700480 A MYPI2016700480 A MY PI2016700480A MY PI2016700480 A MYPI2016700480 A MY PI2016700480A MY 182858 A MY182858 A MY 182858A
- Authority
- MY
- Malaysia
- Prior art keywords
- target material
- sputtering target
- based alloy
- intermetallic compound
- soft magnetic
- Prior art date
Links
- 239000013077 target material Substances 0.000 title abstract 8
- 238000005477 sputtering target Methods 0.000 title abstract 7
- 229910045601 alloy Inorganic materials 0.000 title abstract 4
- 239000000956 alloy Substances 0.000 title abstract 4
- 229910052742 iron Inorganic materials 0.000 abstract 6
- 229910017061 Fe Co Inorganic materials 0.000 abstract 3
- 229910000765 intermetallic Inorganic materials 0.000 abstract 3
- 239000010409 thin film Substances 0.000 abstract 2
- 239000010408 film Substances 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000001755 magnetron sputter deposition Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 238000000465 moulding Methods 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0433—Nickel- or cobalt-based alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/047—Making non-ferrous alloys by powder metallurgy comprising intermetallic compounds
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
- C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
- C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%
- C22C33/0285—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5% with Cr, Co, or Ni having a minimum content higher than 5%
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C2200/00—Crystalline structure
- C22C2200/02—Amorphous
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
There are provided: a Fe-Co-based alloy sputtering target material for molding a soft magnetic film, which enables stable magnetron sputtering and allows generation of particles to be suppressed; a method for producing the Fe-Co-based alloy sputtering target material; a soft magnetic thin film layer; and a perpendicular magnetic recording medium formed by using the soft magnetic thin film layer. The target material is a sputtering target material including a Fe-Co-based alloy, the sputtering target material including: at least one M element .selected from Nb, Ta, Mo, and W; and the balance of one or two of Fe and Co with unavoidable impurities, and satisfying the following formula ( 1): (Fex-C0100-xhoo-yMy ( 1) [wherein atomic ratios are 0 :s X :s 100 and 4 :s Y :s 28], wherein a microstructure of the sputtering target material includes a phase mainly including Fe and Co and an intermetallic compound phase including one or two of Fe and Co and an M element; the phase mainly including Fe and Co is surrounded, divided, and isolated by allowing the intermetallic compound phase comprising one or two of Fe and Co and the M element to grow in a net geometry; and the number of the phases mainly including Fe and Co, isolated by the intermetallic compound phase, is 300 or more per 10000 ?m2 in the sputtering target material. (FIG. 1)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013168787A JP6161991B2 (en) | 2013-08-15 | 2013-08-15 | Fe-Co alloy sputtering target material |
PCT/JP2014/071305 WO2015022963A1 (en) | 2013-08-15 | 2014-08-12 | Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, SOFT MAGNETIC THIN FILM LAYER, AND VERTICAL MAGNETIC RECORDING MEDIUM PRODUCED USING SAID SOFT MAGNETIC THIN FILM LAYER |
Publications (1)
Publication Number | Publication Date |
---|---|
MY182858A true MY182858A (en) | 2021-02-05 |
Family
ID=52468348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2016700480A MY182858A (en) | 2013-08-15 | 2014-08-12 | Fe-co-based alloy sputtering target material |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6161991B2 (en) |
CN (1) | CN105473759B (en) |
MY (1) | MY182858A (en) |
SG (1) | SG11201600474SA (en) |
TW (1) | TWI621718B (en) |
WO (1) | WO2015022963A1 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016149170A (en) * | 2015-02-12 | 2016-08-18 | 日立金属株式会社 | Fe-Co-Nb BASED ALLOY SPUTTERING TARGET MATERIAL AND SOFT MAGNETIC FILM |
JP6575775B2 (en) * | 2015-03-27 | 2019-09-18 | 日立金属株式会社 | Soft magnetic film |
CN108004515A (en) * | 2018-01-22 | 2018-05-08 | 宁波江丰电子材料股份有限公司 | Preparation method, iron cobalt tantalum alloy-sputtering targets material and the application of iron cobalt tantalum alloy-sputtering targets material |
SG11202009585QA (en) * | 2018-03-28 | 2020-10-29 | Jx Nippon Mining & Metals Corp | Perpendicular magnetic recording medium |
JP7382142B2 (en) * | 2019-02-26 | 2023-11-16 | 山陽特殊製鋼株式会社 | Alloy suitable for sputtering target material |
JP7512077B2 (en) | 2020-05-12 | 2024-07-08 | 山陽特殊製鋼株式会社 | Sputtering target material |
CN111957982B (en) * | 2020-08-31 | 2023-02-03 | 宁波江丰电子材料股份有限公司 | Preparation method of iron-cobalt-tantalum alloy powder, iron-cobalt-tantalum alloy powder and application |
WO2024128075A1 (en) * | 2022-12-16 | 2024-06-20 | 株式会社プロテリアル | Sputtering target and production method therefor |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005190538A (en) * | 2003-12-25 | 2005-07-14 | Hitachi Global Storage Technologies Netherlands Bv | Magnetic recording medium, and its manufacturing method and apparatus |
JP2008121071A (en) * | 2006-11-13 | 2008-05-29 | Sanyo Special Steel Co Ltd | SOFT MAGNETIC FeCo BASED TARGET MATERIAL |
JP5111835B2 (en) * | 2006-11-17 | 2013-01-09 | 山陽特殊製鋼株式会社 | (CoFe) ZrNb / Ta / Hf-based target material and method for producing the same |
JP5397755B2 (en) * | 2008-06-17 | 2014-01-22 | 日立金属株式会社 | Fe-Co alloy sputtering target material for soft magnetic film formation |
JP5605787B2 (en) * | 2008-07-14 | 2014-10-15 | 山陽特殊製鋼株式会社 | Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method |
-
2013
- 2013-08-15 JP JP2013168787A patent/JP6161991B2/en active Active
-
2014
- 2014-08-12 WO PCT/JP2014/071305 patent/WO2015022963A1/en active Application Filing
- 2014-08-12 SG SG11201600474SA patent/SG11201600474SA/en unknown
- 2014-08-12 MY MYPI2016700480A patent/MY182858A/en unknown
- 2014-08-12 CN CN201480044298.4A patent/CN105473759B/en active Active
- 2014-08-14 TW TW103127909A patent/TWI621718B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI621718B (en) | 2018-04-21 |
CN105473759B (en) | 2018-04-03 |
CN105473759A (en) | 2016-04-06 |
WO2015022963A1 (en) | 2015-02-19 |
JP2015036453A (en) | 2015-02-23 |
TW201512421A (en) | 2015-04-01 |
JP6161991B2 (en) | 2017-07-12 |
SG11201600474SA (en) | 2016-02-26 |
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