MY190417A - Sputtering target and method for manufacturing same - Google Patents

Sputtering target and method for manufacturing same

Info

Publication number
MY190417A
MY190417A MYPI2018701613A MYPI2018701613A MY190417A MY 190417 A MY190417 A MY 190417A MY PI2018701613 A MYPI2018701613 A MY PI2018701613A MY PI2018701613 A MYPI2018701613 A MY PI2018701613A MY 190417 A MY190417 A MY 190417A
Authority
MY
Malaysia
Prior art keywords
target
sputtering target
manufacturing same
manufacturing
cua
Prior art date
Application number
MYPI2018701613A
Inventor
Hidetaka Yakabe
Jun Fukuoka
Koichi Sakamaki
Hiroaki Sogame
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Publication of MY190417A publication Critical patent/MY190417A/en

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Landscapes

  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

Provided are a target capable of suppressing cracks in the target and suitable for forming, for example, a soft magnetic film of a heat-assisted magnetic recording medium, and a method for manufacturing the target. In a sputtering target having a composition formula expressed as Fe100-a-b-c-Cua-Sib-Mc in terms of atomic ratio, wherein 0.1?a?5.0, 10.0?b?20.0, 10.0?c?25.0, and M is one or more elements selected from Nb and B, containing a remainder composed of unavoidable impurities, and having a bending strength of 500 MPa or more, a number of Fe phases having an inscribed circle diameter of 1 ?m or greater is preferably less than 1.0 per 60000 ?m2.
MYPI2018701613A 2017-04-28 2018-04-24 Sputtering target and method for manufacturing same MY190417A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017089797 2017-04-28

Publications (1)

Publication Number Publication Date
MY190417A true MY190417A (en) 2022-04-21

Family

ID=64478219

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2018701613A MY190417A (en) 2017-04-28 2018-04-24 Sputtering target and method for manufacturing same

Country Status (4)

Country Link
JP (1) JP2018188726A (en)
MY (1) MY190417A (en)
SG (1) SG10201802974YA (en)
TW (1) TWI683008B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7238527B2 (en) * 2018-08-09 2023-03-14 株式会社プロテリアル Soft magnetic film for heat-assisted magnetic recording medium and sputtering target for forming soft magnetic film for heat-assisted magnetic recording medium
JP7552600B2 (en) 2019-08-26 2024-09-18 株式会社プロテリアル Fe-Co-Si-B-Nb target
TWI798580B (en) * 2019-08-26 2023-04-11 日商日立金屬股份有限公司 Fe-Si-B-Nb system target
JP7371494B2 (en) 2019-12-27 2023-10-31 株式会社レゾナック Magnetic recording media and magnetic storage devices

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4881989A (en) * 1986-12-15 1989-11-21 Hitachi Metals, Ltd. Fe-base soft magnetic alloy and method of producing same
JP2718261B2 (en) * 1990-01-09 1998-02-25 住友金属工業株式会社 Magnetic alloy and method for producing the same
JP3253545B2 (en) 1996-12-17 2002-02-04 日本鋼管株式会社 Method and apparatus for eliminating clogging of coal loaded in coke oven coal
US6784588B2 (en) * 2003-02-03 2004-08-31 Metglas, Inc. Low core loss amorphous metal magnetic components for electric motors

Also Published As

Publication number Publication date
JP2018188726A (en) 2018-11-29
TW201839150A (en) 2018-11-01
SG10201802974YA (en) 2018-11-29
TWI683008B (en) 2020-01-21

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