MY181980A - Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium - Google Patents
Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording mediumInfo
- Publication number
- MY181980A MY181980A MYPI2017000858A MYPI2017000858A MY181980A MY 181980 A MY181980 A MY 181980A MY PI2017000858 A MYPI2017000858 A MY PI2017000858A MY PI2017000858 A MYPI2017000858 A MY PI2017000858A MY 181980 A MY181980 A MY 181980A
- Authority
- MY
- Malaysia
- Prior art keywords
- magnetic recording
- group
- alloy
- elements selected
- recording medium
- Prior art date
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title abstract 3
- 238000005477 sputtering target Methods 0.000 title 1
- 239000013077 target material Substances 0.000 title 1
- 229910045601 alloy Inorganic materials 0.000 abstract 3
- 239000000956 alloy Substances 0.000 abstract 3
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/02—Amorphous alloys with iron as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
There is provided a soft magnetic alloy for magnetic recording comprising in at.%: (A) 0.5% or more of one or two or more of elements selected from the group consisting of Ta, Nb and V; (B) 0.5% or more of one or two or more of elements selected from the group consisting of Cr, Mo and W; (C) 0 to 5% of one or two or more of elements selected from the group consisting of Ti, Zr and Hf; (D) 0 to 30% of one or two of elements selected from the group consisting of Ni and Mn; (E) 0 to 5% of one or two of elements selected from the group consisting of Al and Cu; and (F) 0 to 10% of one or two or more of elements selected from the group consisting of Si, Ge, P, B and C; and the balance Co and Fe and unavoidable impurities. In the alloy, Am ratio of Fe:Co is 10:90 to 70:30; and the total amount of the {A) group element(s), the (B) group element(s) and the (C) group element(s) is 10 to 30% of the alloy. The alloy of the present invention is superior in amorphous properties, hardness and corrosion resistance and is suitable as a soft magnetic alloy for a perpendicular magnetic recording medium.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011030562A JP5698023B2 (en) | 2011-02-16 | 2011-02-16 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY181980A true MY181980A (en) | 2021-01-18 |
Family
ID=46672492
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2017000858A MY181980A (en) | 2011-02-16 | 2012-02-10 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5698023B2 (en) |
| MY (1) | MY181980A (en) |
| SG (2) | SG10201508695WA (en) |
| TW (1) | TWI508114B (en) |
| WO (1) | WO2012111568A1 (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013183546A1 (en) * | 2012-06-06 | 2013-12-12 | 日立金属株式会社 | Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, AND METHOD FOR PRODUCING SAME |
| JP6116928B2 (en) * | 2013-02-18 | 2017-04-19 | 山陽特殊製鋼株式会社 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| US9548073B1 (en) * | 2013-03-13 | 2017-01-17 | WD Media, LLC | Systems and methods for providing high performance soft magnetic underlayers for magnetic recording media |
| JP6405261B2 (en) * | 2014-05-01 | 2018-10-17 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
| JP5946974B1 (en) * | 2014-09-04 | 2016-07-06 | Ｊｘ金属株式会社 | Sputtering target |
| WO2016157922A1 (en) * | 2015-03-27 | 2016-10-06 | 日立金属株式会社 | Soft magnetic film and sputtering target for forming soft magnetic film |
| JP6442460B2 (en) * | 2016-10-27 | 2018-12-19 | 山陽特殊製鋼株式会社 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| WO2021039710A1 (en) * | 2019-08-26 | 2021-03-04 | 日立金属株式会社 | Fe-si-b-nb-based target |
| JPWO2021039712A1 (en) * | 2019-08-26 | 2021-03-04 | ||
| TWI739563B (en) * | 2019-08-26 | 2021-09-11 | 日商日立金屬股份有限公司 | Fe-Co-Si-B-Nb series target |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008123602A (en) * | 2006-11-10 | 2008-05-29 | Hitachi Global Storage Technologies Netherlands Bv | Perpendicular magnetic recording medium |
| JP2008135137A (en) * | 2006-11-29 | 2008-06-12 | Fujitsu Ltd | Magnetic recording medium, method of manufacturing magnetic recording medium and magnetic recording device |
| JP5443065B2 (en) * | 2009-06-09 | 2014-03-19 | エイチジーエスティーネザーランドビーブイ | Perpendicular magnetic recording medium |
| JP5425530B2 (en) * | 2009-06-10 | 2014-02-26 | 山陽特殊製鋼株式会社 | CoFeNi alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
-
2011
- 2011-02-16 JP JP2011030562A patent/JP5698023B2/en active Active
-
2012
- 2012-02-10 WO PCT/JP2012/053164 patent/WO2012111568A1/en active Application Filing
- 2012-02-10 SG SG10201508695WA patent/SG10201508695WA/en unknown
- 2012-02-10 MY MYPI2017000858A patent/MY181980A/en unknown
- 2012-02-10 SG SG2013058649A patent/SG192259A1/en unknown
- 2012-02-16 TW TW101105106A patent/TWI508114B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2012111568A1 (en) | 2012-08-23 |
| TW201239922A (en) | 2012-10-01 |
| JP5698023B2 (en) | 2015-04-08 |
| SG192259A1 (en) | 2013-09-30 |
| CN103380458A (en) | 2013-10-30 |
| JP2012169021A (en) | 2012-09-06 |
| TWI508114B (en) | 2015-11-11 |
| SG10201508695WA (en) | 2015-11-27 |
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