MY171479A - Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium - Google Patents
Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording mediumInfo
- Publication number
- MY171479A MY171479A MYPI2015000091A MYPI2015000091A MY171479A MY 171479 A MY171479 A MY 171479A MY PI2015000091 A MYPI2015000091 A MY PI2015000091A MY PI2015000091 A MYPI2015000091 A MY PI2015000091A MY 171479 A MY171479 A MY 171479A
- Authority
- MY
- Malaysia
- Prior art keywords
- magnetic recording
- target material
- sputtering target
- group
- amount
- Prior art date
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title abstract 3
- 238000005477 sputtering target Methods 0.000 title 1
- 239000013077 target material Substances 0.000 title 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 230000035939 shock Effects 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/02—Amorphous alloys with iron as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/11—Making amorphous alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/003—Making ferrous alloys making amorphous alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
- H01F41/183—Sputtering targets therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
- Soft Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Abstract
Provided is a soft magnetic alloy, for magnetic recording, having an atomic ratio 100Fe/(Fe+Co) of 0 to 70 and comprising, in at.%, (A) at least one element selected from the group consisting of Mo and W in an amount of 10% to 30%; (B) at least one element selected from the group consisting of Ti, Zr, and Hf in an amount of 0% to 5%; (C) at least one element selected from the group consisting of V, Nb, and Ta in an amount of 0% to 0.5%; (D) at least one element selected from the group consisting of Ni and Mn in an amount of 0% to 30%; (E) at least one element selected from the group consisting of Cr, Al, and Cu in an amount of 0% to 10%; and (F) at least one element selected from the group consisting of Si, Ge, P, B, and C in an amount of 0% to 10%, the balance being Co and incidental impurities. This soft magnetic alloy for magnetic recording has high thermal shock resistance.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012179238A JP6210503B2 (en) | 2012-08-13 | 2012-08-13 | Soft magnetic alloy for magnetic recording and sputtering target material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY171479A true MY171479A (en) | 2019-10-15 |
Family
ID=50101298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2015000091A MY171479A (en) | 2012-08-13 | 2013-08-08 | Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP6210503B2 (en) |
| CN (1) | CN104488029B (en) |
| MY (1) | MY171479A (en) |
| SG (2) | SG11201408798PA (en) |
| TW (1) | TWI478183B (en) |
| WO (1) | WO2014027601A1 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6405261B2 (en) * | 2014-05-01 | 2018-10-17 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
| CN104766685A (en) * | 2014-05-21 | 2015-07-08 | 北京北冶功能材料有限公司 | High-performance iron-cobalt soft magnetic alloy forging material |
| JP6506659B2 (en) * | 2015-08-24 | 2019-04-24 | 山陽特殊製鋼株式会社 | Amorphous alloy for magnetic recording, sputtering target material and magnetic recording medium |
| JP2017208147A (en) * | 2016-05-16 | 2017-11-24 | 日立金属株式会社 | Sputtering target for forming soft magnetic ground layer and soft magnetic ground layer |
| CN111850431B (en) * | 2019-09-23 | 2022-02-22 | 宁波中科毕普拉斯新材料科技有限公司 | Iron-based amorphous alloy containing sub-nanoscale ordered clusters, preparation method and nanocrystalline alloy derivative thereof |
| WO2024128075A1 (en) * | 2022-12-16 | 2024-06-20 | 株式会社プロテリアル | Sputtering target and production method therefor |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2524514B2 (en) * | 1987-09-21 | 1996-08-14 | 日立マクセル株式会社 | Magnetic recording media |
| JP2635402B2 (en) * | 1988-11-02 | 1997-07-30 | アルプス電気株式会社 | Soft magnetic alloy film |
| JPH0555036A (en) * | 1991-08-26 | 1993-03-05 | Tdk Corp | Soft magnetic thin film and its manufacture, soft magnetic multilayer film and its manufacture as well as magnetic head |
| JPH07272223A (en) * | 1994-03-29 | 1995-10-20 | Tdk Corp | Magneto-resistance effect type head |
| US20060110626A1 (en) * | 2004-11-24 | 2006-05-25 | Heraeus, Inc. | Carbon containing sputter target alloy compositions |
| JP4380577B2 (en) * | 2005-04-07 | 2009-12-09 | 富士電機デバイステクノロジー株式会社 | Perpendicular magnetic recording medium |
| JP4331182B2 (en) * | 2006-04-14 | 2009-09-16 | 山陽特殊製鋼株式会社 | Soft magnetic target material |
| JP4953082B2 (en) * | 2006-10-10 | 2012-06-13 | 日立金属株式会社 | Co-Fe-Zr alloy sputtering target material and method for producing the same |
| US9293166B2 (en) * | 2008-04-30 | 2016-03-22 | Sanyo Special Steel Co., Ltd. | Sputtering target material for producing intermediate layer film of perpendicular magnetic recording medium and thin film produced by using the same |
| JP5443065B2 (en) * | 2009-06-09 | 2014-03-19 | エイチジーエスティーネザーランドビーブイ | Perpendicular magnetic recording medium |
-
2012
- 2012-08-13 JP JP2012179238A patent/JP6210503B2/en active Active
-
2013
- 2013-08-08 SG SG11201408798PA patent/SG11201408798PA/en unknown
- 2013-08-08 MY MYPI2015000091A patent/MY171479A/en unknown
- 2013-08-08 WO PCT/JP2013/071484 patent/WO2014027601A1/en active Application Filing
- 2013-08-08 SG SG10201700410WA patent/SG10201700410WA/en unknown
- 2013-08-08 CN CN201380039614.4A patent/CN104488029B/en active Active
- 2013-08-12 TW TW102128832A patent/TWI478183B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| CN104488029B (en) | 2018-04-17 |
| WO2014027601A1 (en) | 2014-02-20 |
| SG11201408798PA (en) | 2015-02-27 |
| JP6210503B2 (en) | 2017-10-11 |
| JP2014038669A (en) | 2014-02-27 |
| SG10201700410WA (en) | 2017-03-30 |
| TWI478183B (en) | 2015-03-21 |
| CN104488029A (en) | 2015-04-01 |
| TW201413758A (en) | 2014-04-01 |
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