SG11201408798PA - Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium - Google Patents

Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium

Info

Publication number
SG11201408798PA
SG11201408798PA SG11201408798PA SG11201408798PA SG11201408798PA SG 11201408798P A SG11201408798P A SG 11201408798PA SG 11201408798P A SG11201408798P A SG 11201408798PA SG 11201408798P A SG11201408798P A SG 11201408798PA SG 11201408798P A SG11201408798P A SG 11201408798PA
Authority
SG
Singapore
Prior art keywords
magnetic recording
target material
sputtering target
recording medium
magnetic
Prior art date
Application number
SG11201408798PA
Inventor
Ryoji Hayashi
Toshiyuki Sawada
Noriaki Matsubara
Hiroyuki Hasegawa
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of SG11201408798PA publication Critical patent/SG11201408798PA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
    • G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/02—Amorphous alloys with iron as the major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/11—Making amorphous alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/003—Making ferrous alloys making amorphous alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H01F41/183—Sputtering targets therefor
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
  • Soft Magnetic Materials (AREA)
  • Thin Magnetic Films (AREA)
SG11201408798PA 2012-08-13 2013-08-08 Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium SG11201408798PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012179238A JP6210503B2 (en) 2012-08-13 2012-08-13 Soft magnetic alloy for magnetic recording and sputtering target material
PCT/JP2013/071484 WO2014027601A1 (en) 2012-08-13 2013-08-08 Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium

Publications (1)

Publication Number Publication Date
SG11201408798PA true SG11201408798PA (en) 2015-02-27

Family

ID=50101298

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201408798PA SG11201408798PA (en) 2012-08-13 2013-08-08 Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium
SG10201700410WA SG10201700410WA (en) 2012-08-13 2013-08-08 Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG10201700410WA SG10201700410WA (en) 2012-08-13 2013-08-08 Soft magnetic alloy for magnetic recording purposes, sputtering target material, and magnetic recording medium

Country Status (6)

Country Link
JP (1) JP6210503B2 (en)
CN (1) CN104488029B (en)
MY (1) MY171479A (en)
SG (2) SG11201408798PA (en)
TW (1) TWI478183B (en)
WO (1) WO2014027601A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6405261B2 (en) * 2014-05-01 2018-10-17 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
CN104766685A (en) * 2014-05-21 2015-07-08 北京北冶功能材料有限公司 High-performance iron-cobalt soft magnetic alloy forging material
JP6506659B2 (en) * 2015-08-24 2019-04-24 山陽特殊製鋼株式会社 Amorphous alloy for magnetic recording, sputtering target material and magnetic recording medium
JP2017208147A (en) * 2016-05-16 2017-11-24 日立金属株式会社 Sputtering target for forming soft magnetic ground layer and soft magnetic ground layer
CN111850431B (en) * 2019-09-23 2022-02-22 宁波中科毕普拉斯新材料科技有限公司 Iron-based amorphous alloy containing sub-nanoscale ordered clusters, preparation method and nanocrystalline alloy derivative thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2524514B2 (en) * 1987-09-21 1996-08-14 日立マクセル株式会社 Magnetic recording media
JP2635402B2 (en) * 1988-11-02 1997-07-30 アルプス電気株式会社 Soft magnetic alloy film
JPH0555036A (en) * 1991-08-26 1993-03-05 Tdk Corp Soft magnetic thin film and its manufacture, soft magnetic multilayer film and its manufacture as well as magnetic head
JPH07272223A (en) * 1994-03-29 1995-10-20 Tdk Corp Magneto-resistance effect type head
US20060110626A1 (en) * 2004-11-24 2006-05-25 Heraeus, Inc. Carbon containing sputter target alloy compositions
JP4380577B2 (en) * 2005-04-07 2009-12-09 富士電機デバイステクノロジー株式会社 Perpendicular magnetic recording medium
JP4331182B2 (en) * 2006-04-14 2009-09-16 山陽特殊製鋼株式会社 Soft magnetic target material
JP4953082B2 (en) * 2006-10-10 2012-06-13 日立金属株式会社 Co-Fe-Zr alloy sputtering target material and method for producing the same
CN102766848B (en) * 2008-04-30 2015-03-04 山阳特殊制钢株式会社 Sputtering target material for producing intermediate layer film of perpendicular magnetic recording medium and thin film produced by using the same
JP5443065B2 (en) * 2009-06-09 2014-03-19 エイチジーエスティーネザーランドビーブイ Perpendicular magnetic recording medium

Also Published As

Publication number Publication date
CN104488029A (en) 2015-04-01
TWI478183B (en) 2015-03-21
SG10201700410WA (en) 2017-03-30
MY171479A (en) 2019-10-15
JP6210503B2 (en) 2017-10-11
WO2014027601A1 (en) 2014-02-20
TW201413758A (en) 2014-04-01
CN104488029B (en) 2018-04-17
JP2014038669A (en) 2014-02-27

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