SG11201405335SA - Fe-co-based alloy sputtering target material, and method ofproducing same - Google Patents
Fe-co-based alloy sputtering target material, and method ofproducing sameInfo
- Publication number
- SG11201405335SA SG11201405335SA SG11201405335SA SG11201405335SA SG11201405335SA SG 11201405335S A SG11201405335S A SG 11201405335SA SG 11201405335S A SG11201405335S A SG 11201405335SA SG 11201405335S A SG11201405335S A SG 11201405335SA SG 11201405335S A SG11201405335S A SG 11201405335SA
- Authority
- SG
- Singapore
- Prior art keywords
- same
- target material
- based alloy
- sputtering target
- alloy sputtering
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H01J37/3429—Plural materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0433—Nickel- or cobalt-based alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
- C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
- C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%
- C22C33/0285—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5% with Cr, Co, or Ni having a minimum content higher than 5%
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
- C22C38/26—Ferrous alloys, e.g. steel alloys containing chromium with niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/18—Ferrous alloys, e.g. steel alloys containing chromium
- C22C38/30—Ferrous alloys, e.g. steel alloys containing chromium with cobalt
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
- H01F41/183—Sputtering targets therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/06—Making metallic powder or suspensions thereof using physical processes starting from liquid material
- B22F9/08—Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying
- B22F9/082—Making metallic powder or suspensions thereof using physical processes starting from liquid material by casting, e.g. through sieves or in water, by atomising or spraying atomising using a fluid
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C2202/00—Physical properties
- C22C2202/02—Magnetic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/02—Details
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012128657 | 2012-06-06 | ||
PCT/JP2013/065106 WO2013183546A1 (en) | 2012-06-06 | 2013-05-30 | Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, AND METHOD FOR PRODUCING SAME |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201405335SA true SG11201405335SA (en) | 2014-11-27 |
Family
ID=49711938
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201405335SA SG11201405335SA (en) | 2012-06-06 | 2013-05-30 | Fe-co-based alloy sputtering target material, and method ofproducing same |
Country Status (7)
Country | Link |
---|---|
US (2) | US20150034483A1 (en) |
JP (1) | JP5447743B1 (en) |
CN (1) | CN104145043B (en) |
MY (1) | MY170399A (en) |
SG (1) | SG11201405335SA (en) |
TW (2) | TWI542719B (en) |
WO (1) | WO2013183546A1 (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6480782B2 (en) | 2001-01-31 | 2002-11-12 | Cummins, Inc. | System for managing charge flow and EGR fraction in an internal combustion engine |
US6837227B2 (en) | 2001-01-31 | 2005-01-04 | Cummins, Inc. | System and method for estimating EGR mass flow and EGR fraction |
JP6050050B2 (en) * | 2012-08-14 | 2016-12-21 | 山陽特殊製鋼株式会社 | Fe-Co alloy sputtering target material and method for producing the same |
US9548073B1 (en) * | 2013-03-13 | 2017-01-17 | WD Media, LLC | Systems and methods for providing high performance soft magnetic underlayers for magnetic recording media |
JP2016149170A (en) * | 2015-02-12 | 2016-08-18 | 日立金属株式会社 | Fe-Co-Nb BASED ALLOY SPUTTERING TARGET MATERIAL AND SOFT MAGNETIC FILM |
WO2016157922A1 (en) * | 2015-03-27 | 2016-10-06 | 日立金属株式会社 | Soft magnetic film and sputtering target for forming soft magnetic film |
CN105092394A (en) * | 2015-08-07 | 2015-11-25 | 中国科学院宁波材料技术与工程研究所 | Bending fracture strain testing device and method |
JP6731147B2 (en) * | 2015-08-10 | 2020-07-29 | 日立金属株式会社 | Oxide sputtering target material |
JP6660130B2 (en) * | 2015-09-18 | 2020-03-04 | 山陽特殊製鋼株式会社 | CoFeB alloy target material |
JP6781931B2 (en) * | 2015-12-11 | 2020-11-11 | 日立金属株式会社 | Sputtering target material |
JP6871922B2 (en) * | 2017-01-27 | 2021-05-19 | Jfeスチール株式会社 | Manufacturing method of soft magnetic iron powder |
JP7382142B2 (en) * | 2019-02-26 | 2023-11-16 | 山陽特殊製鋼株式会社 | Alloy suitable for sputtering target material |
JP6998431B2 (en) | 2020-08-03 | 2022-02-04 | 山陽特殊製鋼株式会社 | Co-based alloy for soft magnetic layer of magnetic recording medium |
CN114038642B (en) * | 2021-10-12 | 2024-07-12 | 泉州天智合金材料科技有限公司 | Fe-Co soft magnetic alloy wave-absorbing powder and preparation method thereof |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4331182B2 (en) * | 2006-04-14 | 2009-09-16 | 山陽特殊製鋼株式会社 | Soft magnetic target material |
SG142249A1 (en) * | 2006-10-10 | 2008-05-28 | Hitachi Metals Ltd | Co-fe-zr based alloy sputtering target material and process for production thereof |
JP5111835B2 (en) * | 2006-11-17 | 2013-01-09 | 山陽特殊製鋼株式会社 | (CoFe) ZrNb / Ta / Hf-based target material and method for producing the same |
JP5359890B2 (en) * | 2008-02-18 | 2013-12-04 | 日立金属株式会社 | Fe-Co alloy sputtering target material for soft magnetic film formation |
CN101981224B (en) * | 2008-03-28 | 2012-08-22 | Jx日矿日石金属株式会社 | Sputtering target of nonmagnetic-in-ferromagnetic dispersion type material |
JP5472688B2 (en) * | 2008-06-12 | 2014-04-16 | 日立金属株式会社 | Fe-Co alloy sputtering target material and method for producing the same |
JP5605787B2 (en) * | 2008-07-14 | 2014-10-15 | 山陽特殊製鋼株式会社 | Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method |
JP5348661B2 (en) * | 2009-01-22 | 2013-11-20 | 山陽特殊製鋼株式会社 | Soft magnetic target material |
JP5698023B2 (en) * | 2011-02-16 | 2015-04-08 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
-
2013
- 2013-05-30 SG SG11201405335SA patent/SG11201405335SA/en unknown
- 2013-05-30 US US14/382,552 patent/US20150034483A1/en not_active Abandoned
- 2013-05-30 JP JP2013534880A patent/JP5447743B1/en active Active
- 2013-05-30 WO PCT/JP2013/065106 patent/WO2013183546A1/en active Application Filing
- 2013-05-30 MY MYPI2014702436A patent/MY170399A/en unknown
- 2013-05-30 CN CN201380011999.3A patent/CN104145043B/en active Active
- 2013-06-04 TW TW102119791A patent/TWI542719B/en active
- 2013-06-04 TW TW105114349A patent/TWI567217B/en active
-
2016
- 2016-01-27 US US15/008,433 patent/US9773654B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JPWO2013183546A1 (en) | 2016-01-28 |
CN104145043A (en) | 2014-11-12 |
MY170399A (en) | 2019-07-27 |
TWI542719B (en) | 2016-07-21 |
TW201627516A (en) | 2016-08-01 |
WO2013183546A1 (en) | 2013-12-12 |
US20160141158A1 (en) | 2016-05-19 |
US20150034483A1 (en) | 2015-02-05 |
CN104145043B (en) | 2015-11-25 |
JP5447743B1 (en) | 2014-03-19 |
TW201410900A (en) | 2014-03-16 |
US9773654B2 (en) | 2017-09-26 |
TWI567217B (en) | 2017-01-21 |
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