SG11201403264SA - Fe-Pt-Ag-C-BASED SPUTTERING TARGET HAVING C PARTICLES DISPERSED THEREIN, AND METHOD FOR PRODUCING SAME - Google Patents
Fe-Pt-Ag-C-BASED SPUTTERING TARGET HAVING C PARTICLES DISPERSED THEREIN, AND METHOD FOR PRODUCING SAMEInfo
- Publication number
- SG11201403264SA SG11201403264SA SG11201403264SA SG11201403264SA SG11201403264SA SG 11201403264S A SG11201403264S A SG 11201403264SA SG 11201403264S A SG11201403264S A SG 11201403264SA SG 11201403264S A SG11201403264S A SG 11201403264SA SG 11201403264S A SG11201403264S A SG 11201403264SA
- Authority
- SG
- Singapore
- Prior art keywords
- sputtering target
- particles dispersed
- producing same
- based sputtering
- producing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H01J37/3429—Plural materials
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
- C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
- C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/007—Ferrous alloys, e.g. steel alloys containing silver
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/04—Alloys based on a platinum group metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2301/00—Metallic composition of the powder or its coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2302/00—Metal Compound, non-Metallic compound or non-metal composition of the powder or its coating
- B22F2302/40—Carbon, graphite
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/10—Sintering only
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C2202/00—Physical properties
- C22C2202/02—Magnetic
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Manufacturing & Machinery (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012116813 | 2012-05-22 | ||
PCT/JP2013/060812 WO2013175884A1 (en) | 2012-05-22 | 2013-04-10 | Fe-Pt-Ag-C-BASED SPUTTERING TARGET HAVING C PARTICLES DISPERSED THEREIN, AND METHOD FOR PRODUCING SAME |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201403264SA true SG11201403264SA (en) | 2014-09-26 |
Family
ID=49623587
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201403264SA SG11201403264SA (en) | 2012-05-22 | 2013-04-10 | Fe-Pt-Ag-C-BASED SPUTTERING TARGET HAVING C PARTICLES DISPERSED THEREIN, AND METHOD FOR PRODUCING SAME |
Country Status (7)
Country | Link |
---|---|
US (1) | US20140360871A1 (en) |
JP (1) | JP5705993B2 (en) |
CN (1) | CN104169458B (en) |
MY (1) | MY167671A (en) |
SG (1) | SG11201403264SA (en) |
TW (1) | TW201402850A (en) |
WO (1) | WO2013175884A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012029498A1 (en) | 2010-08-31 | 2012-03-08 | Jx日鉱日石金属株式会社 | Fe-pt-type ferromagnetic material sputtering target |
CN103270554B (en) | 2010-12-20 | 2016-09-28 | 吉坤日矿日石金属株式会社 | It is dispersed with the Fe-Pt type sputtering target of C particle |
US9683284B2 (en) | 2011-03-30 | 2017-06-20 | Jx Nippon Mining & Metals Corporation | Sputtering target for magnetic recording film |
JP5457615B1 (en) | 2012-07-20 | 2014-04-02 | Jx日鉱日石金属株式会社 | Sputtering target for forming a magnetic recording film and method for producing the same |
JP2014034730A (en) * | 2012-08-10 | 2014-02-24 | Mitsui Mining & Smelting Co Ltd | Sintered body and sputtering target |
WO2016047236A1 (en) | 2014-09-22 | 2016-03-31 | Jx金属株式会社 | Sputtering target for magnetic recording film formation and production method therefor |
JP6310088B2 (en) * | 2014-09-30 | 2018-04-11 | Jx金属株式会社 | Tungsten sputtering target and manufacturing method thereof |
JP5999161B2 (en) * | 2014-10-08 | 2016-09-28 | 三菱マテリアル株式会社 | W-Ti sputtering target |
JP6437427B2 (en) * | 2015-03-04 | 2018-12-12 | Jx金属株式会社 | Sputtering target for magnetic recording media |
JP6553755B2 (en) | 2016-02-19 | 2019-07-31 | Jx金属株式会社 | Sputtering target for magnetic recording media and magnetic thin film |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6007623A (en) * | 1997-08-29 | 1999-12-28 | International Business Machines Corporation | Method for making horizontal magnetic recording media having grains of chemically-ordered FePt or CoPt |
US6692619B1 (en) * | 2001-08-14 | 2004-02-17 | Seagate Technology Llc | Sputtering target and method for making composite soft magnetic films |
JP4175829B2 (en) * | 2002-04-22 | 2008-11-05 | 株式会社東芝 | Sputtering target for recording medium and magnetic recording medium |
KR100470151B1 (en) * | 2002-10-29 | 2005-02-05 | 한국과학기술원 | HIGH-DENSITY MAGNETIC RECORDING MEDIA USING FePtC FILM AND MANUFACTURING METHOD THEREOF |
US7175925B2 (en) * | 2003-06-03 | 2007-02-13 | Seagate Technology Llc | Perpendicular magnetic recording media with improved crystallographic orientations and method of manufacturing same |
JP4846872B2 (en) * | 2009-03-03 | 2011-12-28 | Jx日鉱日石金属株式会社 | Sputtering target and manufacturing method thereof |
CN101717922A (en) * | 2009-12-23 | 2010-06-02 | 天津大学 | Method for sizing FePt grain with ordering tetragonal centroid structure in N-doped thinning film |
JP5459494B2 (en) * | 2010-03-28 | 2014-04-02 | 三菱マテリアル株式会社 | Sputtering target for forming a magnetic recording medium film and method for producing the same |
SG190918A1 (en) * | 2010-11-29 | 2013-07-31 | Mitsui Mining & Smelting Co | Sputtering target |
JP5041262B2 (en) * | 2011-01-31 | 2012-10-03 | 三菱マテリアル株式会社 | Sputtering target for forming a magnetic recording medium film and method for producing the same |
US9683284B2 (en) * | 2011-03-30 | 2017-06-20 | Jx Nippon Mining & Metals Corporation | Sputtering target for magnetic recording film |
JP5912559B2 (en) * | 2011-03-30 | 2016-04-27 | 田中貴金属工業株式会社 | Method for producing FePt-C sputtering target |
MY161774A (en) * | 2011-09-26 | 2017-05-15 | Jx Nippon Mining & Metals Corp | Fe-pt-c based sputtering target |
-
2013
- 2013-04-10 US US14/372,849 patent/US20140360871A1/en not_active Abandoned
- 2013-04-10 MY MYPI2014701637A patent/MY167671A/en unknown
- 2013-04-10 WO PCT/JP2013/060812 patent/WO2013175884A1/en active Application Filing
- 2013-04-10 SG SG11201403264SA patent/SG11201403264SA/en unknown
- 2013-04-10 CN CN201380014650.5A patent/CN104169458B/en active Active
- 2013-04-10 JP JP2013533038A patent/JP5705993B2/en active Active
- 2013-04-15 TW TW102113251A patent/TW201402850A/en unknown
Also Published As
Publication number | Publication date |
---|---|
CN104169458B (en) | 2017-02-22 |
TWI563108B (en) | 2016-12-21 |
CN104169458A (en) | 2014-11-26 |
WO2013175884A1 (en) | 2013-11-28 |
JP5705993B2 (en) | 2015-04-22 |
US20140360871A1 (en) | 2014-12-11 |
MY167671A (en) | 2018-09-21 |
TW201402850A (en) | 2014-01-16 |
JPWO2013175884A1 (en) | 2016-01-12 |
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