SG11201609093UA - Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium - Google Patents

Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium

Info

Publication number
SG11201609093UA
SG11201609093UA SG11201609093UA SG11201609093UA SG11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA
Authority
SG
Singapore
Prior art keywords
magnetic recording
target material
sputtering target
magnetic
recording medium
Prior art date
Application number
SG11201609093UA
Inventor
Hiroyuki Hasegawa
Noriaki Matsubara
Yumeki SHINMURA
Ryoji Hayashi
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of SG11201609093UA publication Critical patent/SG11201609093UA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/73Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
SG11201609093UA 2014-05-01 2015-04-02 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium SG11201609093UA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014094550 2014-05-01
JP2015027251A JP6405261B2 (en) 2014-05-01 2015-02-16 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
PCT/JP2015/060512 WO2015166762A1 (en) 2014-05-01 2015-04-02 Soft magnetic alloy for magnetic recording, sputtering target material and magnetic recording medium

Publications (1)

Publication Number Publication Date
SG11201609093UA true SG11201609093UA (en) 2016-12-29

Family

ID=54358499

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201609093UA SG11201609093UA (en) 2014-05-01 2015-04-02 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium

Country Status (6)

Country Link
JP (1) JP6405261B2 (en)
CN (1) CN106415720B (en)
MY (1) MY181595A (en)
SG (1) SG11201609093UA (en)
TW (1) TWI641705B (en)
WO (1) WO2015166762A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6116928B2 (en) * 2013-02-18 2017-04-19 山陽特殊製鋼株式会社 CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium
JP6660130B2 (en) 2015-09-18 2020-03-04 山陽特殊製鋼株式会社 CoFeB alloy target material
WO2017047754A1 (en) * 2015-09-18 2017-03-23 山陽特殊製鋼株式会社 Sputtering target material
JP2017057490A (en) 2015-09-18 2017-03-23 山陽特殊製鋼株式会社 Co-Fe-B based alloy target material
JP6442460B2 (en) * 2016-10-27 2018-12-19 山陽特殊製鋼株式会社 CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium
JP6226093B1 (en) * 2017-01-30 2017-11-08 Tdk株式会社 Soft magnetic alloys and magnetic parts
JP6784733B2 (en) * 2018-08-20 2020-11-11 山陽特殊製鋼株式会社 Co-based alloy for soft magnetic layer of magnetic recording medium
JP7552600B2 (en) 2019-08-26 2024-09-18 株式会社プロテリアル Fe-Co-Si-B-Nb target
JP6998431B2 (en) 2020-08-03 2022-02-04 山陽特殊製鋼株式会社 Co-based alloy for soft magnetic layer of magnetic recording medium

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10317082A (en) * 1997-05-20 1998-12-02 Sumitomo Metal Mining Co Ltd Al(aluminum) alloy for target material, and its manufacture
JP5605787B2 (en) * 2008-07-14 2014-10-15 山陽特殊製鋼株式会社 Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method
JP2010150591A (en) * 2008-12-25 2010-07-08 Hitachi Metals Ltd Cobalt-iron based alloy for soft-magnetic film
JP5631659B2 (en) * 2010-08-24 2014-11-26 山陽特殊製鋼株式会社 Soft magnetic alloy and sputtering target material for perpendicular magnetic recording medium, and magnetic recording medium
JP5714397B2 (en) * 2010-10-26 2015-05-07 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
JP5698023B2 (en) * 2011-02-16 2015-04-08 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
JP5917045B2 (en) * 2011-08-17 2016-05-11 山陽特殊製鋼株式会社 Alloy and sputtering target material for soft magnetic thin film layer in perpendicular magnetic recording medium
JP5474902B2 (en) * 2011-09-26 2014-04-16 山陽特殊製鋼株式会社 An alloy used for a soft magnetic thin film layer in a perpendicular magnetic recording medium, a sputtering target material, and a perpendicular magnetic recording medium having a soft magnetic thin film layer.
JP6302153B2 (en) * 2011-09-28 2018-03-28 山陽特殊製鋼株式会社 Soft magnetic thin film layer and perpendicular magnetic recording medium in perpendicular magnetic recording medium
JP5778052B2 (en) * 2012-02-03 2015-09-16 山陽特殊製鋼株式会社 Alloy for soft magnetic film layer having low saturation magnetic flux density used for magnetic recording medium and sputtering target material
JP6210503B2 (en) * 2012-08-13 2017-10-11 山陽特殊製鋼株式会社 Soft magnetic alloy for magnetic recording and sputtering target material

Also Published As

Publication number Publication date
TWI641705B (en) 2018-11-21
TW201604289A (en) 2016-02-01
MY181595A (en) 2020-12-29
CN106415720A (en) 2017-02-15
JP2015222609A (en) 2015-12-10
CN106415720B (en) 2019-04-12
JP6405261B2 (en) 2018-10-17
WO2015166762A1 (en) 2015-11-05

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