SG11201609093UA - Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium - Google Patents
Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording mediumInfo
- Publication number
- SG11201609093UA SG11201609093UA SG11201609093UA SG11201609093UA SG11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA SG 11201609093U A SG11201609093U A SG 11201609093UA
- Authority
- SG
- Singapore
- Prior art keywords
- magnetic recording
- target material
- sputtering target
- magnetic
- recording medium
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014094550 | 2014-05-01 | ||
JP2015027251A JP6405261B2 (en) | 2014-05-01 | 2015-02-16 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
PCT/JP2015/060512 WO2015166762A1 (en) | 2014-05-01 | 2015-04-02 | Soft magnetic alloy for magnetic recording, sputtering target material and magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201609093UA true SG11201609093UA (en) | 2016-12-29 |
Family
ID=54358499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201609093UA SG11201609093UA (en) | 2014-05-01 | 2015-04-02 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6405261B2 (en) |
CN (1) | CN106415720B (en) |
MY (1) | MY181595A (en) |
SG (1) | SG11201609093UA (en) |
TW (1) | TWI641705B (en) |
WO (1) | WO2015166762A1 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6116928B2 (en) * | 2013-02-18 | 2017-04-19 | 山陽特殊製鋼株式会社 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
JP6660130B2 (en) | 2015-09-18 | 2020-03-04 | 山陽特殊製鋼株式会社 | CoFeB alloy target material |
WO2017047754A1 (en) * | 2015-09-18 | 2017-03-23 | 山陽特殊製鋼株式会社 | Sputtering target material |
JP2017057490A (en) | 2015-09-18 | 2017-03-23 | 山陽特殊製鋼株式会社 | Co-Fe-B based alloy target material |
JP6442460B2 (en) * | 2016-10-27 | 2018-12-19 | 山陽特殊製鋼株式会社 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
JP6226093B1 (en) * | 2017-01-30 | 2017-11-08 | Tdk株式会社 | Soft magnetic alloys and magnetic parts |
JP6784733B2 (en) * | 2018-08-20 | 2020-11-11 | 山陽特殊製鋼株式会社 | Co-based alloy for soft magnetic layer of magnetic recording medium |
JP7552600B2 (en) | 2019-08-26 | 2024-09-18 | 株式会社プロテリアル | Fe-Co-Si-B-Nb target |
JP6998431B2 (en) | 2020-08-03 | 2022-02-04 | 山陽特殊製鋼株式会社 | Co-based alloy for soft magnetic layer of magnetic recording medium |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10317082A (en) * | 1997-05-20 | 1998-12-02 | Sumitomo Metal Mining Co Ltd | Al(aluminum) alloy for target material, and its manufacture |
JP5605787B2 (en) * | 2008-07-14 | 2014-10-15 | 山陽特殊製鋼株式会社 | Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method |
JP2010150591A (en) * | 2008-12-25 | 2010-07-08 | Hitachi Metals Ltd | Cobalt-iron based alloy for soft-magnetic film |
JP5631659B2 (en) * | 2010-08-24 | 2014-11-26 | 山陽特殊製鋼株式会社 | Soft magnetic alloy and sputtering target material for perpendicular magnetic recording medium, and magnetic recording medium |
JP5714397B2 (en) * | 2010-10-26 | 2015-05-07 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
JP5698023B2 (en) * | 2011-02-16 | 2015-04-08 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
JP5917045B2 (en) * | 2011-08-17 | 2016-05-11 | 山陽特殊製鋼株式会社 | Alloy and sputtering target material for soft magnetic thin film layer in perpendicular magnetic recording medium |
JP5474902B2 (en) * | 2011-09-26 | 2014-04-16 | 山陽特殊製鋼株式会社 | An alloy used for a soft magnetic thin film layer in a perpendicular magnetic recording medium, a sputtering target material, and a perpendicular magnetic recording medium having a soft magnetic thin film layer. |
JP6302153B2 (en) * | 2011-09-28 | 2018-03-28 | 山陽特殊製鋼株式会社 | Soft magnetic thin film layer and perpendicular magnetic recording medium in perpendicular magnetic recording medium |
JP5778052B2 (en) * | 2012-02-03 | 2015-09-16 | 山陽特殊製鋼株式会社 | Alloy for soft magnetic film layer having low saturation magnetic flux density used for magnetic recording medium and sputtering target material |
JP6210503B2 (en) * | 2012-08-13 | 2017-10-11 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording and sputtering target material |
-
2015
- 2015-02-16 JP JP2015027251A patent/JP6405261B2/en active Active
- 2015-04-02 WO PCT/JP2015/060512 patent/WO2015166762A1/en active Application Filing
- 2015-04-02 MY MYPI2016703962A patent/MY181595A/en unknown
- 2015-04-02 CN CN201580021621.0A patent/CN106415720B/en active Active
- 2015-04-02 SG SG11201609093UA patent/SG11201609093UA/en unknown
- 2015-04-14 TW TW104111951A patent/TWI641705B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI641705B (en) | 2018-11-21 |
TW201604289A (en) | 2016-02-01 |
MY181595A (en) | 2020-12-29 |
CN106415720A (en) | 2017-02-15 |
JP2015222609A (en) | 2015-12-10 |
CN106415720B (en) | 2019-04-12 |
JP6405261B2 (en) | 2018-10-17 |
WO2015166762A1 (en) | 2015-11-05 |
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