SG10201500333SA - Sputtering Target for Magnetic Recording Medium - Google Patents
Sputtering Target for Magnetic Recording MediumInfo
- Publication number
- SG10201500333SA SG10201500333SA SG10201500333SA SG10201500333SA SG10201500333SA SG 10201500333S A SG10201500333S A SG 10201500333SA SG 10201500333S A SG10201500333S A SG 10201500333SA SG 10201500333S A SG10201500333S A SG 10201500333SA SG 10201500333S A SG10201500333S A SG 10201500333SA
- Authority
- SG
- Singapore
- Prior art keywords
- recording medium
- magnetic recording
- sputtering target
- sputtering
- target
- Prior art date
Links
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014006534 | 2014-01-17 | ||
JP2015003272A JP6005767B2 (en) | 2014-01-17 | 2015-01-09 | Sputtering target for magnetic recording media |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201500333SA true SG10201500333SA (en) | 2015-08-28 |
Family
ID=54775034
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201500333SA SG10201500333SA (en) | 2014-01-17 | 2015-01-16 | Sputtering Target for Magnetic Recording Medium |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP6005767B2 (en) |
SG (1) | SG10201500333SA (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG11201805929XA (en) * | 2016-02-19 | 2018-08-30 | Jx Nippon Mining & Metals Corp | Sputtering target for magnetic recording medium, and magnetic thin film |
CN109844167B (en) * | 2016-12-28 | 2022-01-04 | 捷客斯金属株式会社 | Magnetic material sputtering target and method for producing same |
JP7357542B2 (en) | 2017-04-21 | 2023-10-06 | エーリコン・サーフェス・ソリューションズ・アーゲー・プフェフィコン | superalloy sputtering target |
JP7072664B2 (en) * | 2018-09-25 | 2022-05-20 | Jx金属株式会社 | Sputtering target and manufacturing method of sputtering target |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004206804A (en) * | 2002-12-25 | 2004-07-22 | Fuji Electric Device Technology Co Ltd | Magnetic recording medium and its manufacturing method |
JP2009215617A (en) * | 2008-03-11 | 2009-09-24 | Mitsui Mining & Smelting Co Ltd | Sputtering target material containing cobalt, chromium, and platinum matrix phase and oxide phase and method for producing the same |
CN102333905B (en) * | 2009-03-27 | 2013-09-04 | 吉坤日矿日石金属株式会社 | Ferromagnetic-material sputtering target of nonmagnetic-material particle dispersion type |
CN104105812B (en) * | 2011-08-23 | 2017-05-24 | 吉坤日矿日石金属株式会社 | Ferromagnetic sputtering target with minimized particle generation |
US9732414B2 (en) * | 2012-01-18 | 2017-08-15 | Jx Nippon Mining And Metals Corporation | Co—Cr—Pt-based sputtering target and method for producing same |
WO2013125259A1 (en) * | 2012-02-23 | 2013-08-29 | Jx日鉱日石金属株式会社 | Ferromagnetic material sputtering target containing chrome oxide |
US9773653B2 (en) * | 2012-02-23 | 2017-09-26 | Jx Nippon Mining & Metals Corporation | Ferromagnetic material sputtering target containing chromium oxide |
-
2015
- 2015-01-09 JP JP2015003272A patent/JP6005767B2/en active Active
- 2015-01-16 SG SG10201500333SA patent/SG10201500333SA/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP6005767B2 (en) | 2016-10-12 |
JP2015155573A (en) | 2015-08-27 |
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