SG11201805929XA - Sputtering target for magnetic recording medium, and magnetic thin film - Google Patents
Sputtering target for magnetic recording medium, and magnetic thin filmInfo
- Publication number
- SG11201805929XA SG11201805929XA SG11201805929XA SG11201805929XA SG11201805929XA SG 11201805929X A SG11201805929X A SG 11201805929XA SG 11201805929X A SG11201805929X A SG 11201805929XA SG 11201805929X A SG11201805929X A SG 11201805929XA SG 11201805929X A SG11201805929X A SG 11201805929XA
- Authority
- SG
- Singapore
- Prior art keywords
- sputtering target
- recording medium
- magnetic recording
- thin film
- magnetic
- Prior art date
Links
- 238000005477 sputtering target Methods 0.000 title abstract 4
- 239000010409 thin film Substances 0.000 title abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
- G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/16—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Powder Metallurgy (AREA)
- Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
SPUTTERING TARGET FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC THIN FILM 5 A sputtering target or a film containing 0.1 to 10 mol% of an oxide of one or more types of elements selected from Ca, K, Na, Pb, and Zn, 45 mol% or less of Cr, 45 mol% or less of Pt, and remainder being Co. An object of the present invention is to 10 provide a sputtering target capable of considerably reducing the particles caused by oxides and significantly improving the yield during deposition. It is thereby possible to deposit a quality magnetic recording layer and improve the yield of a magnetic recording medium. 15 Fig. 1
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016030488 | 2016-02-19 | ||
PCT/JP2017/000021 WO2017141557A1 (en) | 2016-02-19 | 2017-01-04 | Sputtering target for magnetic recording medium, and magnetic thin film |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201805929XA true SG11201805929XA (en) | 2018-08-30 |
Family
ID=59624963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201805929XA SG11201805929XA (en) | 2016-02-19 | 2017-01-04 | Sputtering target for magnetic recording medium, and magnetic thin film |
Country Status (5)
Country | Link |
---|---|
JP (2) | JP6713489B2 (en) |
CN (1) | CN108699678B (en) |
MY (1) | MY184023A (en) |
SG (1) | SG11201805929XA (en) |
WO (1) | WO2017141557A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6971901B2 (en) * | 2018-03-27 | 2021-11-24 | Jx金属株式会社 | Sputtering target |
JPWO2021014760A1 (en) * | 2019-07-23 | 2021-01-28 | ||
JP2021193202A (en) * | 2020-06-08 | 2021-12-23 | 三菱マテリアル株式会社 | Sputtering target, manufacturing method of sputtering target, and optical function film |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3522944B2 (en) * | 1996-01-26 | 2004-04-26 | 株式会社東芝 | Magnetic recording media |
JP2001014649A (en) * | 1999-06-28 | 2001-01-19 | Hitachi Ltd | Platelike body, inorganic compound substrate, magnetic recording medium and magnetic storage device |
JP2001250222A (en) * | 2000-03-01 | 2001-09-14 | Hitachi Ltd | Magnetic recording medium, its producing method and magnetic recorder using the method |
JP2002197633A (en) * | 2000-12-22 | 2002-07-12 | Sony Corp | Magnetic recording medium |
JP2004206805A (en) * | 2002-12-25 | 2004-07-22 | Fuji Electric Device Technology Co Ltd | Magnetic recording medium and its manufacturing method |
WO2005034095A1 (en) * | 2003-10-06 | 2005-04-14 | Kabushiki Kaisha Toshiba | Perpendicular magnetic recording medium, manufacturing method therefor, and magnetic read/write apparatus using the same |
JP4188196B2 (en) * | 2003-10-06 | 2008-11-26 | 株式会社東芝 | Perpendicular magnetic recording medium, manufacturing method thereof, and magnetic recording / reproducing apparatus using the same |
CN101685776B (en) * | 2008-09-27 | 2011-10-05 | 中国科学院半导体研究所 | Method for improving ohmic contact of ZnO film |
JPWO2010074171A1 (en) * | 2008-12-26 | 2012-06-21 | 三井金属鉱業株式会社 | Sputtering target and film forming method |
JP5660710B2 (en) * | 2010-08-03 | 2015-01-28 | 昭和電工株式会社 | Target manufacturing method, magnetic recording medium manufacturing method |
JP5888664B2 (en) * | 2010-12-20 | 2016-03-22 | Jx金属株式会社 | Ferromagnetic sputtering target |
CN104169457A (en) * | 2012-03-15 | 2014-11-26 | 吉坤日矿日石金属株式会社 | Magnetic material sputtering target and manufacturing method thereof |
JP2016193797A (en) * | 2013-09-13 | 2016-11-17 | 旭硝子株式会社 | Float glass manufacturing apparatus, and float glass manufacturing method using the apparatus |
JP6005767B2 (en) * | 2014-01-17 | 2016-10-12 | Jx金属株式会社 | Sputtering target for magnetic recording media |
-
2017
- 2017-01-04 JP JP2017567976A patent/JP6713489B2/en active Active
- 2017-01-04 CN CN201780011770.8A patent/CN108699678B/en active Active
- 2017-01-04 WO PCT/JP2017/000021 patent/WO2017141557A1/en active Application Filing
- 2017-01-04 SG SG11201805929XA patent/SG11201805929XA/en unknown
- 2017-01-04 MY MYPI2018702557A patent/MY184023A/en unknown
-
2020
- 2020-03-19 JP JP2020048629A patent/JP6881643B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
MY184023A (en) | 2021-03-17 |
JP2020147851A (en) | 2020-09-17 |
JP6881643B2 (en) | 2021-06-02 |
CN108699678A (en) | 2018-10-23 |
JPWO2017141557A1 (en) | 2018-10-18 |
WO2017141557A1 (en) | 2017-08-24 |
JP6713489B2 (en) | 2020-06-24 |
CN108699678B (en) | 2020-12-08 |
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