SG11202112079RA - Ni-BASED SPUTTERING TARGET AND MAGNETIC RECORDING MEDIUM - Google Patents

Ni-BASED SPUTTERING TARGET AND MAGNETIC RECORDING MEDIUM

Info

Publication number
SG11202112079RA
SG11202112079RA SG11202112079RA SG11202112079RA SG11202112079RA SG 11202112079R A SG11202112079R A SG 11202112079RA SG 11202112079R A SG11202112079R A SG 11202112079RA SG 11202112079R A SG11202112079R A SG 11202112079RA SG 11202112079R A SG11202112079R A SG 11202112079RA
Authority
SG
Singapore
Prior art keywords
recording medium
magnetic recording
sputtering target
based sputtering
target
Prior art date
Application number
SG11202112079RA
Inventor
Noriaki Matsubara
Miyuki Imoto
Yoshikazu Aikawa
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of SG11202112079RA publication Critical patent/SG11202112079RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
SG11202112079RA 2019-05-07 2020-05-01 Ni-BASED SPUTTERING TARGET AND MAGNETIC RECORDING MEDIUM SG11202112079RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019087667A JP7385370B2 (en) 2019-05-07 2019-05-07 Ni-based sputtering target and magnetic recording medium
PCT/JP2020/018399 WO2020226130A1 (en) 2019-05-07 2020-05-01 Ni-BASED SPUTTERING TARGET AND MAGNETIC RECORDING MEDIUM

Publications (1)

Publication Number Publication Date
SG11202112079RA true SG11202112079RA (en) 2021-11-29

Family

ID=73044284

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202112079RA SG11202112079RA (en) 2019-05-07 2020-05-01 Ni-BASED SPUTTERING TARGET AND MAGNETIC RECORDING MEDIUM

Country Status (5)

Country Link
JP (1) JP7385370B2 (en)
CN (1) CN113825856B (en)
SG (1) SG11202112079RA (en)
TW (1) TW202108798A (en)
WO (1) WO2020226130A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2021054136A1 (en) * 2019-09-19 2021-03-25
TWI769081B (en) * 2021-09-17 2022-06-21 光洋應用材料科技股份有限公司 Cr-ni-ti alloy target and method of preparing the same

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080131735A1 (en) * 2006-12-05 2008-06-05 Heraeus Incorporated Ni-X, Ni-Y, and Ni-X-Y alloys with or without oxides as sputter targets for perpendicular magnetic recording
JP5370917B2 (en) * 2009-04-20 2013-12-18 日立金属株式会社 Method for producing Fe-Co-Ni alloy sputtering target material
JP5656104B2 (en) 2009-07-01 2015-01-21 日立金属株式会社 Fe-Co-Ni alloy sputtering target material
JP5958822B2 (en) * 2011-12-22 2016-08-02 日立金属株式会社 Method for producing Mo alloy sputtering target material and Mo alloy sputtering target material
JP5812217B1 (en) * 2014-04-17 2015-11-11 三菱マテリアル株式会社 Sputtering target and manufacturing method of sputtering target
JP6581780B2 (en) * 2015-02-09 2019-09-25 山陽特殊製鋼株式会社 Ni-based target material with excellent sputtering properties
JP6681019B2 (en) 2015-02-25 2020-04-15 日立金属株式会社 Sputtering target material for forming laminated wiring film and coating layer for electronic parts
WO2016143858A1 (en) 2015-03-12 2016-09-15 山陽特殊製鋼株式会社 Ni-BASED SPUTTERING TARGET MATERIAL AND MAGNETIC RECORDING MEDIUM
JP6431496B2 (en) * 2016-04-13 2018-11-28 山陽特殊製鋼株式会社 Alloy for seed layer of magnetic recording medium, sputtering target material, and magnetic recording medium
TWI636149B (en) * 2016-09-12 2018-09-21 日商Ｊｘ金屬股份有限公司 Ferromagnetic sputtering target

Also Published As

Publication number Publication date
CN113825856A (en) 2021-12-21
TW202108798A (en) 2021-03-01
CN113825856B (en) 2024-04-02
JP2020183557A (en) 2020-11-12
WO2020226130A1 (en) 2020-11-12
JP7385370B2 (en) 2023-11-22

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