SG10201802974YA - Sputtering target and method for manufacturing same - Google Patents

Sputtering target and method for manufacturing same

Info

Publication number
SG10201802974YA
SG10201802974YA SG10201802974YA SG10201802974YA SG10201802974YA SG 10201802974Y A SG10201802974Y A SG 10201802974YA SG 10201802974Y A SG10201802974Y A SG 10201802974YA SG 10201802974Y A SG10201802974Y A SG 10201802974YA SG 10201802974Y A SG10201802974Y A SG 10201802974YA
Authority
SG
Singapore
Prior art keywords
target
sputtering target
manufacturing same
manufacturing
cua
Prior art date
Application number
SG10201802974YA
Inventor
Hidetaka Yakabe
Jun Fukuoka
Koichi Sakamaki
Hiroaki Sogame
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Publication of SG10201802974YA publication Critical patent/SG10201802974YA/en

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  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)

Abstract

SPUTTERING TARGET AND METHOD FOR MANUFACTURING SAME OF THE DISCLOSURE Provided are a target capable of suppressing cracks in the target and suitable for forming, for example, a soft magnetic film of a heat-assisted magnetic recording medium, and a method for manufacturing the target. In a sputtering target having a composition formula expressed as Fe100-a-b-c-Cua-Sib-Mc in terms of atomic ratio, wherein 0.1≦ a≦ 5.0, 10.0≦ b≦ 20.0, 10.0≦ c≦ 25.0, and M is one or more elements selected from Nb and B, containing a remainder composed of unavoidable impurities, and having a bending strength of 500 MPa or more, a number of Fe phases having an inscribed circle diameter of 1 μm or greater is preferably less than 1.0 per 60000 μm 2. FIG. 1
SG10201802974YA 2017-04-28 2018-04-10 Sputtering target and method for manufacturing same SG10201802974YA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017089797 2017-04-28

Publications (1)

Publication Number Publication Date
SG10201802974YA true SG10201802974YA (en) 2018-11-29

Family

ID=64478219

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201802974YA SG10201802974YA (en) 2017-04-28 2018-04-10 Sputtering target and method for manufacturing same

Country Status (4)

Country Link
JP (1) JP2018188726A (en)
MY (1) MY190417A (en)
SG (1) SG10201802974YA (en)
TW (1) TWI683008B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7238527B2 (en) * 2018-08-09 2023-03-14 株式会社プロテリアル Soft magnetic film for heat-assisted magnetic recording medium and sputtering target for forming soft magnetic film for heat-assisted magnetic recording medium
WO2021039711A1 (en) * 2019-08-26 2021-03-04 日立金属株式会社 Fe-co-si-b-nb-based target
JPWO2021039712A1 (en) * 2019-08-26 2021-03-04
JP7371494B2 (en) 2019-12-27 2023-10-31 株式会社レゾナック Magnetic recording media and magnetic storage devices

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4881989A (en) * 1986-12-15 1989-11-21 Hitachi Metals, Ltd. Fe-base soft magnetic alloy and method of producing same
JP2718261B2 (en) * 1990-01-09 1998-02-25 住友金属工業株式会社 Magnetic alloy and method for producing the same
JP3253545B2 (en) 1996-12-17 2002-02-04 日本鋼管株式会社 Method and apparatus for eliminating clogging of coal loaded in coke oven coal
US6784588B2 (en) * 2003-02-03 2004-08-31 Metglas, Inc. Low core loss amorphous metal magnetic components for electric motors

Also Published As

Publication number Publication date
TWI683008B (en) 2020-01-21
JP2018188726A (en) 2018-11-29
MY190417A (en) 2022-04-21
TW201839150A (en) 2018-11-01

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