MY188941A - Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material - Google Patents
Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target materialInfo
- Publication number
- MY188941A MY188941A MYPI2018001725A MYPI2018001725A MY188941A MY 188941 A MY188941 A MY 188941A MY PI2018001725 A MYPI2018001725 A MY PI2018001725A MY PI2018001725 A MYPI2018001725 A MY PI2018001725A MY 188941 A MY188941 A MY 188941A
- Authority
- MY
- Malaysia
- Prior art keywords
- alloy
- recording medium
- flux density
- target material
- sputtering target
- Prior art date
Links
- 239000000956 alloy Substances 0.000 title abstract 3
- 229910045601 alloy Inorganic materials 0.000 title abstract 3
- 230000004907 flux Effects 0.000 title 1
- 238000005477 sputtering target Methods 0.000 title 1
- 239000013077 target material Substances 0.000 title 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 229910052733 gallium Inorganic materials 0.000 abstract 1
- 229910052732 germanium Inorganic materials 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052698 phosphorus Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 229910052718 tin Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
- 229910052727 yttrium Inorganic materials 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/14—Ferrous alloys, e.g. steel alloys containing titanium or zirconium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
.There is disclosed an alloy for a soft magnetic thin film layer in a magnetic recording medium, wherein the alloy comprises one or more selected from the group consisting of Y, Ti, Zr, Hf , V, Nb, Ta, Cr, Mo, W, Mn, Ni, Cu, Al, B, C, Si, P, Zn, Ga, Ge, and Sn, and the balance Co and Fe; and in at%, the following formulae (1) to (5): (1) 0.50<Fe%/(Fe%+Co%)<0.90; (2)5<TAM<23; (3) 18<TAM+TNM<23; (4) 0<(Nb%+Ta%)/TAM+TNM)<0.74; and (5) 0<Ti%+Zr%+Hf%+B%/2<6 are satisfied, with the proviso that TAM and Tnm ARE: TAM=Y%+Ti%+Zr%+Hf%+V%+Nb%+Ta%+B%/2; and TNM=Cr%+Mo%+W%+Mn%+Ni%/3+Cu%/3+Al%+C%+Si%+P%+Zn%+Ga%+Ge%+Sn%, respectively (Fig. 1)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012022096A JP5778052B2 (en) | 2012-02-03 | 2012-02-03 | Alloy for soft magnetic film layer having low saturation magnetic flux density used for magnetic recording medium and sputtering target material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY188941A true MY188941A (en) | 2022-01-13 |
Family
ID=48905411
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2018001726A MY190845A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
| MYPI2018001725A MY188941A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
| MYPI2014702057A MY171769A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2018001726A MY190845A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2014702057A MY171769A (en) | 2012-02-03 | 2013-02-01 | Alloy for soft magnetic film layers, which has low saturation magnetic flux density and is to be used in magnetic recording medium, and sputtering target material |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP5778052B2 (en) |
| CN (1) | CN104081455B (en) |
| MY (3) | MY190845A (en) |
| SG (3) | SG10201510619PA (en) |
| TW (1) | TWI547567B (en) |
| WO (1) | WO2013115384A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6116928B2 (en) * | 2013-02-18 | 2017-04-19 | 山陽特殊製鋼株式会社 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| JP6405261B2 (en) * | 2014-05-01 | 2018-10-17 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
| TWI646208B (en) * | 2015-02-26 | 2019-01-01 | 光洋應用材料科技股份有限公司 | Amorphous soft-magnetic target and material |
| JP6442460B2 (en) * | 2016-10-27 | 2018-12-19 | 山陽特殊製鋼株式会社 | CoFe-based alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| JP6784733B2 (en) * | 2018-08-20 | 2020-11-11 | 山陽特殊製鋼株式会社 | Co-based alloy for soft magnetic layer of magnetic recording medium |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4919162B2 (en) * | 2007-04-10 | 2012-04-18 | 日立金属株式会社 | Fe-Co alloy sputtering target material and method for producing Fe-Co alloy sputtering target material |
| JP2009070444A (en) * | 2007-09-11 | 2009-04-02 | Hitachi Global Storage Technologies Netherlands Bv | Perpendicular magnetic recording medium |
| JP5397755B2 (en) * | 2008-06-17 | 2014-01-22 | 日立金属株式会社 | Fe-Co alloy sputtering target material for soft magnetic film formation |
| JP5605787B2 (en) * | 2008-07-14 | 2014-10-15 | 山陽特殊製鋼株式会社 | Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method |
| JP5425530B2 (en) * | 2009-06-10 | 2014-02-26 | 山陽特殊製鋼株式会社 | CoFeNi alloy and sputtering target material for soft magnetic film layer in perpendicular magnetic recording medium |
| JP5385018B2 (en) * | 2009-06-12 | 2014-01-08 | 山陽特殊製鋼株式会社 | Raw material powder for sputtering target material for producing soft magnetic film having high sputtering rate and sputtering target material |
| JP2011181140A (en) * | 2010-03-01 | 2011-09-15 | Hitachi Metals Ltd | Fe-Co BASED ALLOY SOFT MAGNETIC FILM FOR MAGNETIC RECORDING MEDIUM |
-
2012
- 2012-02-03 JP JP2012022096A patent/JP5778052B2/en active Active
-
2013
- 2013-02-01 TW TW102103965A patent/TWI547567B/en not_active IP Right Cessation
- 2013-02-01 MY MYPI2018001726A patent/MY190845A/en unknown
- 2013-02-01 MY MYPI2018001725A patent/MY188941A/en unknown
- 2013-02-01 SG SG10201510619PA patent/SG10201510619PA/en unknown
- 2013-02-01 MY MYPI2014702057A patent/MY171769A/en unknown
- 2013-02-01 SG SG10201609320PA patent/SG10201609320PA/en unknown
- 2013-02-01 CN CN201380007516.2A patent/CN104081455B/en not_active Expired - Fee Related
- 2013-02-01 SG SG11201404317QA patent/SG11201404317QA/en unknown
- 2013-02-01 WO PCT/JP2013/052400 patent/WO2013115384A1/en active Application Filing
Also Published As
| Publication number | Publication date |
|---|---|
| JP2013161497A (en) | 2013-08-19 |
| CN104081455A (en) | 2014-10-01 |
| TW201402835A (en) | 2014-01-16 |
| TWI547567B (en) | 2016-09-01 |
| MY171769A (en) | 2019-10-29 |
| SG10201609320PA (en) | 2016-12-29 |
| CN104081455B (en) | 2017-05-24 |
| SG10201510619PA (en) | 2016-01-28 |
| JP5778052B2 (en) | 2015-09-16 |
| MY190845A (en) | 2022-05-12 |
| SG11201404317QA (en) | 2014-10-30 |
| WO2013115384A1 (en) | 2013-08-08 |
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