TWI798580B - Fe-Si-B-Nb system target - Google Patents

Fe-Si-B-Nb system target Download PDF

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TWI798580B
TWI798580B TW109128819A TW109128819A TWI798580B TW I798580 B TWI798580 B TW I798580B TW 109128819 A TW109128819 A TW 109128819A TW 109128819 A TW109128819 A TW 109128819A TW I798580 B TWI798580 B TW I798580B
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福岡淳
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日商日立金屬股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B22CASTING; POWDER METALLURGY
    • B22FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
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    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C30/00Alloys containing less than 50% by weight of each constituent
    • C22C30/02Alloys containing less than 50% by weight of each constituent containing copper
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    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
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    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
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    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/14Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
    • H01F1/147Alloys characterised by their composition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/14Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
    • H01F1/20Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder
    • H01F1/22Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys in the form of particles, e.g. powder pressed, sintered, or bound together
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

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  • Chemical & Material Sciences (AREA)
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Abstract

本發明提供一種Fe-Si-B-Nb系靶材,在靶材的機械加工中,能夠抑制切削工具的刀片的磨耗或破損,抑制靶材主體的裂紋或缺口的產生,還能夠抑制靶材表面的凹凸的產生。本發明的Fe-Si-B-Nb系靶材中,原子比的組成式由Fe100-X-Y-Z-a SiX BY NbZ Ma 、15≦X+Y≦35、0.3≦X/Y≦2.0、1≦Z≦20、0<a≦20表示,M是選自由Al、Ti、V、Cr、Mn、Cu、Zr、Mo、W及C所組成的群組中的一種以上的元素,剩餘部分包含不可避免的雜質,且在5個測定點進行測定的維氏硬度的平均值為300 HV~1100 HV,且所述維氏硬度較佳為處於500 HV~1000 HV的範圍。The present invention provides a Fe-Si-B-Nb based target material, which can suppress the wear or damage of the blade of the cutting tool, suppress the generation of cracks or gaps in the target material body, and can also suppress the target material in the machining of the target material. Occurrence of unevenness on the surface. In the Fe-Si-B-Nb based target material of the present invention, the composition formula of the atomic ratio is Fe 100-XYZa Si X B Y Nb Z Ma , 15≦X+Y≦35, 0.3≦X/Y≦2.0, 1≦Z≦20, 0<a≦20 means that M is one or more elements selected from the group consisting of Al, Ti, V, Cr, Mn, Cu, Zr, Mo, W, and C, and the rest Inevitable impurities are included, and the average value of the Vickers hardness measured at 5 measurement points is 300 HV to 1100 HV, and the Vickers hardness is preferably in the range of 500 HV to 1000 HV.

Description

Fe-Si-B-Nb系靶材Fe-Si-B-Nb system target

本發明是有關於一種例如用於形成軟磁性膜的Fe-Si-B-Nb系靶材。The present invention relates to, for example, an Fe-Si-B-Nb-based target used for forming a soft magnetic film.

以電子設備為首的各種產品的小型化、輕量化正在發展,功能性薄膜正在被適用。例如,在專利文獻1中,作為適合於磁頭等的芯材料的軟磁性膜,提出了以Fe為主要成分且包含選自由Nb、Nb-Ta及Ta所組成的群組中的金屬元素、選自由B(硼)及B-Si所組成的群組中的半金屬元素、以及N(氮)的軟磁性膜。所述由Fe-Si-B-Nb-N構成的軟磁性膜與以往的包含Co-Nb-Zr系合金的軟磁性膜相比,具有低矯頑力、低磁致伸縮及高飽和磁通密度等優異的軟磁性特性與良好的熱穩定性,並且在耐腐蝕性及耐磨耗性方面亦優異,因此是有用的技術。The miniaturization and weight reduction of various products including electronic equipment are progressing, and functional films are being applied. For example, in Patent Document 1, as a soft magnetic film suitable for a core material such as a magnetic head, a soft magnetic film containing Fe as a main component and containing a metal element selected from the group consisting of Nb, Nb-Ta, and Ta is proposed. A soft magnetic film of semi-metal elements in the group consisting of B (boron) and B-Si, and N (nitrogen). The soft magnetic film composed of Fe-Si-B-Nb-N has low coercive force, low magnetostriction and high saturation magnetic flux compared with the conventional soft magnetic film containing Co-Nb-Zr alloy. It is a useful technology because it has excellent soft magnetic properties such as density and good thermal stability, and is also excellent in corrosion resistance and wear resistance.

而且,所述由Fe-Si-B-Nb-N構成的軟磁性膜例如可藉由濺射法形成。具體而言,提出了如下的方法:使用以Fe為主要成分且包含選自由Nb、Nb-Ta及Ta所組成的群組中的金屬元素、選自由B及B-Si所組成的群組中的半金屬元素的Fe-Si-B-Nb系合金作為靶材,在Ar等惰性濺射氣體中週期性地混合氮氣,藉此形成在膜厚方向上產生了組成調變的膜,其後進行熱處理。 [現有技術文獻] [專利文獻]Furthermore, the soft magnetic film composed of Fe-Si-B-Nb-N can be formed by sputtering, for example. Specifically, the following method is proposed: using Fe as the main component and containing a metal element selected from the group consisting of Nb, Nb-Ta and Ta, a metal element selected from the group consisting of B and B-Si The Fe-Si-B-Nb alloy of the half-metal element is used as the target, and nitrogen gas is periodically mixed in an inert sputtering gas such as Ar to form a film whose composition is modulated in the film thickness direction, and then Carry out heat treatment. [Prior art literature] [Patent Document]

[專利文獻1]日本專利特開平2-163911號公報[Patent Document 1] Japanese Patent Laid-Open No. 2-163911

[發明所欲解決之課題] 專利文獻1中揭示的Fe-Si-B-Nb系合金靶材是在加工成靶材的形狀尺寸的機械加工時,靶材主體的裂紋、缺口、脫落產生的可能性高的所謂難切削材。因此,在機械加工時,有時會導致切削工具的刀片的磨耗或破損,在獲得的靶材的表面誘發凹凸,或視情況使靶材主體破損。[Problems to be Solved by the Invention] The Fe-Si-B-Nb-based alloy target disclosed in Patent Document 1 is a so-called difficult-to-cut material with a high possibility of cracks, chipping, and falling off of the target body during machining to the shape and size of the target. . Therefore, during machining, the blade of the cutting tool may be worn or damaged, and unevenness may be induced on the surface of the obtained target material, or the target material body may be damaged in some cases.

本發明的目的在於提供一種Fe-Si-B-Nb系靶材,在Fe-Si-B-Nb系靶材(以下亦簡稱為「靶材」)的機械加工中,能夠抑制切削工具的刀片的磨耗或破損,抑制靶材主體的裂紋或缺口的產生,還能夠抑制靶材表面的凹凸的產生。 [解決課題之手段]The object of the present invention is to provide a Fe-Si-B-Nb-based target material, which can suppress the blade of the cutting tool in the machining of the Fe-Si-B-Nb-based target material (hereinafter also referred to as "target material"). Wear or breakage of the target material can be suppressed, cracks or gaps in the target body can be suppressed, and unevenness on the target surface can also be suppressed. [Means to solve the problem]

關於本發明的靶材,原子比的組成式由Fe100-X-Y-Z-a SiX BY NbZ Ma 、15≦X+Y≦35、0.3≦X/Y≦2.0、1≦Z≦20、0<a≦20表示,M是選自由Al、Ti、V、Cr、Mn、Cu、Zr、Mo、W及C所組成的群組中的一種以上的元素,剩餘部分包含不可避免的雜質,且在5個測定點進行測定的維氏硬度(Vickers hardness)的平均值為300 HV~1100 HV。Regarding the target material of the present invention, the atomic ratio composition formula is Fe 100-XYZa Si X B Y Nb Z M a , 15≦X+Y≦35, 0.3≦X/Y≦2.0, 1≦Z≦20, 0< a≦20 means that M is one or more elements selected from the group consisting of Al, Ti, V, Cr, Mn, Cu, Zr, Mo, W, and C, and the remainder contains unavoidable impurities, and in The average value of the Vickers hardness (Vickers hardness) measured at five measurement points was 300 HV to 1100 HV.

本發明的靶材的所述在5個測定點進行測定的維氏硬度的平均值較佳為500 HV~1000 HV。 [發明的效果]The average value of the Vickers hardness measured at five measurement points of the target material of the present invention is preferably 500 HV to 1000 HV. [Effect of the invention]

本發明在靶材的機械加工中,能夠抑制切削工具的刀片的磨耗或破損,抑制靶材主體的裂紋或缺口的產生,還能夠抑制靶材表面的凹凸的產生。因此,成為對製造上述軟磁特性、熱穩定性、耐腐蝕性、耐磨耗性等優異的零件有用的技術。In the machining of the target, the present invention can suppress the abrasion or breakage of the blade of the cutting tool, suppress the generation of cracks or notches in the target body, and can also suppress the generation of unevenness on the surface of the target. Therefore, it becomes a technique useful for manufacturing parts excellent in the above-mentioned soft magnetic properties, thermal stability, corrosion resistance, wear resistance, and the like.

本發明的靶材的由日本工業標準(Japanese industrial standard,JIS) Z 2244規定的維氏硬度在300 HV~1100 HV的範圍。 本發明的靶材藉由使在5個測定點進行測定的維氏硬度的平均值為300 HV~1100 HV的特定範圍,在實施用於形成靶材的形狀尺寸的切削加工或研磨加工等機械加工時,除了能夠抑制靶材主體的裂紋或缺口的產生之外,還能夠抑制表面的凹凸的產生。因此,本發明的靶材成為具有平滑的表面的靶材,能夠抑制異常放電的誘發或結核(nodule)飛散而附著在被處理材上。較佳為將上述的在5個測定點進行測定的維氏硬度全部設為300 HV~1100 HV的特定範圍。The target material of the present invention has a Vickers hardness specified by Japanese industrial standard (JIS) Z 2244 in the range of 300 HV to 1100 HV. The target of the present invention makes the average value of the Vickers hardness measured at 5 measurement points within a specific range of 300 HV to 1100 HV, and is used for machining such as cutting or grinding to form the shape and size of the target. During processing, in addition to suppressing the occurrence of cracks or notches in the target body, it is also possible to suppress the occurrence of unevenness on the surface. Therefore, the target material of the present invention has a smooth surface, and it is possible to suppress induction of abnormal discharge or scattering of nodules and adhesion to the target material. It is preferable to set all the Vickers hardnesses measured at the above-mentioned five measurement points to a specific range of 300 HV to 1100 HV.

另外,本發明的靶材藉由將維氏硬度設為300 HV以上,例如能夠抑制在銑床、車床等的刀片上生成積屑瘤(built-up edge)。即,本發明的靶材能夠抑制隨著切削加工的進行,伴隨著積屑瘤的成長的刀片的切入量逐漸變大,在切削開始時和切削結束時能夠減小靶材的尺寸差,並且還能夠抑制隨著積屑瘤的剝離的刀片的破損。In addition, the target material of the present invention can suppress the generation of built-up edge (built-up edge) on inserts such as milling machines and lathes, for example, by setting the Vickers hardness to 300 HV or more. That is, the target material of the present invention can suppress the cutting amount of the blade accompanying the growth of the built-up edge from gradually increasing as the cutting process progresses, and can reduce the size difference of the target material at the start of cutting and the end of cutting, and It is also possible to suppress the breakage of the blade accompanying the peeling of the built-up edge.

另外,如果在靶材的侵蝕區域,例如在Fe系合金基質相中存在低硬度的部位,則存在僅低硬度的部位殘存或脫落的情況,靶材的侵蝕區域的表面變粗糙,成膜時容易成為異常放電的起點。因此,本發明的靶材將維氏硬度設為300 HV以上。而且,自與上述同樣的理由出發,本發明的實施方式的靶材較佳為維氏硬度為500 HV以上,更佳為550 HV以上。In addition, if there is a low-hardness part in the eroded region of the target, for example, in the Fe-based alloy matrix phase, only the low-hardness part will remain or fall off, and the surface of the eroded region of the target will become rough. It is easy to become the starting point of abnormal discharge. Therefore, the target material of the present invention has a Vickers hardness of 300 HV or more. And, from the same reason as above, the target material according to the embodiment of the present invention preferably has a Vickers hardness of 500 HV or higher, more preferably 550 HV or higher.

本發明的靶材藉由使維氏硬度為1100 HV以下,能夠抑制例如銑床或車床等的刀片的磨耗量。即,本發明的靶材隨著進行切削加工,伴隨著刀片的磨耗的刀片的切入量逐漸變小,除了能夠抑制在切削開始時和切削結束時靶材的尺寸差變大的情況之外,還能夠抑制刀片的破損。而且,自與上述同樣的理由出發,本發明的實施方式的靶材較佳為維氏硬度為1000 HV以下,更佳為950 HV以下。The target material of this invention can suppress the abrasion amount of the insert, such as a milling machine or a lathe, for example, by making a Vickers hardness 1100 HV or less. That is, as the target material of the present invention is cut, the cutting amount of the blade accompanying the wear of the blade gradually decreases, and in addition to being able to suppress the dimensional difference between the target material at the start of cutting and the end of cutting from becoming large, Breakage of the blade can also be suppressed. And, from the same reason as above, the target material according to the embodiment of the present invention preferably has a Vickers hardness of 1000 HV or less, more preferably 950 HV or less.

本發明中所說的維氏硬度是指,除了抑制上述靶材主體的裂紋或缺口的產生之外,自抑制成膜時的異常放電的產生的觀點出發,在靶材的侵蝕面的任意5個測定點測定的維氏硬度的平均值處於300 HV~1100 HV的範圍內。而且,維氏硬度的測定位置設為在靶材的侵蝕面的平面方向上,相當於外周部的任意4個位置和相當於中央部的位置的合計5處。此時,負荷為9.8 N,加壓時間為10秒。 另外,本發明的實施方式的靶材自維氏硬度為300 HV~1100 HV的觀點出發,較佳為在金屬組織中不具有Fe-Si-B-Nb系的複合化合物相。The Vickers hardness mentioned in the present invention means that, in addition to suppressing the above-mentioned generation of cracks or cracks in the main body of the target, from the viewpoint of suppressing the generation of abnormal discharge during film formation, the hardness on any 5 points of the eroded surface of the target is The average value of the Vickers hardness measured at each measurement point is in the range of 300 HV to 1100 HV. In addition, the Vickers hardness was measured at a total of 5 positions corresponding to arbitrary four positions on the outer peripheral portion and positions corresponding to the center portion in the planar direction of the eroded surface of the target. At this time, the load was 9.8 N, and the pressing time was 10 seconds. In addition, the target material according to the embodiment of the present invention preferably does not have a Fe-Si-B-Nb-based composite compound phase in the metal structure from the viewpoint of a Vickers hardness of 300 HV to 1100 HV.

關於本發明的靶材,原子比的組成式由Fe100-X-Y-Z-a SiX BY NbZ Ma 、15≦X+Y≦35、0.3≦X/Y≦2.0、1≦Z≦20、0<a≦20表示,M是選自由Al、Ti、V、Cr、Mn、Cu、Zr、Mo、W及C所組成的群組中的一種以上的元素,剩餘部分包含不可避免的雜質。Si、B、Nb及M元素的含量可在不大幅損害軟磁特性、熱穩定性、耐腐蝕性、耐磨耗性的範圍內適當調整。 本發明的靶材藉由使Si與B的合計量、即組成式的X+Y為15以上,可獲得具有低矯頑力的軟磁性膜。而且,自與上述同樣的理由出發,本發明的實施方式的靶材較佳為將X+Y設為20以上。 另外,本發明的靶材藉由使X+Y為35以下,可獲得具有高飽和磁通密度的軟磁性膜。而且,自與上述同樣的理由出發,本發明的實施方式的靶材較佳為使X+Y為33以下。Regarding the target material of the present invention, the atomic ratio composition formula is Fe 100-XYZa Si X B Y Nb Z M a , 15≦X+Y≦35, 0.3≦X/Y≦2.0, 1≦Z≦20, 0< a≦20 indicates that M is one or more elements selected from the group consisting of Al, Ti, V, Cr, Mn, Cu, Zr, Mo, W, and C, and the remainder contains unavoidable impurities. The contents of Si, B, Nb, and M elements can be appropriately adjusted within a range that does not greatly impair soft magnetic properties, thermal stability, corrosion resistance, and wear resistance. In the target material of the present invention, a soft magnetic film having a low coercive force can be obtained by setting the total amount of Si and B, that is, X+Y in the composition formula to 15 or more. Moreover, it is preferable that X+Y should be 20 or more in the target material which concerns on embodiment of this invention from the same reason as above. Moreover, the target material of this invention can obtain the soft magnetic film which has a high saturation magnetic flux density by making X+Y into 35 or less. Moreover, it is preferable that X+Y is 33 or less in the target material which concerns on embodiment of this invention from the same reason as above.

本發明的靶材藉由使Si與B的比率、即組成式的X/Y為0.3以上2.0以下,可獲得具有熱穩定性的軟磁性膜。而且,自與上述同樣的理由出發,本發明的實施方式的靶材較佳為將X/Y設為0.7以上1.6以下。The target material of the present invention can obtain a soft magnetic film having thermal stability by setting the ratio of Si to B, that is, X/Y of the composition formula, to be 0.3 to 2.0. Moreover, it is preferable that X/Y shall be 0.7 or more and 1.6 or less for the target material which concerns on embodiment of this invention from the same reason as above.

本發明的靶材藉由使Nb的含量、即組成式的Z為1以上,可獲得具有耐腐蝕性的軟磁性膜。而且,自與上述同樣的理由出發,本發明的實施方式的靶材較佳為將Z設為3以上。 另外,本發明的靶材藉由使Z設為20以下,可獲得具有高飽和磁通密度的軟磁性膜。而且,自與上述同樣的理由出發,本發明的實施方式的靶材較佳為將Z設為10以下。 再者,本發明的靶材藉由將Nb的一部分或全部取代為Ta,亦能夠獲得與所述同樣的效果。In the target material of the present invention, a soft magnetic film having corrosion resistance can be obtained by setting the Nb content, that is, Z in the composition formula to 1 or more. Moreover, it is preferable that Z is 3 or more in the target material which concerns on embodiment of this invention from the same reason as above. Moreover, the target material of this invention can obtain the soft magnetic film which has a high saturation magnetic flux density by making Z into 20 or less. Moreover, it is preferable that Z is 10 or less in the target material which concerns on embodiment of this invention from the same reason as above. In addition, the target material of this invention can also acquire the same effect as above by substituting a part or all of Nb with Ta.

本發明的靶材含有超過0的選自由Al、Ti、V、Cr、Mn、Cu、Zr、Mo、W及C所組成的群組中的一種以上的元素,即組成式的a超過0。藉此,本發明的靶材在對利用濺射等成膜的非晶膜進行熱處理時,具有微細的核的析出效果,能夠形成以該核為起點的微晶膜,從而能夠獲得具有低矯頑力的軟磁性膜。而且,自與上述相同的理由出發,本發明的實施方式的靶材較佳為將a設為0.5以上。 另外,本發明的靶材藉由使a為20以下,可獲得具有高飽和磁通密度的軟磁性膜。而且,自與上述相同的理由出發,本發明的實施方式的靶材較佳為將a設為10以下。而且,自與上述相同的理由出發,本發明實施方式的靶材較佳為將a設為5以下。The target of the present invention contains more than 0 one or more elements selected from the group consisting of Al, Ti, V, Cr, Mn, Cu, Zr, Mo, W, and C, that is, a in the composition formula exceeds 0. Thereby, when the target material of the present invention heat-treats an amorphous film formed by sputtering or the like, it has the effect of precipitation of fine nuclei, and can form a microcrystalline film starting from the nuclei, thereby obtaining a low-distortion film. Coercive soft magnetic film. Moreover, it is preferable that a is 0.5 or more in the target material which concerns on embodiment of this invention from the same reason as above. Moreover, the target material of this invention can obtain the soft magnetic film which has a high saturation magnetic flux density by making a into 20 or less. Moreover, it is preferable that a is 10 or less in the target material which concerns on embodiment of this invention from the same reason as above. Moreover, it is preferable that a is set to 5 or less in the target material which concerns on embodiment of this invention from the same reason as above.

本發明的靶材例如可藉由粉末燒結法獲得。具體而言,可藉由對以成為上述成分組成的方式混合純金屬粉末或合金粉末而得的混合粉末進行加壓燒結而獲得。作為合金粉末,為了儘量不在靶材的金屬組織中形成Fe-Si-B-Nb系的複合化合物相,較佳使用Fe-Si合金粉末、Fe-B合金粉末、Fe-Nb合金粉末、Fe-Si-B合金粉末、Fe-Si-Nb合金粉末、Fe-B-Nb合金粉末、Fe-Si-M合金粉末、Fe-B-M合金粉末、Fe-Nb-M合金粉末、Fe-Si-B-M合金粉末、Fe-Si-Nb-M合金粉末、Fe-B-Nb-M合金粉末。 而且,作為加壓燒結,例如可應用熱等靜壓加壓(hot isostatic pressing,HIP)法、熱壓法、通電燒結法等。The target material of the present invention can be obtained, for example, by a powder sintering method. Specifically, it can be obtained by pressurizing and sintering a mixed powder obtained by mixing pure metal powder or alloy powder so as to obtain the above component composition. As the alloy powder, in order not to form a Fe-Si-B-Nb complex compound phase in the metal structure of the target as much as possible, it is preferable to use Fe-Si alloy powder, Fe-B alloy powder, Fe-Nb alloy powder, Fe- Si-B alloy powder, Fe-Si-Nb alloy powder, Fe-B-Nb alloy powder, Fe-Si-M alloy powder, Fe-B-M alloy powder, Fe-Nb-M alloy powder, Fe-Si-B-M alloy Powder, Fe-Si-Nb-M alloy powder, Fe-B-Nb-M alloy powder. In addition, as pressure sintering, for example, a hot isostatic pressing (HIP) method, a hot pressing method, an electrical sintering method, or the like can be applied.

加壓燒結較佳為在燒結溫度700℃~1300℃、加壓壓力30 MPa~200 MPa、1小時~10小時的條件下進行。 藉由使燒結溫度為700℃以上,能夠進行粉末的燒結,能夠抑制空孔的產生。另外,藉由將燒結溫度設為1300℃以下,可抑制粉末的熔解。 本發明的靶材在對混合純金屬粉末而得的混合粉末進行HIP燒結時,自抑制Fe-Si-B-Nb系的複合化合物相的形成,並且抑制空孔的產生的方面考慮,較佳為在燒結溫度為700℃~900℃的條件下進行燒結。 另外,藉由使加壓壓力為30 MPa以上,能夠促進燒結的進行,抑制空孔的產生。並且,藉由使加壓壓力為200 MPa以下,能夠抑制燒結時殘留應力導入靶材,從而抑制燒結後的裂紋的產生。 另外,藉由使燒結時間為1小時以上,能夠促進燒結的進行,抑制空孔的產生。另外,藉由使燒結時間為10小時以下,可抑制製造效率的降低。 [實施例]The pressurized sintering is preferably carried out under conditions of a sintering temperature of 700° C. to 1300° C., a pressurized pressure of 30 MPa to 200 MPa, and 1 hour to 10 hours. By setting the sintering temperature to 700° C. or higher, the powder can be sintered and the generation of voids can be suppressed. In addition, melting of the powder can be suppressed by setting the sintering temperature to 1300° C. or lower. The target material of the present invention is preferable in terms of suppressing the formation of Fe-Si-B-Nb composite compound phase and suppressing the generation of voids when HIP sintering the mixed powder obtained by mixing pure metal powder. Sintering is carried out under the condition that the sintering temperature is 700°C to 900°C. In addition, by setting the applied pressure to 30 MPa or more, the progress of sintering can be promoted and the generation of voids can be suppressed. In addition, by setting the applied pressure to 200 MPa or less, it is possible to suppress the introduction of residual stress into the target during sintering, thereby suppressing the occurrence of cracks after sintering. In addition, by setting the sintering time to 1 hour or more, the progress of sintering can be accelerated, and generation of voids can be suppressed. In addition, by setting the sintering time to 10 hours or less, it is possible to suppress a decrease in production efficiency. [Example]

首先,準備Fe粉末、Si粉末、B粉末、Nb粉末及Cu粉末。而且,為了獲得作為本發明例1的靶材,以原子比的組成式為Fe66 Si13.5 B14.5 Nb5 Cu1 、(X+Y=28、X/Y=0.9、Z=5、a=1)的方式,稱重上述所準備的各粉末後,在V型混合機中混合,獲得混合粉末。然後,將該混合粉末填充到軟鐵製的膠囊中,在450℃、4小時的條件下進行脫氣密封。然後,在750℃、122 MPa、1小時的條件下,藉由HIP對所述膠囊進行加壓燒結,製作燒結體。First, Fe powder, Si powder, B powder, Nb powder, and Cu powder are prepared. Moreover, in order to obtain the target material as Example 1 of the present invention, the composition formula in atomic ratio is Fe 66 Si 13.5 B 14.5 Nb 5 Cu 1 , (X+Y=28, X/Y=0.9, Z=5, a= In the method 1), each powder prepared above is weighed and mixed in a V-type mixer to obtain a mixed powder. Then, the mixed powder was filled into a capsule made of soft iron, and degassed and sealed at 450° C. for 4 hours. Then, under the conditions of 750° C., 122 MPa, and 1 hour, the capsule was pressurized and sintered by HIP to produce a sintered body.

為了獲得作為本發明例2的靶材,準備成為原子比的組成式為Fe69.5 Si14.2 B15.3 Cu1 合金組成的氣體霧化粉及Nb粉末,以原子比的組成式為Fe66 Si13.5 B14.5 Nb5 Cu1 、(X+Y=28、X/Y=0.9、Z=5、a=1)的方式,稱重上述所準備的各粉末後,在V型混合機中混合,獲得混合粉末。然後,將該混合粉末填充到熱壓裝置的模具內,在1000℃、30 MPa、2小時的條件下進行加壓燒結,製作燒結體。In order to obtain the target material as Example 2 of the present invention, gas atomized powder and Nb powder composed of an alloy having the composition formula of Fe 69.5 Si 14.2 B 15.3 Cu 1 in atomic ratio were prepared, and the composition formula of atomic ratio was Fe 66 Si 13.5 B 14.5 Nb 5 Cu 1 , (X+Y=28, X/Y=0.9, Z=5, a=1), weigh the powders prepared above and mix them in a V-type mixer to obtain a mixed powder. Then, the mixed powder was filled into a mold of a hot press device, and pressurized and sintered under the conditions of 1000° C., 30 MPa, and 2 hours to produce a sintered body.

為了獲得作為本發明例3的靶材,準備Fe粉末、Si粉末、B粉末、Nb粉末及Ti粉末,以原子比的組成式為Fe60 Si4.5 B14.5 Nb1 Ti20 、(X+Y=19、X/Y=0.3、Z=1、a=20)的方式,稱重上述所準備的各粉末後,在V型混合機中混合,獲得混合粉末。然後,將該混合粉末填充到軟鐵製的膠囊中,在450℃、4小時的條件下進行脫氣密封。然後,在950℃、122 MPa、1小時的條件下,藉由HIP對所述膠囊進行加壓燒結,製作燒結體。In order to obtain the target material as Example 3 of the present invention, Fe powder, Si powder, B powder, Nb powder and Ti powder were prepared, and the composition formula in terms of atomic ratio was Fe 60 Si 4.5 B 14.5 Nb 1 Ti 20 , (X+Y= 19. X/Y=0.3, Z=1, a=20), after weighing the powders prepared above, mix them in a V-type mixer to obtain mixed powders. Then, the mixed powder was filled into a capsule made of soft iron, and degassed and sealed at 450° C. for 4 hours. Then, under the conditions of 950° C., 122 MPa, and 1 hour, the capsule was pressurized and sintered by HIP to produce a sintered body.

為了獲得作為本發明例4的靶材,準備Fe粉末、Si粉末、B粉末、Nb粉末及V粉末,以原子比的組成式為Fe44.9 Si23.3 B11.7 Nb20 V0.1 、(X+Y=35、X/Y=2.0、Z=20、a=0.1)的方式,稱重上述所準備的各粉末後,在V型混合機中混合,獲得混合粉末。然後,將該混合粉末填充到軟鐵製的膠囊中,在450℃、4小時的條件下進行脫氣密封。然後,在950℃、122 MPa、1小時的條件下,藉由HIP對所述膠囊進行加壓燒結,製作燒結體。In order to obtain the target material as Example 4 of the present invention, Fe powder, Si powder, B powder, Nb powder and V powder were prepared, and the composition formula in terms of atomic ratio was Fe 44.9 Si 23.3 B 11.7 Nb 20 V 0.1 , (X+Y= 35. X/Y=2.0, Z=20, a=0.1), after weighing the powders prepared above, mix them in a V-type mixer to obtain mixed powders. Then, the mixed powder was filled into a capsule made of soft iron, and degassed and sealed at 450° C. for 4 hours. Then, under the conditions of 950° C., 122 MPa, and 1 hour, the capsule was pressurized and sintered by HIP to produce a sintered body.

為了獲得作為本發明例5的靶材,準備Fe粉末、Si粉末、B粉末、Nb粉末及Cr粉末,以原子比的組成式為Fe56 Si8 B17 Nb9 Cr10 、(X+Y=25、X/Y=0.5、Z=9、a=10)的方式,稱重上述所準備的各粉末後,在V型混合機中混合,獲得混合粉末。然後,將該混合粉末填充到軟鐵製的膠囊中,在450℃、4小時的條件下進行脫氣密封。然後,在950℃、122 MPa、1小時的條件下,藉由HIP對所述膠囊進行加壓燒結,製作燒結體。In order to obtain the target material as Example 5 of the present invention, Fe powder, Si powder, B powder, Nb powder and Cr powder were prepared, and the composition formula in terms of atomic ratio was Fe 56 Si 8 B 17 Nb 9 Cr 10 , (X+Y= 25. X/Y=0.5, Z=9, a=10), after weighing the powders prepared above, mix them in a V-type mixer to obtain mixed powders. Then, the mixed powder was filled into a capsule made of soft iron, and degassed and sealed at 450° C. for 4 hours. Then, under the conditions of 950° C., 122 MPa, and 1 hour, the capsule was pressurized and sintered by HIP to produce a sintered body.

為了獲得作為本發明例6的靶材,準備Fe粉末、Si粉末、B粉末、Nb粉末及Mo粉末,以原子比的組成式為Fe65 Si9 B6 Nb15 Mo5 、(X+Y=15、X/Y=1.5、Z=15、a=5)的方式,稱重上述所準備的各粉末後,在V型混合機中混合,獲得混合粉末。然後,將該混合粉末填充到軟鐵製的膠囊中,在450℃、4小時的條件下進行脫氣密封。然後,在950℃、122 MPa、1小時的條件下,藉由HIP對所述膠囊進行加壓燒結,製作燒結體。In order to obtain the target material as Example 6 of the present invention, Fe powder, Si powder, B powder, Nb powder and Mo powder were prepared, and the composition formula in terms of atomic ratio was Fe 65 Si 9 B 6 Nb 15 Mo 5 , (X+Y= 15. X/Y=1.5, Z=15, a=5), after weighing the powders prepared above, mix them in a V-type mixer to obtain mixed powders. Then, the mixed powder was filled into a capsule made of soft iron, and degassed and sealed at 450° C. for 4 hours. Then, under the conditions of 950° C., 122 MPa, and 1 hour, the capsule was pressurized and sintered by HIP to produce a sintered body.

為了獲得作為本發明例7的靶材,準備Fe粉末、Si粉末、B粉末、Nb粉末、Mn粉末、Zr粉末及W粉末,以原子比的組成式為Fe58 Si13.5 B14.5 Nb5 Mn3 Zr3 W3 、(X+Y=28、X/Y=0.9、Z=5、a=9)的方式,稱重上述所準備的各粉末後,在V型混合機中混合,獲得混合粉末。然後,將該混合粉末填充到軟鐵製的膠囊中,在450℃、4小時的條件下進行脫氣密封。然後,在950℃、122 MPa、1小時的條件下,藉由HIP對所述膠囊進行加壓燒結,製作燒結體。In order to obtain the target material as Example 7 of the present invention, Fe powder, Si powder, B powder, Nb powder, Mn powder, Zr powder and W powder were prepared, and the composition formula in terms of atomic ratio was Fe 58 Si 13.5 B 14.5 Nb 5 Mn 3 Zr 3 W 3 , (X+Y=28, X/Y=0.9, Z=5, a=9), weigh the powders prepared above, and mix them in a V-type mixer to obtain a mixed powder . Then, the mixed powder was filled into a capsule made of soft iron, and degassed and sealed at 450° C. for 4 hours. Then, under the conditions of 950° C., 122 MPa, and 1 hour, the capsule was pressurized and sintered by HIP to produce a sintered body.

為了獲得作為比較例的靶材,準備原子比的組成式為Fe66 Si13.5 B14.5 Nb5 Cu1 (X+Y=28、X/Y=0.9、Z=5、a=1)的氣體霧化粉,填充到軟鐵製的膠囊中,在450℃、4小時的條件下進行脫氣密封。然後,在950℃、122 MPa、1小時的條件下,藉由HIP對上述膠囊進行加壓燒結,製作燒結體。In order to obtain a target as a comparative example, a gas mist with the atomic ratio composition formula Fe 66 Si 13.5 B 14.5 Nb 5 Cu 1 (X+Y=28, X/Y=0.9, Z=5, a=1) was prepared It was pulverized, filled into capsules made of soft iron, and degassed and sealed at 450° C. for 4 hours. Then, under the conditions of 950° C., 122 MPa, and 1 hour, the above-mentioned capsule was pressurized and sintered by HIP to produce a sintered body.

對上述獲得的各燒結體實施機械加工,製作靶材。此時,可確認到作為本發明例1~本發明例7的靶材在機械加工時均不產生裂紋,並且,精加工後的表面不產生凹凸,表面為平滑的狀態。 另一方面,作為比較例的靶材在機械加工時產生裂紋,無法機械加工成靶材形狀。Each of the sintered compacts obtained above was machined to produce a target. At this time, it was confirmed that none of the targets of Invention Example 1 to Invention Example 7 had cracks during machining, and that the surface after finishing was smooth without unevenness. On the other hand, the target as a comparative example had cracks during machining, and could not be machined into the shape of the target.

對於上述獲得的各燒結體,測定了在靶材的成為侵蝕面的面的平面方向上,相當於外周部的4個位置和相當於中央部的位置的合計5處的維氏硬度。再者,測定間隔是設定壓痕之間不受測定影響的距離進行測定的。而且,維氏硬度按照JIS Z 2244,使用明石製作所股份有限公司製造的MVK-E,測定了負荷為9.8 N、加壓時間為10秒時的值。其結果如表1所示。For each of the sintered bodies obtained above, the Vickers hardness was measured at a total of 5 locations at 4 locations corresponding to the outer peripheral portion and 5 locations corresponding to the central portion in the planar direction of the surface serving as the eroded surface of the target. It should be noted that the measurement interval is measured by setting a distance between indentations that is not affected by the measurement. In addition, the Vickers hardness was measured in accordance with JIS Z 2244 using MVK-E manufactured by Akashi Seisakusho Co., Ltd., and measured at a load of 9.8 N and a pressing time of 10 seconds. The results are shown in Table 1.

[表1] 維式硬度[HV] 測定點 平均值 1 2 3 4 5 本發明例1 609 622 630 833 914 722 本發明例2 893 903 884 896 881 891 本發明例3 1051 258 896 556 742 701 本發明例4 630 602 749 713 936 726 本發明例5 991 692 498 613 1090 777 本發明例6 463 486 373 507 341 434 本發明例7 551 830 619 1064 1173 847 比較例 1262 1239 1248 1239 1267 1251 [Table 1] Vickers Hardness [HV] Measuring point average value 1 2 3 4 5 Example 1 of the present invention 609 622 630 833 914 722 Example 2 of the present invention 893 903 884 896 881 891 Example 3 of the present invention 1051 258 896 556 742 701 Example 4 of the present invention 630 602 749 713 936 726 Example 5 of the present invention 991 692 498 613 1090 777 Example 6 of the present invention 463 486 373 507 341 434 Example 7 of the present invention 551 830 619 1064 1173 847 comparative example 1262 1239 1248 1239 1267 1251

作為比較例的靶材的維氏硬度的平均值超過了1100 HV。 與此相對,確認到本發明例1~本發明例7的靶材的維氏硬度的平均值均處於300 HV~1100 HV的範圍。 藉此可確認,本發明的靶材是在機械加工時抑制裂紋或缺口的產生、並且精加工後的表面不產生凹凸、表面平滑的靶材。藉此,本發明的靶材抑制異常放電的誘發或結核飛散而附著在被處理材上,從而能夠期待作為用於形成軟磁性膜的靶材而有用。The average value of the Vickers hardness of the target material which is a comparative example exceeded 1100 HV. On the other hand, it was confirmed that the average values of the Vickers hardnesses of the targets of Invention Example 1 to Invention Example 7 were all in the range of 300 HV to 1100 HV. From this, it can be confirmed that the target material of the present invention suppresses the occurrence of cracks or notches during machining, and has a smooth surface without unevenness on the surface after finishing. Thereby, the target of the present invention can be expected to be useful as a target for forming a soft magnetic film by suppressing induction of abnormal discharge or scattering of nodules and adhering to the target material.

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Claims (2)

一種Fe-Si-B-Nb系靶材,其中原子比的組成式由Fe100-X-Y-Z-aSiXBYNbZMa、15≦X+Y≦35、0.3≦X/Y≦2.0、1≦Z≦20、0<a≦20表示,M是選自由Al、Ti、V、Cr、Mn、Zr、Mo、W及C所組成的群組中的一種以上的元素,剩餘部分包含不可避免的雜質,且在5個測定點進行測定的維氏硬度的平均值為300HV~1100HV,以及在金屬組織中不具有Fe-Si-B-Nb系的複合化合物相。 A Fe-Si-B-Nb based target, wherein the atomic ratio composition formula is Fe 100-XYZa Si X B Y Nb Z M a , 15≦X+Y≦35, 0.3≦X/Y≦2.0, 1≦ Z≦20, 0<a≦20 means that M is one or more elements selected from the group consisting of Al, Ti, V, Cr, Mn, Zr, Mo, W, and C, and the remainder contains unavoidable impurities, and the average value of the Vickers hardness measured at 5 measurement points is 300HV~1100HV, and there is no Fe-Si-B-Nb composite compound phase in the metal structure. 如請求項1所述的Fe-Si-B-Nb系靶材,其中所述在5個測定點進行測定的維氏硬度的平均值為500HV~1000HV。 The Fe-Si-B-Nb based target material according to claim 1, wherein the average value of the Vickers hardness measured at 5 measurement points is 500HV~1000HV.
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JPH02163911A (en) * 1988-12-16 1990-06-25 Matsushita Electric Ind Co Ltd Soft magnetic alloy film and manufacture thereof
EP0442760A2 (en) * 1990-02-16 1991-08-21 Matsushita Electric Industrial Co., Ltd. Soft magnetic alloy films and magnetic heads using the same
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TW201839150A (en) * 2017-04-28 2018-11-01 日商日立金屬股份有限公司 Sputtering target and method for manufacturing same

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