SG11201602163YA - Sputtering target for forming magnetic recording film and method for producing same - Google Patents

Sputtering target for forming magnetic recording film and method for producing same

Info

Publication number
SG11201602163YA
SG11201602163YA SG11201602163YA SG11201602163YA SG11201602163YA SG 11201602163Y A SG11201602163Y A SG 11201602163YA SG 11201602163Y A SG11201602163Y A SG 11201602163YA SG 11201602163Y A SG11201602163Y A SG 11201602163YA SG 11201602163Y A SG11201602163Y A SG 11201602163YA
Authority
SG
Singapore
Prior art keywords
magnetic recording
sputtering target
recording film
producing same
forming magnetic
Prior art date
Application number
SG11201602163YA
Inventor
Shin-Ichi Ogino
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of SG11201602163YA publication Critical patent/SG11201602163YA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/04—Alloys based on a platinum group metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C2202/00—Physical properties
    • C22C2202/02—Magnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
SG11201602163YA 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same SG11201602163YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013241537 2013-11-22
PCT/JP2014/080144 WO2015076190A1 (en) 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same

Publications (1)

Publication Number Publication Date
SG11201602163YA true SG11201602163YA (en) 2016-04-28

Family

ID=53179455

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201602163YA SG11201602163YA (en) 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same

Country Status (6)

Country Link
JP (2) JP6125661B2 (en)
CN (2) CN105793465B (en)
MY (2) MY177997A (en)
SG (1) SG11201602163YA (en)
TW (1) TWI642799B (en)
WO (1) WO2015076190A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023079857A1 (en) * 2021-11-05 2023-05-11 Ｊｘ金属株式会社 Fe-Pt-C-BASED SPUTTERING TARGET MEMBER, SPUTTERING TARGET ASSEMBLY, METHOD FOR FORMING FILM, AND METHOD FOR PRODUCING SPUTTERING TARGET MEMBER

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2610575B2 (en) * 1993-11-25 1997-05-14 株式会社 ジャパンエナジー W-Ti alloy target
US20070189916A1 (en) * 2002-07-23 2007-08-16 Heraeus Incorporated Sputtering targets and methods for fabricating sputtering targets having multiple materials
KR100470151B1 (en) * 2002-10-29 2005-02-05 한국과학기술원 HIGH-DENSITY MAGNETIC RECORDING MEDIA USING FePtC FILM AND MANUFACTURING METHOD THEREOF
JP5590322B2 (en) * 2010-11-12 2014-09-17 三菱マテリアル株式会社 Sputtering target for forming a magnetic recording medium film and method for producing the same
CN102087858B (en) * 2010-11-26 2012-07-18 山西师范大学 Gradient composite magnetic recording media and preparation method thereof
US9945026B2 (en) * 2010-12-20 2018-04-17 Jx Nippon Mining & Metals Corporation Fe-Pt-based sputtering target with dispersed C grains
JP5041262B2 (en) * 2011-01-31 2012-10-03 三菱マテリアル株式会社 Sputtering target for forming a magnetic recording medium film and method for producing the same
JP5912559B2 (en) * 2011-03-30 2016-04-27 田中貴金属工業株式会社 Method for producing FePt-C sputtering target
WO2013046882A1 (en) * 2011-09-26 2013-04-04 Jx日鉱日石金属株式会社 Iron/platinum/carbon sputtering target
JP6212419B2 (en) * 2014-03-17 2017-10-11 株式会社Ｓｕｂａｒｕ Engine exhaust condensate drainage device

Also Published As

Publication number Publication date
JP2017197840A (en) 2017-11-02
CN109943814B (en) 2021-04-20
JPWO2015076190A1 (en) 2017-03-16
CN109943814A (en) 2019-06-28
CN105793465B (en) 2019-03-22
TWI642799B (en) 2018-12-01
JP6125661B2 (en) 2017-05-17
MY191633A (en) 2022-07-04
WO2015076190A1 (en) 2015-05-28
MY177997A (en) 2020-09-29
TW201531575A (en) 2015-08-16
CN105793465A (en) 2016-07-20
JP6484276B2 (en) 2019-03-13

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