SG11201708016SA - Method for producing magnetic recording medium - Google Patents

Method for producing magnetic recording medium

Info

Publication number
SG11201708016SA
SG11201708016SA SG11201708016SA SG11201708016SA SG11201708016SA SG 11201708016S A SG11201708016S A SG 11201708016SA SG 11201708016S A SG11201708016S A SG 11201708016SA SG 11201708016S A SG11201708016S A SG 11201708016SA SG 11201708016S A SG11201708016S A SG 11201708016SA
Authority
SG
Singapore
Prior art keywords
recording medium
magnetic recording
producing magnetic
producing
medium
Prior art date
Application number
SG11201708016SA
Inventor
Tomohiro Moriya
Hitoshi Nakata
Takehito Shimatsu
Original Assignee
Fuji Electric Co Ltd
Univ Tohoku
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd, Univ Tohoku filed Critical Fuji Electric Co Ltd
Publication of SG11201708016SA publication Critical patent/SG11201708016SA/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7369—Two or more non-magnetic underlayers, e.g. seed layers or barrier layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/7368—Non-polymeric layer under the lowermost magnetic recording layer
    • G11B5/7379—Seed layer, e.g. at least one non-magnetic layer is specifically adapted as a seed or seeding layer
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
SG11201708016SA 2015-06-02 2016-06-02 Method for producing magnetic recording medium SG11201708016SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015112674 2015-06-02
PCT/JP2016/002685 WO2016194383A1 (en) 2015-06-02 2016-06-02 Method for producing magnetic recording medium

Publications (1)

Publication Number Publication Date
SG11201708016SA true SG11201708016SA (en) 2017-12-28

Family

ID=57440983

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201708016SA SG11201708016SA (en) 2015-06-02 2016-06-02 Method for producing magnetic recording medium

Country Status (6)

Country Link
US (1) US10923150B2 (en)
JP (1) JP6439869B2 (en)
CN (1) CN107430872B (en)
MY (1) MY179440A (en)
SG (1) SG11201708016SA (en)
WO (1) WO2016194383A1 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY166236A (en) * 2016-01-12 2018-06-22 Fuji Electric Co Ltd Magnetic recording medium and method for producing same
JP2017224371A (en) * 2016-06-15 2017-12-21 昭和電工株式会社 Magnetic recording medium and magnetic storage device
TWI640644B (en) * 2017-01-19 2018-11-11 國立中興大學 Sputtering target for DC sputtering and perpendicular magnetic recording medium having the same
CN109643556B (en) * 2017-03-10 2021-03-12 富士电机株式会社 Magnetic recording medium
DE102019124616A1 (en) * 2019-09-12 2021-03-18 Cemecon Ag Multi-layer coating
US11676632B2 (en) 2019-12-26 2023-06-13 Resonac Corporation Magnetic recording medium, method of manufacturing magnetic recording medium and magnetic storage device
JP7388226B2 (en) * 2020-02-13 2023-11-29 株式会社レゾナック Magnetic recording medium, manufacturing method thereof, and magnetic storage device
JPWO2021235380A1 (en) * 2020-05-18 2021-11-25
US11508405B1 (en) 2021-06-21 2022-11-22 Western Digital Technologies, Inc. Magnetic recording media with plasma-polished pre-seed layer or substrate
US20230005503A1 (en) * 2021-07-01 2023-01-05 Western Digital Technologies, Inc. Heat-assisted magnetic recording (hamr) media with magnesium trapping layer
US11810605B2 (en) * 2021-09-29 2023-11-07 Western Digital Technologies, Inc. Magnetic recording media with tungsten pre-seed layer
US11900978B1 (en) 2022-08-11 2024-02-13 Western Digital Technologies, Inc. Magnetic recording medium with underlayer configured to reduce diffusion of titanium into a magnetic recording layer

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2529438B2 (en) * 1990-05-11 1996-08-28 松下電器産業株式会社 Method of manufacturing oxide thin film
DE4226911A1 (en) * 1992-08-14 1994-02-17 Basf Magnetics Gmbh Magnetic recording layer for use at high frequencies - comprises ion etched polymer support and ferromagnetic cobalt-contg. thin layer
US5800931A (en) * 1994-09-29 1998-09-01 Carnegie Mellon University Magnetic recording medium with a MgO sputter deposited seed layer
JPH09265620A (en) * 1996-03-27 1997-10-07 Hitachi Metals Ltd Magnetic recording medium and its production
JP4074181B2 (en) 2002-11-28 2008-04-09 株式会社東芝 Perpendicular magnetic recording medium
US7405011B2 (en) 2004-06-30 2008-07-29 Hitachi Global Storage Technologies Netherlands B.V. Magnetic recording media for tilted recording
JP4385156B2 (en) * 2006-07-27 2009-12-16 独立行政法人産業技術総合研究所 CCP-CPP type giant magnetoresistive element
JP5617112B2 (en) 2010-01-14 2014-11-05 独立行政法人物質・材料研究機構 Perpendicular magnetic recording medium and manufacturing method thereof
JP5561766B2 (en) 2010-02-04 2014-07-30 昭和電工株式会社 Thermally assisted magnetic recording medium and magnetic storage device
JP6014385B2 (en) 2012-05-14 2016-10-25 昭和電工株式会社 Magnetic recording medium and magnetic recording / reproducing apparatus
JP6182833B2 (en) * 2012-07-26 2017-08-23 富士電機株式会社 Perpendicular magnetic recording medium
JP2014081980A (en) 2012-10-17 2014-05-08 Fuji Electric Co Ltd Method for manufacturing magnetic recording medium and magnetic recording medium manufactured by this method
US9236564B2 (en) * 2013-12-11 2016-01-12 Samsung Electronics Co., Ltd. Method and system for providing an engineered magnetic layer including Heusler layers and an amorphous insertion layer

Also Published As

Publication number Publication date
CN107430872A (en) 2017-12-01
JP6439869B2 (en) 2018-12-19
WO2016194383A1 (en) 2016-12-08
US10923150B2 (en) 2021-02-16
US20180040346A1 (en) 2018-02-08
CN107430872B (en) 2019-07-30
MY179440A (en) 2020-11-06
JPWO2016194383A1 (en) 2018-03-01

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