MY186238A - Ferromagnetic material sputtering target - Google Patents
Ferromagnetic material sputtering targetInfo
- Publication number
- MY186238A MY186238A MYPI2018700467A MYPI2018700467A MY186238A MY 186238 A MY186238 A MY 186238A MY PI2018700467 A MYPI2018700467 A MY PI2018700467A MY PI2018700467 A MYPI2018700467 A MY PI2018700467A MY 186238 A MY186238 A MY 186238A
- Authority
- MY
- Malaysia
- Prior art keywords
- sputtering target
- ferromagnetic material
- material sputtering
- ray diffraction
- phase
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/05—Mixtures of metal powder with non-metallic powder
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C26/00—Alloys containing diamond or cubic or wurtzitic boron nitride, fullerenes or carbon nanotubes
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C30/00—Alloys containing less than 50% by weight of each constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
- C22C32/0005—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with at least one oxide and at least one of carbides, nitrides, borides or silicides as the main non-metallic constituents
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
- C22C32/0047—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with carbides, nitrides, borides or silicides as the main non-metallic constituents
- C22C32/0068—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with carbides, nitrides, borides or silicides as the main non-metallic constituents only nitrides
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
- C22C33/0207—Using a mixture of prealloyed powders or a master alloy
- C22C33/0228—Using a mixture of prealloyed powders or a master alloy comprising other non-metallic compounds or more than 5% of graphite
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
- C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
- C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/001—Ferrous alloys, e.g. steel alloys containing N
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/04—Alloys based on a platinum group metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
There is provided a BN-containing ferromagnetic material sputtering target which is capable of suppressing generation of particles during sputtering. A sputtering target containing from 1 to 40 at.% of B and from 1 to 30 at.% of N and comprising a structure including at least one ferromagnetic metal-containing metal phase and at least one nonmagnetic material phase, wherein an X-ray diffraction profile obtained by analyzing the structure with an X-ray diffraction method exhibits a diffraction peak derived from cubic boron nitride. (Figure 1)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016178008 | 2016-09-12 | ||
PCT/JP2017/032932 WO2018047978A1 (en) | 2016-09-12 | 2017-09-12 | Ferromagnetic material sputtering target |
Publications (1)
Publication Number | Publication Date |
---|---|
MY186238A true MY186238A (en) | 2021-06-30 |
Family
ID=61561834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2018700467A MY186238A (en) | 2016-09-12 | 2017-09-12 | Ferromagnetic material sputtering target |
Country Status (7)
Country | Link |
---|---|
US (1) | US11060180B2 (en) |
JP (1) | JP6526837B2 (en) |
CN (1) | CN108076646B (en) |
MY (1) | MY186238A (en) |
SG (1) | SG11201800871SA (en) |
TW (1) | TWI636149B (en) |
WO (1) | WO2018047978A1 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7057692B2 (en) * | 2018-03-20 | 2022-04-20 | 田中貴金属工業株式会社 | Fe-Pt-Oxide-BN-based sintered body for sputtering target |
CN111971412B (en) * | 2018-03-27 | 2022-08-16 | Jx金属株式会社 | Sputtering target, method for producing same, and method for producing magnetic recording medium |
EP3778012A4 (en) * | 2018-03-30 | 2021-06-09 | Asahi Kasei Kabushiki Kaisha | Catalyst, method for manufacturing catalyst, method for manufacturing acrylonitrile |
JP7130447B2 (en) * | 2018-06-07 | 2022-09-05 | 株式会社神戸製鋼所 | Recording layer for optical information recording medium, optical information recording medium, and sputtering target |
TWI702294B (en) * | 2018-07-31 | 2020-08-21 | 日商田中貴金屬工業股份有限公司 | Sputtering target for magnetic recording media |
CN111032906B (en) * | 2018-08-09 | 2022-10-25 | Jx金属株式会社 | Sputtering target, particle film, and perpendicular magnetic recording medium |
JP7385370B2 (en) * | 2019-05-07 | 2023-11-22 | 山陽特殊製鋼株式会社 | Ni-based sputtering target and magnetic recording medium |
JP7104001B2 (en) * | 2019-06-28 | 2022-07-20 | 田中貴金属工業株式会社 | Fe-Pt-BN-based sputtering target and its manufacturing method |
WO2021010019A1 (en) * | 2019-07-12 | 2021-01-21 | 田中貴金属工業株式会社 | Fe-pt-bn-based sputtering target and production method therefor |
TWI752655B (en) * | 2020-09-25 | 2022-01-11 | 光洋應用材料科技股份有限公司 | Fe-pt based sputtering target and method of preparing the same |
JP2023039187A (en) * | 2021-09-08 | 2023-03-20 | 田中貴金属工業株式会社 | Sputtering target including hard nitride |
WO2023173139A2 (en) * | 2022-03-11 | 2023-09-14 | Georgetown University | Boron-based and high-entropy magnetic materials |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4333902A (en) * | 1977-01-24 | 1982-06-08 | Sumitomo Electric Industries, Ltd. | Process of producing a sintered compact |
DE69021337T2 (en) * | 1989-11-17 | 1996-01-25 | Nissin Electric Co Ltd | A method of forming a boron layer containing boron nitride, a magnetic head, and a method of producing the same. |
JPH07111221A (en) * | 1993-10-12 | 1995-04-25 | Toshiba Corp | Magnetic sputter target and magnetic thin film using it, and thin film magnetic head |
US5398639A (en) * | 1993-11-12 | 1995-03-21 | General Motors Corporation | Solid state conversion of hexagonal to cubic-like boron nitride |
US20040025631A1 (en) * | 2000-10-06 | 2004-02-12 | Robert Fries | Abrasive and wear resistant material |
US6797137B2 (en) * | 2001-04-11 | 2004-09-28 | Heraeus, Inc. | Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidfied alloy powders and elemental Pt metal |
JP4175829B2 (en) * | 2002-04-22 | 2008-11-05 | 株式会社東芝 | Sputtering target for recording medium and magnetic recording medium |
US20080210555A1 (en) * | 2007-03-01 | 2008-09-04 | Heraeus Inc. | High density ceramic and cermet sputtering targets by microwave sintering |
JP5689543B2 (en) * | 2012-08-31 | 2015-03-25 | Jx日鉱日石金属株式会社 | Sintered Fe-based magnetic material |
JP5567227B1 (en) * | 2012-09-21 | 2014-08-06 | Jx日鉱日石金属株式会社 | Sintered Fe-Pt magnetic material |
JP5913620B2 (en) * | 2012-10-23 | 2016-04-27 | Jx金属株式会社 | Fe-Pt sintered sputtering target and method for producing the same |
CN104411862B (en) * | 2012-10-25 | 2017-07-18 | 吉坤日矿日石金属株式会社 | Namagnetic substance decentralized Fe Pt based sputtering targets |
JP5969120B2 (en) * | 2013-05-13 | 2016-08-17 | Jx金属株式会社 | Sputtering target for magnetic thin film formation |
US10600440B2 (en) | 2014-09-22 | 2020-03-24 | Jx Nippon Mining & Metals Corporation | Sputtering target for forming magnetic recording film and method for producing same |
CN114959599A (en) * | 2014-09-26 | 2022-08-30 | 捷客斯金属株式会社 | Sputtering target for forming magnetic recording film and method for producing same |
JP6113817B2 (en) * | 2015-11-30 | 2017-04-12 | 山陽特殊製鋼株式会社 | An alloy for a soft magnetic thin film layer and a sputtering target material in a perpendicular magnetic recording medium, and a perpendicular magnetic recording medium having a soft magnetic thin film layer. |
-
2017
- 2017-09-12 TW TW106131280A patent/TWI636149B/en active
- 2017-09-12 JP JP2017561994A patent/JP6526837B2/en active Active
- 2017-09-12 CN CN201780002443.6A patent/CN108076646B/en active Active
- 2017-09-12 SG SG11201800871SA patent/SG11201800871SA/en unknown
- 2017-09-12 US US15/752,061 patent/US11060180B2/en active Active
- 2017-09-12 MY MYPI2018700467A patent/MY186238A/en unknown
- 2017-09-12 WO PCT/JP2017/032932 patent/WO2018047978A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JPWO2018047978A1 (en) | 2018-10-18 |
CN108076646B (en) | 2019-12-13 |
TWI636149B (en) | 2018-09-21 |
US11060180B2 (en) | 2021-07-13 |
WO2018047978A1 (en) | 2018-03-15 |
US20200216945A1 (en) | 2020-07-09 |
TW201812063A (en) | 2018-04-01 |
SG11201800871SA (en) | 2018-05-30 |
JP6526837B2 (en) | 2019-06-05 |
CN108076646A (en) | 2018-05-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MY186238A (en) | Ferromagnetic material sputtering target | |
MX2019003429A (en) | Pre-ageing systems and methods using magnetic heating. | |
SG10201808248RA (en) | Deposition system with multi-cathode and method of manufacture thereof | |
CN109417863A8 (en) | Two-dimensional metal carbide, nitride and carbonitride films and composites for EMI shielding | |
MX2017014938A (en) | Steel sheet and method for producing same. | |
MX2016015028A (en) | Layered construction of metallic materials. | |
MX2017011979A (en) | Magnetic copper alloys. | |
TW201612338A (en) | Metallization for a thin-film component, process for the production thereof and sputtering target | |
MY172839A (en) | Fept-c-based sputtering target and method for manufacturing same | |
MX2016016330A (en) | Steel material for cold forging. | |
MY177222A (en) | Sputtering target and process for production thereof | |
TW201612329A (en) | Non-oriented electromagnetic steel sheet having excellent magnetic characteristics | |
MX2017009985A (en) | Powder metal composition for easy machining. | |
MX2017000844A (en) | Multicaloric mnnisi alloys. | |
EP3401933A4 (en) | Mn-Bi-BASED MAGNETIC POWDER, METHOD FOR PRODUCING SAME, COMPOUND FOR BOND MAGNET, BOND MAGNET, Mn-Bi-BASED METAL MAGNET AND METHOD FOR PRODUCING SAME | |
MY170314A (en) | Sputtering target | |
SE1651389A1 (en) | Iron powder for iron powder cores and method for selecting iron powder for iron powder cores | |
MY179241A (en) | Sputtering target | |
MX2015013020A (en) | Sovaprevir polymorphs and methods of manufacture thereof. | |
MX2015013503A (en) | Method for improving strength of hydraulic composition hardened product. | |
MY178224A (en) | Target for magnetron sputtering | |
IL271462A (en) | Metal alkoxide compound, thin-film-forming raw material and method for producing thin film | |
MY170590A (en) | Sputtering target for magnetic recording medium | |
MY174738A (en) | Sputtering target | |
EP2963139A3 (en) | Iron-based soft magnetic material |