MY166289A - Alloy for soft-magnetic thin-film layer on perpendicular magnetic recording medium, and sputtering-target material - Google Patents
Alloy for soft-magnetic thin-film layer on perpendicular magnetic recording medium, and sputtering-target materialInfo
- Publication number
- MY166289A MY166289A MYPI2014700309A MYPI2014700309A MY166289A MY 166289 A MY166289 A MY 166289A MY PI2014700309 A MYPI2014700309 A MY PI2014700309A MY PI2014700309 A MYPI2014700309 A MY PI2014700309A MY 166289 A MY166289 A MY 166289A
- Authority
- MY
- Malaysia
- Prior art keywords
- alloy
- recording medium
- film layer
- soft
- sputtering
- Prior art date
Links
- 239000000956 alloy Substances 0.000 title abstract 3
- 229910045601 alloy Inorganic materials 0.000 title abstract 3
- 239000010409 thin film Substances 0.000 title abstract 2
- 238000005477 sputtering target Methods 0.000 title 1
- 239000013077 target material Substances 0.000 title 1
- 229910052718 tin Inorganic materials 0.000 abstract 2
- 229910052721 tungsten Inorganic materials 0.000 abstract 2
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 229910052742 iron Inorganic materials 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/14—Ferrous alloys, e.g. steel alloys containing titanium or zirconium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/008—Amorphous alloys with Fe, Co or Ni as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/02—Amorphous alloys with iron as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
- H01F41/183—Sputtering targets therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011178187A JP5917045B2 (ja) | 2011-08-17 | 2011-08-17 | 垂直磁気記録媒体における軟磁性薄膜層用合金およびスパッタリングターゲット材 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY166289A true MY166289A (en) | 2018-06-25 |
Family
ID=47715162
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2014700309A MY166289A (en) | 2011-08-17 | 2012-08-14 | Alloy for soft-magnetic thin-film layer on perpendicular magnetic recording medium, and sputtering-target material |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP5917045B2 (zh) |
| CN (1) | CN103781933B (zh) |
| MY (1) | MY166289A (zh) |
| SG (1) | SG2014011274A (zh) |
| TW (1) | TWI558831B (zh) |
| WO (1) | WO2013024845A1 (zh) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6405261B2 (ja) * | 2014-05-01 | 2018-10-17 | 山陽特殊製鋼株式会社 | 磁気記録用軟磁性合金及びスパッタリングターゲット材並びに磁気記録媒体 |
| TWI602940B (zh) * | 2014-06-11 | 2017-10-21 | 光洋應用材料科技股份有限公司 | 軟磁性合金濺鍍靶材及軟磁性合金材料 |
| AT14576U1 (de) * | 2014-08-20 | 2016-01-15 | Plansee Se | Metallisierung für ein Dünnschichtbauelement, Verfahren zu deren Herstellung und Sputtering Target |
| WO2016035415A1 (ja) * | 2014-09-04 | 2016-03-10 | Ｊｘ金属株式会社 | スパッタリングターゲット |
| TWI646208B (zh) * | 2015-02-26 | 2019-01-01 | 光洋應用材料科技股份有限公司 | 非晶軟磁靶材及非晶軟磁材料 |
| TWI619817B (zh) * | 2016-10-26 | 2018-04-01 | 光洋應用材料科技股份有限公司 | 鈷鐵鈮基靶材 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006265653A (ja) * | 2005-03-24 | 2006-10-05 | Hitachi Metals Ltd | Ｆｅ−Ｃｏ基合金ターゲット材およびその製造方法 |
| JP4699194B2 (ja) * | 2005-12-15 | 2011-06-08 | 山陽特殊製鋼株式会社 | ＦｅＣｏＢ系スパッタリングターゲット材の製造方法 |
| JP4953082B2 (ja) * | 2006-10-10 | 2012-06-13 | 日立金属株式会社 | Ｃｏ−Ｆｅ−Ｚｒ系合金スパッタリングターゲット材およびその製造方法 |
| US20080083616A1 (en) * | 2006-10-10 | 2008-04-10 | Hitachi Metals, Ltd. | Co-Fe-Zr BASED ALLOY SPUTTERING TARGET MATERIAL AND PROCESS FOR PRODUCTION THEREOF |
| JP2008189996A (ja) * | 2007-02-05 | 2008-08-21 | Hitachi Metals Ltd | Ｃｏ−Ｆｅ系合金スパッタリングターゲット材およびその製造方法 |
| JP5253781B2 (ja) * | 2007-09-18 | 2013-07-31 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性膜層用合金ターゲット材 |
| JP5605787B2 (ja) * | 2008-07-14 | 2014-10-15 | 山陽特殊製鋼株式会社 | 垂直磁気記録媒体における軟磁性膜層用合金を成膜するためのスパッタリングターゲット材とその製造方法 |
| JP2010111943A (ja) * | 2008-10-10 | 2010-05-20 | Hitachi Metals Ltd | スパッタリングターゲット材の製造方法 |
| JP5714397B2 (ja) * | 2010-10-26 | 2015-05-07 | 山陽特殊製鋼株式会社 | 磁気記録用軟磁性合金およびスパッタリングターゲット材並びに磁気記録媒体 |
-
2011
- 2011-08-17 JP JP2011178187A patent/JP5917045B2/ja active Active
-
2012
- 2012-08-14 CN CN201280040073.2A patent/CN103781933B/zh not_active Expired - Fee Related
- 2012-08-14 MY MYPI2014700309A patent/MY166289A/en unknown
- 2012-08-14 SG SG2014011274A patent/SG2014011274A/en unknown
- 2012-08-14 WO PCT/JP2012/070665 patent/WO2013024845A1/ja active Application Filing
- 2012-08-16 TW TW101129707A patent/TWI558831B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| SG2014011274A (en) | 2014-04-28 |
| TWI558831B (zh) | 2016-11-21 |
| CN103781933B (zh) | 2017-01-25 |
| CN103781933A (zh) | 2014-05-07 |
| WO2013024845A1 (ja) | 2013-02-21 |
| TW201323642A (zh) | 2013-06-16 |
| JP2013040377A (ja) | 2013-02-28 |
| JP5917045B2 (ja) | 2016-05-11 |
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