MY150117A - Method of manufacturing mask blank and method of manufacturing photomask - Google Patents

Method of manufacturing mask blank and method of manufacturing photomask

Info

Publication number
MY150117A
MY150117A MYPI20082068A MYPI20082068A MY150117A MY 150117 A MY150117 A MY 150117A MY PI20082068 A MYPI20082068 A MY PI20082068A MY PI20082068 A MYPI20082068 A MY PI20082068A MY 150117 A MY150117 A MY 150117A
Authority
MY
Malaysia
Prior art keywords
substrate
face
coating nozzle
manufacturing
resist liquid
Prior art date
Application number
MYPI20082068A
Other languages
English (en)
Inventor
Keishi Asakawa
Ryoji Miyata
Original Assignee
Hoya Corp
Hoya Electronics Malaysia Sendirian Berhad
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Malaysia Sendirian Berhad filed Critical Hoya Corp
Publication of MY150117A publication Critical patent/MY150117A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
MYPI20082068A 2007-06-13 2008-06-12 Method of manufacturing mask blank and method of manufacturing photomask MY150117A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007155937A JP5073375B2 (ja) 2007-06-13 2007-06-13 マスクブランクの製造方法及びフォトマスクの製造方法

Publications (1)

Publication Number Publication Date
MY150117A true MY150117A (en) 2013-11-29

Family

ID=40238700

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20082068A MY150117A (en) 2007-06-13 2008-06-12 Method of manufacturing mask blank and method of manufacturing photomask

Country Status (5)

Country Link
JP (1) JP5073375B2 (enExample)
KR (1) KR101487550B1 (enExample)
CN (1) CN101419398B (enExample)
MY (1) MY150117A (enExample)
TW (1) TWI439803B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5086714B2 (ja) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP2011013321A (ja) * 2009-06-30 2011-01-20 Hoya Corp フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
JP6659422B2 (ja) * 2016-03-29 2020-03-04 アルバック成膜株式会社 塗布装置、マスクブランクの製造方法
CN114082602A (zh) * 2021-11-30 2022-02-25 Tcl华星光电技术有限公司 涂胶机构以及涂胶装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4445985A1 (de) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Belackung oder Beschichtung eines Substrats
JP2000343015A (ja) * 1999-06-08 2000-12-12 Dainippon Screen Mfg Co Ltd 塗布装置
JP3252325B2 (ja) * 1999-10-29 2002-02-04 株式会社ヒラノテクシード 塗工方法及び塗工装置
JP3808741B2 (ja) * 2001-10-01 2006-08-16 東京エレクトロン株式会社 処理装置
JP2005051220A (ja) * 2003-07-17 2005-02-24 Hoya Corp レジスト膜付基板の製造方法
KR20070017228A (ko) * 2003-07-17 2007-02-08 호야 가부시키가이샤 레지스트막 부착 기판의 제조방법
JP2005246274A (ja) * 2004-03-05 2005-09-15 Nidek Co Ltd 塗工方法及び塗工装置
JP4169719B2 (ja) * 2004-03-30 2008-10-22 Ｈｏｙａ株式会社 レジスト膜付基板の製造方法
JP4410063B2 (ja) * 2004-09-06 2010-02-03 東京エレクトロン株式会社 基板処理装置
JP4673157B2 (ja) * 2004-10-01 2011-04-20 株式会社ヒラノテクシード 塗工装置
JP2006269599A (ja) * 2005-03-23 2006-10-05 Sony Corp パターン形成方法、有機電界効果型トランジスタの製造方法、及び、フレキシブルプリント回路板の製造方法

Also Published As

Publication number Publication date
JP5073375B2 (ja) 2012-11-14
CN101419398B (zh) 2012-06-20
TWI439803B (zh) 2014-06-01
CN101419398A (zh) 2009-04-29
TW200912518A (en) 2009-03-16
JP2008311327A (ja) 2008-12-25
KR20080109650A (ko) 2008-12-17
KR101487550B1 (ko) 2015-02-26

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