MY150671A - Method for manufacturing mask blank and coating apparatus - Google Patents

Method for manufacturing mask blank and coating apparatus

Info

Publication number
MY150671A
MY150671A MYPI20082358A MY150671A MY 150671 A MY150671 A MY 150671A MY PI20082358 A MYPI20082358 A MY PI20082358A MY 150671 A MY150671 A MY 150671A
Authority
MY
Malaysia
Prior art keywords
mask blank
resist
resist agent
liquid
nozzle
Prior art date
Application number
Inventor
Ryoji Miyata
Keishi Asakawa
Original Assignee
Hoya Corp
Hoya Electronics Malaysia Sendirian Berhad
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007171568A external-priority patent/JP5086708B2/en
Priority claimed from JP2007171569A external-priority patent/JP2009010247A/en
Application filed by Hoya Corp, Hoya Electronics Malaysia Sendirian Berhad filed Critical Hoya Corp
Publication of MY150671A publication Critical patent/MY150671A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A METHOD FOR MANUFACTURING A MASK BLANK INCLUDES A STEP OF FORMING A RESIST FILM ON A SUBSTRATE (10) ON WHICH A THIN FILM HAS BEEN FORMED FOR TRANSFERRING A PATTERN, BY PASSING A LIQUID RESIST AGENT (21) FROM A LIQUID TANK (20) FILLED WITH THE LIQUID RESIST AGENT (21) THROUGH A NOZZLE (22) TO AN APERTURE AT THE TIP OF THE NOZZLE (22), BRINGING THE RESIST AGENT (21) INTO CONTACT WITH THE SURFACE (10A) TO BE COATED, AND MOVING THE SUBSTRATE (10) RELATIVE TO THE NOZZLE (22). IN THE STEP OF FORMING A RESIST FILM, THE LIQUID LEVEL OF THE RESIST AGENT (21) IN THE LIQUID TANK (20) IS CONTROLLED TO BE CONSTANT DURING THE APPLICATION OF THE RESIST AGENT (21). (FIG. 3)
MYPI20082358 2007-06-29 2008-06-27 Method for manufacturing mask blank and coating apparatus MY150671A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007171568A JP5086708B2 (en) 2007-06-29 2007-06-29 Mask blank manufacturing method and coating apparatus
JP2007171569A JP2009010247A (en) 2007-06-29 2007-06-29 Method of manufacturing mask blank and coating device

Publications (1)

Publication Number Publication Date
MY150671A true MY150671A (en) 2014-02-28

Family

ID=40486900

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20082358 MY150671A (en) 2007-06-29 2008-06-27 Method for manufacturing mask blank and coating apparatus

Country Status (3)

Country Link
KR (1) KR101523093B1 (en)
MY (1) MY150671A (en)
TW (1) TWI471682B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6272138B2 (en) * 2014-05-22 2018-01-31 東京エレクトロン株式会社 Application processing equipment

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4445985A1 (en) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Method and device for coating or coating a substrate
JP3252325B2 (en) * 1999-10-29 2002-02-04 株式会社ヒラノテクシード Coating method and coating device
JP4927274B2 (en) * 2001-09-17 2012-05-09 株式会社ヒラノテクシード Coating apparatus and coating method
JP4017372B2 (en) * 2001-10-15 2007-12-05 住友化学株式会社 Thin film formation method
JP2003164795A (en) * 2001-11-29 2003-06-10 Nitto Denko Corp Method for applying coating liquid containing high index refraction filler
JP3871328B2 (en) * 2002-03-29 2007-01-24 Ｈｏｙａ株式会社 COATING APPARATUS, LIQUID LEVEL MANAGEMENT METHOD AND MANAGEMENT APPARATUS, RESIST FILM-SUBSTRATE MANUFACTURING METHOD AND PATTERN FORMING METHOD, AND PHOTOMASK MANUFACTURING METHOD
JP2003340355A (en) * 2002-05-30 2003-12-02 Nitto Denko Corp Method for applying coating solution and method for manufacturing optical film
JP4313026B2 (en) * 2002-11-08 2009-08-12 株式会社ヒラノテクシード Manufacturing apparatus and manufacturing method of organic EL panel using coating nozzle by capillary action
JP2004311884A (en) * 2003-04-10 2004-11-04 Hoya Corp Method for forming resist film and method for manufacturing photomask
JP2007054719A (en) * 2005-08-23 2007-03-08 Hirano Tecseed Co Ltd Method for forming thin film

Also Published As

Publication number Publication date
KR20090004588A (en) 2009-01-12
TW200931169A (en) 2009-07-16
KR101523093B1 (en) 2015-05-26
TWI471682B (en) 2015-02-01

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