TW200951620A - Method of manufacturing a mask blank and method of manufacturing a photomask - Google Patents

Method of manufacturing a mask blank and method of manufacturing a photomask

Info

Publication number
TW200951620A
TW200951620A TW98111917A TW98111917A TW200951620A TW 200951620 A TW200951620 A TW 200951620A TW 98111917 A TW98111917 A TW 98111917A TW 98111917 A TW98111917 A TW 98111917A TW 200951620 A TW200951620 A TW 200951620A
Authority
TW
Taiwan
Prior art keywords
substrate
manufacturing
resist liquid
coating nozzle
coating
Prior art date
Application number
TW98111917A
Other languages
Chinese (zh)
Inventor
Ryoji Miyata
Keishi Asakawa
Original Assignee
Hoya Corp
Hoya Electronics Malaysia Sendirian Berhad
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Malaysia Sendirian Berhad filed Critical Hoya Corp
Publication of TW200951620A publication Critical patent/TW200951620A/en

Links

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A method of manufacturing a mask blank includes the steps of preparing a substrate having a thin film for forming a transfer pattern, feeding a resist liquid which flows out from a tank through a coating nozzle to reach an opening at an end of the coating nozzle due to a capillary phenomenon, and bring the resist liquid into contact with a surface of the substrate to be coated and moving the substrate and the coating nozzle relative to each other, thereby applying the resist liquid onto the surface of the substrate to form a resist film. In the above-mentioned step of forming the resist film, when the coating nozzle reaches a position near a coating end position of the substrate due to the relative movement, coating conditions are changed so that, the amount of the resist liquid applied to the surface is reduced.
TW98111917A 2008-04-11 2009-04-10 Method of manufacturing a mask blank and method of manufacturing a photomask TW200951620A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008103671A JP2009258152A (en) 2008-04-11 2008-04-11 Method of manufacturing mask blank, and method of manufacturing photomask

Publications (1)

Publication Number Publication Date
TW200951620A true TW200951620A (en) 2009-12-16

Family

ID=41174589

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98111917A TW200951620A (en) 2008-04-11 2009-04-10 Method of manufacturing a mask blank and method of manufacturing a photomask

Country Status (3)

Country Link
JP (1) JP2009258152A (en)
CN (1) CN101556435A (en)
TW (1) TW200951620A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5086714B2 (en) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 Mask blank manufacturing method and photomask manufacturing method
JP7001374B2 (en) * 2017-06-19 2022-02-04 東京エレクトロン株式会社 Film formation method, storage medium and film formation system
KR102481920B1 (en) * 2019-12-19 2022-12-26 캐논 톡키 가부시키가이샤 Object storage device and film-forming apparatus having the same
CN112058596B (en) * 2020-09-14 2022-12-02 河源市璐悦自动化设备有限公司 Uniform gluing process for large-size LCD optical glass

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006314997A (en) * 1998-06-19 2006-11-24 Toshiba Corp Method for forming film
JP2004247359A (en) * 2003-02-10 2004-09-02 Canon Inc Coating film forming device
JP2005013772A (en) * 2003-06-23 2005-01-20 Dainippon Printing Co Ltd Coating machine
JP2005051220A (en) * 2003-07-17 2005-02-24 Hoya Corp Method for manufacturing substrate with resist film
JP4169719B2 (en) * 2004-03-30 2008-10-22 Ｈｏｙａ株式会社 Method for manufacturing substrate with resist film

Also Published As

Publication number Publication date
CN101556435A (en) 2009-10-14
JP2009258152A (en) 2009-11-05

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