KR101487550B1 - 마스크 블랭크의 제조 방법 및 포토마스크의 제조 방법 - Google Patents

마스크 블랭크의 제조 방법 및 포토마스크의 제조 방법 Download PDF

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Publication number
KR101487550B1
KR101487550B1 KR20080054946A KR20080054946A KR101487550B1 KR 101487550 B1 KR101487550 B1 KR 101487550B1 KR 20080054946 A KR20080054946 A KR 20080054946A KR 20080054946 A KR20080054946 A KR 20080054946A KR 101487550 B1 KR101487550 B1 KR 101487550B1
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South Korea
Prior art keywords
substrate
contact
resist solution
application nozzle
liquid
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Korean (ko)
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KR20080109650A (ko
Inventor
게이시 아사까와
료지 미야따
Original Assignee
호야 가부시키가이샤
호야 일렉트로닉스 말레이지아 센드리안 베르하드
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
KR20080054946A 2007-06-13 2008-06-12 마스크 블랭크의 제조 방법 및 포토마스크의 제조 방법 Active KR101487550B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007155937A JP5073375B2 (ja) 2007-06-13 2007-06-13 マスクブランクの製造方法及びフォトマスクの製造方法
JPJP-P-2007-00155937 2007-06-13

Publications (2)

Publication Number Publication Date
KR20080109650A KR20080109650A (ko) 2008-12-17
KR101487550B1 true KR101487550B1 (ko) 2015-02-26

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ID=40238700

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KR20080054946A Active KR101487550B1 (ko) 2007-06-13 2008-06-12 마스크 블랭크의 제조 방법 및 포토마스크의 제조 방법

Country Status (5)

Country Link
JP (1) JP5073375B2 (enExample)
KR (1) KR101487550B1 (enExample)
CN (1) CN101419398B (enExample)
MY (1) MY150117A (enExample)
TW (1) TWI439803B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5086714B2 (ja) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP2011013321A (ja) * 2009-06-30 2011-01-20 Hoya Corp フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
JP6659422B2 (ja) * 2016-03-29 2020-03-04 アルバック成膜株式会社 塗布装置、マスクブランクの製造方法
CN114082602A (zh) * 2021-11-30 2022-02-25 Tcl华星光电技术有限公司 涂胶机构以及涂胶装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003112098A (ja) 2001-10-01 2003-04-15 Tokyo Electron Ltd 処理装置
KR20060044880A (ko) * 2004-03-30 2006-05-16 호야 가부시키가이샤 레지스트막 부착 기판의 제조 방법
KR20060050987A (ko) * 2004-09-06 2006-05-19 동경 엘렉트론 주식회사 기판 처리 장치 및 기판 위치 결정 장치
KR20070017228A (ko) * 2003-07-17 2007-02-08 호야 가부시키가이샤 레지스트막 부착 기판의 제조방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4445985A1 (de) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Belackung oder Beschichtung eines Substrats
JP2000343015A (ja) * 1999-06-08 2000-12-12 Dainippon Screen Mfg Co Ltd 塗布装置
JP3252325B2 (ja) * 1999-10-29 2002-02-04 株式会社ヒラノテクシード 塗工方法及び塗工装置
JP2005051220A (ja) * 2003-07-17 2005-02-24 Hoya Corp レジスト膜付基板の製造方法
JP2005246274A (ja) * 2004-03-05 2005-09-15 Nidek Co Ltd 塗工方法及び塗工装置
JP4673157B2 (ja) * 2004-10-01 2011-04-20 株式会社ヒラノテクシード 塗工装置
JP2006269599A (ja) * 2005-03-23 2006-10-05 Sony Corp パターン形成方法、有機電界効果型トランジスタの製造方法、及び、フレキシブルプリント回路板の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003112098A (ja) 2001-10-01 2003-04-15 Tokyo Electron Ltd 処理装置
KR20070017228A (ko) * 2003-07-17 2007-02-08 호야 가부시키가이샤 레지스트막 부착 기판의 제조방법
KR20060044880A (ko) * 2004-03-30 2006-05-16 호야 가부시키가이샤 레지스트막 부착 기판의 제조 방법
KR20060050987A (ko) * 2004-09-06 2006-05-19 동경 엘렉트론 주식회사 기판 처리 장치 및 기판 위치 결정 장치

Also Published As

Publication number Publication date
CN101419398B (zh) 2012-06-20
JP5073375B2 (ja) 2012-11-14
CN101419398A (zh) 2009-04-29
JP2008311327A (ja) 2008-12-25
TW200912518A (en) 2009-03-16
KR20080109650A (ko) 2008-12-17
TWI439803B (zh) 2014-06-01
MY150117A (en) 2013-11-29

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