JP5073375B2 - マスクブランクの製造方法及びフォトマスクの製造方法 - Google Patents

マスクブランクの製造方法及びフォトマスクの製造方法 Download PDF

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Publication number
JP5073375B2
JP5073375B2 JP2007155937A JP2007155937A JP5073375B2 JP 5073375 B2 JP5073375 B2 JP 5073375B2 JP 2007155937 A JP2007155937 A JP 2007155937A JP 2007155937 A JP2007155937 A JP 2007155937A JP 5073375 B2 JP5073375 B2 JP 5073375B2
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JP
Japan
Prior art keywords
substrate
liquid contact
resist solution
coating nozzle
coating
Prior art date
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Active
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JP2007155937A
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English (en)
Japanese (ja)
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JP2008311327A5 (enExample
JP2008311327A (ja
Inventor
敬司 浅川
涼司 宮田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Electronics Malaysia Sdn Bhd
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Hoya Electronics Malaysia Sdn Bhd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Electronics Malaysia Sdn Bhd filed Critical Hoya Electronics Malaysia Sdn Bhd
Priority to JP2007155937A priority Critical patent/JP5073375B2/ja
Priority to TW097121869A priority patent/TWI439803B/zh
Priority to KR20080054946A priority patent/KR101487550B1/ko
Priority to MYPI20082068A priority patent/MY150117A/en
Priority to CN2008101778611A priority patent/CN101419398B/zh
Publication of JP2008311327A publication Critical patent/JP2008311327A/ja
Publication of JP2008311327A5 publication Critical patent/JP2008311327A5/ja
Application granted granted Critical
Publication of JP5073375B2 publication Critical patent/JP5073375B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
JP2007155937A 2007-06-13 2007-06-13 マスクブランクの製造方法及びフォトマスクの製造方法 Active JP5073375B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2007155937A JP5073375B2 (ja) 2007-06-13 2007-06-13 マスクブランクの製造方法及びフォトマスクの製造方法
TW097121869A TWI439803B (zh) 2007-06-13 2008-06-12 遮罩基底之製造方法以及光罩之製造方法
KR20080054946A KR101487550B1 (ko) 2007-06-13 2008-06-12 마스크 블랭크의 제조 방법 및 포토마스크의 제조 방법
MYPI20082068A MY150117A (en) 2007-06-13 2008-06-12 Method of manufacturing mask blank and method of manufacturing photomask
CN2008101778611A CN101419398B (zh) 2007-06-13 2008-06-12 掩模坯板的制造方法及光掩模的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007155937A JP5073375B2 (ja) 2007-06-13 2007-06-13 マスクブランクの製造方法及びフォトマスクの製造方法

Publications (3)

Publication Number Publication Date
JP2008311327A JP2008311327A (ja) 2008-12-25
JP2008311327A5 JP2008311327A5 (enExample) 2010-05-06
JP5073375B2 true JP5073375B2 (ja) 2012-11-14

Family

ID=40238700

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007155937A Active JP5073375B2 (ja) 2007-06-13 2007-06-13 マスクブランクの製造方法及びフォトマスクの製造方法

Country Status (5)

Country Link
JP (1) JP5073375B2 (enExample)
KR (1) KR101487550B1 (enExample)
CN (1) CN101419398B (enExample)
MY (1) MY150117A (enExample)
TW (1) TWI439803B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5086714B2 (ja) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP2011013321A (ja) * 2009-06-30 2011-01-20 Hoya Corp フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
JP6659422B2 (ja) * 2016-03-29 2020-03-04 アルバック成膜株式会社 塗布装置、マスクブランクの製造方法
CN114082602A (zh) * 2021-11-30 2022-02-25 Tcl华星光电技术有限公司 涂胶机构以及涂胶装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4445985A1 (de) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Belackung oder Beschichtung eines Substrats
JP2000343015A (ja) * 1999-06-08 2000-12-12 Dainippon Screen Mfg Co Ltd 塗布装置
JP3252325B2 (ja) * 1999-10-29 2002-02-04 株式会社ヒラノテクシード 塗工方法及び塗工装置
JP3808741B2 (ja) * 2001-10-01 2006-08-16 東京エレクトロン株式会社 処理装置
JP2005051220A (ja) * 2003-07-17 2005-02-24 Hoya Corp レジスト膜付基板の製造方法
KR20070017228A (ko) * 2003-07-17 2007-02-08 호야 가부시키가이샤 레지스트막 부착 기판의 제조방법
JP2005246274A (ja) * 2004-03-05 2005-09-15 Nidek Co Ltd 塗工方法及び塗工装置
JP4169719B2 (ja) * 2004-03-30 2008-10-22 Ｈｏｙａ株式会社 レジスト膜付基板の製造方法
JP4410063B2 (ja) * 2004-09-06 2010-02-03 東京エレクトロン株式会社 基板処理装置
JP4673157B2 (ja) * 2004-10-01 2011-04-20 株式会社ヒラノテクシード 塗工装置
JP2006269599A (ja) * 2005-03-23 2006-10-05 Sony Corp パターン形成方法、有機電界効果型トランジスタの製造方法、及び、フレキシブルプリント回路板の製造方法

Also Published As

Publication number Publication date
CN101419398B (zh) 2012-06-20
TWI439803B (zh) 2014-06-01
CN101419398A (zh) 2009-04-29
TW200912518A (en) 2009-03-16
JP2008311327A (ja) 2008-12-25
KR20080109650A (ko) 2008-12-17
KR101487550B1 (ko) 2015-02-26
MY150117A (en) 2013-11-29

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