JP2005051220A5 - - Google Patents

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Publication number
JP2005051220A5
JP2005051220A5 JP2004200516A JP2004200516A JP2005051220A5 JP 2005051220 A5 JP2005051220 A5 JP 2005051220A5 JP 2004200516 A JP2004200516 A JP 2004200516A JP 2004200516 A JP2004200516 A JP 2004200516A JP 2005051220 A5 JP2005051220 A5 JP 2005051220A5
Authority
JP
Japan
Prior art keywords
coated
resist
nozzle
substrate
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004200516A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005051220A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004200516A priority Critical patent/JP2005051220A/ja
Priority claimed from JP2004200516A external-priority patent/JP2005051220A/ja
Priority to TW093121119A priority patent/TWI276474B/zh
Priority to CNA2004100709264A priority patent/CN1577741A/zh
Priority to KR1020040055669A priority patent/KR20050009241A/ko
Publication of JP2005051220A publication Critical patent/JP2005051220A/ja
Publication of JP2005051220A5 publication Critical patent/JP2005051220A5/ja
Pending legal-status Critical Current

Links

JP2004200516A 2003-07-17 2004-07-07 レジスト膜付基板の製造方法 Pending JP2005051220A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004200516A JP2005051220A (ja) 2003-07-17 2004-07-07 レジスト膜付基板の製造方法
TW093121119A TWI276474B (en) 2003-07-17 2004-07-15 Manufacturing method for substrates with resist films
CNA2004100709264A CN1577741A (zh) 2003-07-17 2004-07-16 带有抗蚀膜的基片的制造方法
KR1020040055669A KR20050009241A (ko) 2003-07-17 2004-07-16 레지스트막 부착 기판의 제조방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003276256 2003-07-17
JP2004200516A JP2005051220A (ja) 2003-07-17 2004-07-07 レジスト膜付基板の製造方法

Publications (2)

Publication Number Publication Date
JP2005051220A JP2005051220A (ja) 2005-02-24
JP2005051220A5 true JP2005051220A5 (enExample) 2007-06-28

Family

ID=34277588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004200516A Pending JP2005051220A (ja) 2003-07-17 2004-07-07 レジスト膜付基板の製造方法

Country Status (4)

Country Link
JP (1) JP2005051220A (enExample)
KR (1) KR20050009241A (enExample)
CN (1) CN1577741A (enExample)
TW (1) TWI276474B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006294820A (ja) * 2005-04-08 2006-10-26 Hoya Corp 塗布装置及びフォトマスクブランクの製造方法
JP4260135B2 (ja) * 2005-04-08 2009-04-30 Ｈｏｙａ株式会社 レジスト塗布方法及びレジスト塗布装置、並びにフォトマスクブランクの製造方法
JP5164088B2 (ja) * 2006-03-30 2013-03-13 Ｈｏｙａ株式会社 マスクブランク及びフォトマスク
JP5073375B2 (ja) * 2007-06-13 2012-11-14 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP5086714B2 (ja) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP2009258152A (ja) * 2008-04-11 2009-11-05 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1994025177A1 (de) * 1993-05-05 1994-11-10 Steag Micro-Tech Gmbh Sternenfels Vorrichtung zur belackung oder beschichtung von platten oder scheiben
DE4445985A1 (de) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Belackung oder Beschichtung eines Substrats
JP2001293417A (ja) * 2000-04-14 2001-10-23 Sharp Corp 塗布装置
JP2003173015A (ja) * 2001-09-28 2003-06-20 Hoya Corp グレートーンマスクの製造方法
JP3658355B2 (ja) * 2001-10-03 2005-06-08 Ｈｏｙａ株式会社 塗布膜の乾燥方法、塗布膜の形成方法、及び塗布膜形成装置
JP4017372B2 (ja) * 2001-10-15 2007-12-05 住友化学株式会社 薄膜形成方法

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