CN1577741A - 带有抗蚀膜的基片的制造方法 - Google Patents

带有抗蚀膜的基片的制造方法 Download PDF

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Publication number
CN1577741A
CN1577741A CNA2004100709264A CN200410070926A CN1577741A CN 1577741 A CN1577741 A CN 1577741A CN A2004100709264 A CNA2004100709264 A CN A2004100709264A CN 200410070926 A CN200410070926 A CN 200410070926A CN 1577741 A CN1577741 A CN 1577741A
Authority
CN
China
Prior art keywords
resist
substrate
coater nozzle
coated
interval
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2004100709264A
Other languages
English (en)
Chinese (zh)
Inventor
元村秀峰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of CN1577741A publication Critical patent/CN1577741A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
CNA2004100709264A 2003-07-17 2004-07-16 带有抗蚀膜的基片的制造方法 Pending CN1577741A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2003276256 2003-07-17
JP2003276256 2003-07-17
JP2004200516A JP2005051220A (ja) 2003-07-17 2004-07-07 レジスト膜付基板の製造方法
JP2004200516 2004-07-07

Publications (1)

Publication Number Publication Date
CN1577741A true CN1577741A (zh) 2005-02-09

Family

ID=34277588

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2004100709264A Pending CN1577741A (zh) 2003-07-17 2004-07-16 带有抗蚀膜的基片的制造方法

Country Status (4)

Country Link
JP (1) JP2005051220A (enExample)
KR (1) KR20050009241A (enExample)
CN (1) CN1577741A (enExample)
TW (1) TWI276474B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100423852C (zh) * 2005-04-08 2008-10-08 Hoya株式会社 涂布装置以及光掩模件的制造方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4260135B2 (ja) * 2005-04-08 2009-04-30 Ｈｏｙａ株式会社 レジスト塗布方法及びレジスト塗布装置、並びにフォトマスクブランクの製造方法
JP5164088B2 (ja) * 2006-03-30 2013-03-13 Ｈｏｙａ株式会社 マスクブランク及びフォトマスク
JP5073375B2 (ja) * 2007-06-13 2012-11-14 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP5086714B2 (ja) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP2009258152A (ja) * 2008-04-11 2009-11-05 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE59309164D1 (de) * 1993-05-05 1999-01-07 Steag Micro Tech Gmbh Vorrichtung zur belackung oder beschichtung von platten oder scheiben
DE4445985A1 (de) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Belackung oder Beschichtung eines Substrats
JP2001293417A (ja) * 2000-04-14 2001-10-23 Sharp Corp 塗布装置
JP2003173015A (ja) * 2001-09-28 2003-06-20 Hoya Corp グレートーンマスクの製造方法
JP3658355B2 (ja) * 2001-10-03 2005-06-08 Ｈｏｙａ株式会社 塗布膜の乾燥方法、塗布膜の形成方法、及び塗布膜形成装置
JP4017372B2 (ja) * 2001-10-15 2007-12-05 住友化学株式会社 薄膜形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100423852C (zh) * 2005-04-08 2008-10-08 Hoya株式会社 涂布装置以及光掩模件的制造方法

Also Published As

Publication number Publication date
TWI276474B (en) 2007-03-21
KR20050009241A (ko) 2005-01-24
JP2005051220A (ja) 2005-02-24
TW200507950A (en) 2005-03-01

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PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication