TW200507950A - Manufacturing method for substrates with resist films - Google Patents

Manufacturing method for substrates with resist films

Info

Publication number
TW200507950A
TW200507950A TW093121119A TW93121119A TW200507950A TW 200507950 A TW200507950 A TW 200507950A TW 093121119 A TW093121119 A TW 093121119A TW 93121119 A TW93121119 A TW 93121119A TW 200507950 A TW200507950 A TW 200507950A
Authority
TW
Taiwan
Prior art keywords
space
coated
resist agent
resist
substrates
Prior art date
Application number
TW093121119A
Other languages
Chinese (zh)
Other versions
TWI276474B (en
Inventor
Shuhou Motomura
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of TW200507950A publication Critical patent/TW200507950A/en
Application granted granted Critical
Publication of TWI276474B publication Critical patent/TWI276474B/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

An object of the present invention is to reduce film thickness distribution and to enhance film thickness uniformity of resist films formed from coated resist agent when coating of resist agent is carried out using a coater called "CAP coater". After wetting coated face (10a) by resist agent (21) through upper end of coating nozzle (22), the space (G) between the upper end of coating nozzle (22) and coated face (10a) is set as a space being 50% or more of an unwetting space, a space that resist agent (21) having once wetted unwets from coated (10a), within a range smaller than the unwetting space.
TW093121119A 2003-07-17 2004-07-15 Manufacturing method for substrates with resist films TWI276474B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003276256 2003-07-17
JP2004200516A JP2005051220A (en) 2003-07-17 2004-07-07 Method for manufacturing substrate with resist film

Publications (2)

Publication Number Publication Date
TW200507950A true TW200507950A (en) 2005-03-01
TWI276474B TWI276474B (en) 2007-03-21

Family

ID=34277588

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093121119A TWI276474B (en) 2003-07-17 2004-07-15 Manufacturing method for substrates with resist films

Country Status (4)

Country Link
JP (1) JP2005051220A (en)
KR (1) KR20050009241A (en)
CN (1) CN1577741A (en)
TW (1) TWI276474B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006294820A (en) * 2005-04-08 2006-10-26 Hoya Corp Coating device and manufacturing method of photomask blank
JP4260135B2 (en) * 2005-04-08 2009-04-30 Ｈｏｙａ株式会社 Resist coating method, resist coating apparatus, and photomask blank manufacturing method
JP5164088B2 (en) * 2006-03-30 2013-03-13 Ｈｏｙａ株式会社 Mask blank and photomask
JP5073375B2 (en) * 2007-06-13 2012-11-14 Ｈｏｙａ株式会社 Mask blank manufacturing method and photomask manufacturing method
JP5086714B2 (en) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 Mask blank manufacturing method and photomask manufacturing method
JP2009258152A (en) * 2008-04-11 2009-11-05 Hoya Corp Method of manufacturing mask blank, and method of manufacturing photomask

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE173657T1 (en) * 1993-05-05 1998-12-15 Steag Micro Tech Gmbh DEVICE FOR PAINTING OR COATING PLATES OR DISCS
DE4445985A1 (en) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Method and device for coating or coating a substrate
JP2001293417A (en) * 2000-04-14 2001-10-23 Sharp Corp Coating device
JP2003173015A (en) * 2001-09-28 2003-06-20 Hoya Corp Method of manufacturing gray tone mask
JP3658355B2 (en) * 2001-10-03 2005-06-08 Ｈｏｙａ株式会社 Coating film drying method, coating film forming method, and coating film forming apparatus
JP4017372B2 (en) * 2001-10-15 2007-12-05 住友化学株式会社 Thin film formation method

Also Published As

Publication number Publication date
KR20050009241A (en) 2005-01-24
JP2005051220A (en) 2005-02-24
TWI276474B (en) 2007-03-21
CN1577741A (en) 2005-02-09

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees