JP2005051220A - レジスト膜付基板の製造方法 - Google Patents

レジスト膜付基板の製造方法 Download PDF

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Publication number
JP2005051220A
JP2005051220A JP2004200516A JP2004200516A JP2005051220A JP 2005051220 A JP2005051220 A JP 2005051220A JP 2004200516 A JP2004200516 A JP 2004200516A JP 2004200516 A JP2004200516 A JP 2004200516A JP 2005051220 A JP2005051220 A JP 2005051220A
Authority
JP
Japan
Prior art keywords
substrate
coating
nozzle
resist
resist agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004200516A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005051220A5 (enExample
Inventor
Shuho Motomura
秀峰 元村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2004200516A priority Critical patent/JP2005051220A/ja
Priority to TW093121119A priority patent/TWI276474B/zh
Priority to KR1020040055669A priority patent/KR20050009241A/ko
Priority to CNA2004100709264A priority patent/CN1577741A/zh
Publication of JP2005051220A publication Critical patent/JP2005051220A/ja
Publication of JP2005051220A5 publication Critical patent/JP2005051220A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2004200516A 2003-07-17 2004-07-07 レジスト膜付基板の製造方法 Pending JP2005051220A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2004200516A JP2005051220A (ja) 2003-07-17 2004-07-07 レジスト膜付基板の製造方法
TW093121119A TWI276474B (en) 2003-07-17 2004-07-15 Manufacturing method for substrates with resist films
KR1020040055669A KR20050009241A (ko) 2003-07-17 2004-07-16 레지스트막 부착 기판의 제조방법
CNA2004100709264A CN1577741A (zh) 2003-07-17 2004-07-16 带有抗蚀膜的基片的制造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003276256 2003-07-17
JP2004200516A JP2005051220A (ja) 2003-07-17 2004-07-07 レジスト膜付基板の製造方法

Publications (2)

Publication Number Publication Date
JP2005051220A true JP2005051220A (ja) 2005-02-24
JP2005051220A5 JP2005051220A5 (enExample) 2007-06-28

Family

ID=34277588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004200516A Pending JP2005051220A (ja) 2003-07-17 2004-07-07 レジスト膜付基板の製造方法

Country Status (4)

Country Link
JP (1) JP2005051220A (enExample)
KR (1) KR20050009241A (enExample)
CN (1) CN1577741A (enExample)
TW (1) TWI276474B (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007271775A (ja) * 2006-03-30 2007-10-18 Hoya Corp マスクブランク及びフォトマスク
JP2008311327A (ja) * 2007-06-13 2008-12-25 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法
JP2009020378A (ja) * 2007-07-13 2009-01-29 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法
JP2009258152A (ja) * 2008-04-11 2009-11-05 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法
KR101012552B1 (ko) * 2005-04-08 2011-02-07 호야 가부시키가이샤 도포 방법, 도포 장치 및 포토 마스크 블랭크의 제조 방법

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006294820A (ja) * 2005-04-08 2006-10-26 Hoya Corp 塗布装置及びフォトマスクブランクの製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06343908A (ja) * 1993-05-05 1994-12-20 Hamatech Halbleiter Maschinenbau & Technol Gmbh プレート又はディスクをラッカ塗布又は被覆する装置
JPH08224528A (ja) * 1994-12-22 1996-09-03 Steag Microtech Gmbh Sternenfels サブストレートのコーティング又は被覆のための方法と装置
JP2001293417A (ja) * 2000-04-14 2001-10-23 Sharp Corp 塗布装置
JP2003112099A (ja) * 2001-10-03 2003-04-15 Hoya Corp 塗布膜の乾燥方法、塗布膜の形成方法、及び塗布膜形成装置
JP2003117474A (ja) * 2001-10-15 2003-04-22 Sumitomo Chem Co Ltd 薄膜形成方法
JP2003173015A (ja) * 2001-09-28 2003-06-20 Hoya Corp グレートーンマスクの製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06343908A (ja) * 1993-05-05 1994-12-20 Hamatech Halbleiter Maschinenbau & Technol Gmbh プレート又はディスクをラッカ塗布又は被覆する装置
JPH08224528A (ja) * 1994-12-22 1996-09-03 Steag Microtech Gmbh Sternenfels サブストレートのコーティング又は被覆のための方法と装置
JP2001293417A (ja) * 2000-04-14 2001-10-23 Sharp Corp 塗布装置
JP2003173015A (ja) * 2001-09-28 2003-06-20 Hoya Corp グレートーンマスクの製造方法
JP2003112099A (ja) * 2001-10-03 2003-04-15 Hoya Corp 塗布膜の乾燥方法、塗布膜の形成方法、及び塗布膜形成装置
JP2003117474A (ja) * 2001-10-15 2003-04-22 Sumitomo Chem Co Ltd 薄膜形成方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101012552B1 (ko) * 2005-04-08 2011-02-07 호야 가부시키가이샤 도포 방법, 도포 장치 및 포토 마스크 블랭크의 제조 방법
JP2007271775A (ja) * 2006-03-30 2007-10-18 Hoya Corp マスクブランク及びフォトマスク
JP2008311327A (ja) * 2007-06-13 2008-12-25 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法
JP2009020378A (ja) * 2007-07-13 2009-01-29 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法
TWI402614B (zh) * 2007-07-13 2013-07-21 Hoya Corp 空白光罩之製造方法及光罩之製造方法
JP2009258152A (ja) * 2008-04-11 2009-11-05 Hoya Corp マスクブランクの製造方法及びフォトマスクの製造方法

Also Published As

Publication number Publication date
TWI276474B (en) 2007-03-21
KR20050009241A (ko) 2005-01-24
CN1577741A (zh) 2005-02-09
TW200507950A (en) 2005-03-01

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