MX173282B - Metodo para preparar reactivos vaporizados para la deposicion quimica de vapor - Google Patents

Metodo para preparar reactivos vaporizados para la deposicion quimica de vapor

Info

Publication number
MX173282B
MX173282B MX022885A MX2288590A MX173282B MX 173282 B MX173282 B MX 173282B MX 022885 A MX022885 A MX 022885A MX 2288590 A MX2288590 A MX 2288590A MX 173282 B MX173282 B MX 173282B
Authority
MX
Mexico
Prior art keywords
coating precursor
liquid
vaporization
precursor
vapor
Prior art date
Application number
MX022885A
Other languages
English (en)
Inventor
Michael J Soubeyrand
Richard J Mccurdy
Original Assignee
Libbey Owens Ford Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Co filed Critical Libbey Owens Ford Co
Publication of MX173282B publication Critical patent/MX173282B/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/229—Non-specific enumeration
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

La presente invención se refiere a metodo para preparar reactivos vaporizados, para la deposición química de vapor, el cual incluye proporcionar un precursor de revestimiento a una temperatura arriba de su punto de fusión, pero substancialmente debajo de su temperatura de vaporización estándar, causando de esta manera que el precursor de revestimiento este en la forma de un líquido, caracterizado porque comprende las etapas de: a) realizar de una manera simultánea y continua, las etapas de: i) inyectar el precursor de revestimiento líquido en una cámara de vaporización, definida en parte por cuando menos una pred periferica, donde el precursor de revestimiento líquido produce un vapor; ii) admitir en la cámara de vaporización una mezcla de gas en una cantidad suficiente para incrementar el transporte de masa del vapor del precursor de revestimiento, y por lo tanto, causar una vaporización acelerada del precursor de revestimiento líquido; iii) mezclar de revestimiento líquido, el vapor del precursor de revestimiento y la mezcla de gas, incluyendo la aplicación del precursor líquido como una película delgada a lo largo de la pared de la cámara; por lo que el precursor de revestimiento líquido se vaporiza completamente a una temperatura debajo de su temperatura de vaporización estándar, para preparar una corriente de gas reactivo vaporizado que tiene una alta concentración uniforme del precursor de revestimiento; y b) transportar la corriente del gas reactivo lejos de la cámara de vaporización.
MX022885A 1989-10-17 1990-10-17 Metodo para preparar reactivos vaporizados para la deposicion quimica de vapor MX173282B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US42263689A 1989-10-17 1989-10-17
US07/591,121 US5090985A (en) 1989-10-17 1990-10-04 Method for preparing vaporized reactants for chemical vapor deposition

Publications (1)

Publication Number Publication Date
MX173282B true MX173282B (es) 1994-02-14

Family

ID=27025695

Family Applications (1)

Application Number Title Priority Date Filing Date
MX022885A MX173282B (es) 1989-10-17 1990-10-17 Metodo para preparar reactivos vaporizados para la deposicion quimica de vapor

Country Status (26)

Country Link
US (1) US5090985A (es)
EP (1) EP0450016B1 (es)
JP (1) JP3078835B2 (es)
KR (1) KR0147042B1 (es)
CN (1) CN1025322C (es)
AT (1) ATE133147T1 (es)
AU (1) AU632175B2 (es)
BG (1) BG94619A (es)
BR (1) BR9005227A (es)
CA (1) CA2027761A1 (es)
CZ (1) CZ502090A3 (es)
DE (1) DE69024938T2 (es)
ES (1) ES2082007T3 (es)
HU (1) HU213646B (es)
IE (1) IE903601A1 (es)
MX (1) MX173282B (es)
MY (1) MY107107A (es)
NO (1) NO304109B1 (es)
NZ (1) NZ235700A (es)
PL (1) PL167110B1 (es)
PT (1) PT95613B (es)
RO (1) RO111756B1 (es)
RU (1) RU2062258C1 (es)
TR (1) TR25795A (es)
WO (1) WO1991005743A1 (es)
YU (1) YU47521B (es)

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Also Published As

Publication number Publication date
IE903601A1 (en) 1991-04-24
DE69024938T2 (de) 1996-08-14
NZ235700A (en) 1992-12-23
ATE133147T1 (de) 1996-02-15
AU632175B2 (en) 1992-12-17
YU194490A (sh) 1993-10-20
RO111756B1 (ro) 1997-01-30
HUT57682A (en) 1991-12-30
PT95613A (pt) 1991-09-13
MY107107A (en) 1995-09-30
PL167110B1 (pl) 1995-07-31
TR25795A (tr) 1993-09-01
US5090985A (en) 1992-02-25
EP0450016A4 (en) 1993-03-03
EP0450016B1 (en) 1996-01-17
BG94619A (bg) 1993-12-24
EP0450016A1 (en) 1991-10-09
JP3078835B2 (ja) 2000-08-21
CA2027761A1 (en) 1991-04-18
KR920701064A (ko) 1992-08-11
CZ502090A3 (cs) 1998-10-14
ES2082007T3 (es) 1996-03-16
WO1991005743A1 (en) 1991-05-02
DE69024938D1 (de) 1996-02-29
KR0147042B1 (ko) 1998-08-17
HU213646B (en) 1997-09-29
HU907561D0 (en) 1991-10-28
BR9005227A (pt) 1991-09-17
NO912320D0 (no) 1991-06-14
CN1051899A (zh) 1991-06-05
AU6529790A (en) 1991-05-16
JPH04502305A (ja) 1992-04-23
CN1025322C (zh) 1994-07-06
PT95613B (pt) 1997-08-29
RU2062258C1 (ru) 1996-06-20
NO304109B1 (no) 1998-10-26
YU47521B (sh) 1995-10-03
NO912320L (no) 1991-06-14

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