JPS575866A - Vapor depositing apparatus - Google Patents
Vapor depositing apparatusInfo
- Publication number
- JPS575866A JPS575866A JP7961380A JP7961380A JPS575866A JP S575866 A JPS575866 A JP S575866A JP 7961380 A JP7961380 A JP 7961380A JP 7961380 A JP7961380 A JP 7961380A JP S575866 A JPS575866 A JP S575866A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- substance
- vapor deposition
- deposition film
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE: To provide the vapor depositing apparatus for forming a vapor deposition film consisting a specific component due to a substance of an evaporation source and a third component other than said specific component in a high film forming speed capable of obtaining the vapor deposition film containing a substance from an evaporation source as a composition component on a substrate arranged in a vacuum tank by providing a gas discharge tube being connected to the vacuum tank.
CONSTITUTION: A substrate 6 is arranged in the vacuum tank facing to an evaporation source 3 through a vapor passing space 5 and, while an interior of the tank is maintained under a vacuum condition, the evaporation source 3 is evaporated by heating. This evaporation is carried out as well as, for example, an O2 gas supplied to the gas discharge tube 4 is decomposed to generate an activated particle such as cation, electron or the like and said particle is introduced into the tank 1 in an accelerated condition. As the result, these electric discharge products activate the vapor from the substance of the evaporation source in the space 5 to form a desired vapor deposition film on the surface of the substrate 6 in an extremely high film forming speed. That is, a vapor deposition film comprising only the substance (e.g.; In) of the evaporation source or a vapor deposition film comprising a specific component due to the aformentioned substance of the evaporation source containing a third component (e.g.; oxygen) due to the electric discharge products is formed on the substrate 6.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7961380A JPS575866A (en) | 1980-06-14 | 1980-06-14 | Vapor depositing apparatus |
EP80304246A EP0029747A1 (en) | 1979-11-27 | 1980-11-26 | An apparatus for vacuum deposition and a method for forming a thin film by the use thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7961380A JPS575866A (en) | 1980-06-14 | 1980-06-14 | Vapor depositing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS575866A true JPS575866A (en) | 1982-01-12 |
Family
ID=13694888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7961380A Pending JPS575866A (en) | 1979-11-27 | 1980-06-14 | Vapor depositing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS575866A (en) |
-
1980
- 1980-06-14 JP JP7961380A patent/JPS575866A/en active Pending
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