JPS575866A - Vapor depositing apparatus - Google Patents

Vapor depositing apparatus

Info

Publication number
JPS575866A
JPS575866A JP7961380A JP7961380A JPS575866A JP S575866 A JPS575866 A JP S575866A JP 7961380 A JP7961380 A JP 7961380A JP 7961380 A JP7961380 A JP 7961380A JP S575866 A JPS575866 A JP S575866A
Authority
JP
Japan
Prior art keywords
evaporation source
substance
vapor deposition
deposition film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7961380A
Other languages
Japanese (ja)
Inventor
Masanari Shindo
Isao Myokan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP7961380A priority Critical patent/JPS575866A/en
Priority to EP80304246A priority patent/EP0029747A1/en
Publication of JPS575866A publication Critical patent/JPS575866A/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE: To provide the vapor depositing apparatus for forming a vapor deposition film consisting a specific component due to a substance of an evaporation source and a third component other than said specific component in a high film forming speed capable of obtaining the vapor deposition film containing a substance from an evaporation source as a composition component on a substrate arranged in a vacuum tank by providing a gas discharge tube being connected to the vacuum tank.
CONSTITUTION: A substrate 6 is arranged in the vacuum tank facing to an evaporation source 3 through a vapor passing space 5 and, while an interior of the tank is maintained under a vacuum condition, the evaporation source 3 is evaporated by heating. This evaporation is carried out as well as, for example, an O2 gas supplied to the gas discharge tube 4 is decomposed to generate an activated particle such as cation, electron or the like and said particle is introduced into the tank 1 in an accelerated condition. As the result, these electric discharge products activate the vapor from the substance of the evaporation source in the space 5 to form a desired vapor deposition film on the surface of the substrate 6 in an extremely high film forming speed. That is, a vapor deposition film comprising only the substance (e.g.; In) of the evaporation source or a vapor deposition film comprising a specific component due to the aformentioned substance of the evaporation source containing a third component (e.g.; oxygen) due to the electric discharge products is formed on the substrate 6.
COPYRIGHT: (C)1982,JPO&Japio
JP7961380A 1979-11-27 1980-06-14 Vapor depositing apparatus Pending JPS575866A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP7961380A JPS575866A (en) 1980-06-14 1980-06-14 Vapor depositing apparatus
EP80304246A EP0029747A1 (en) 1979-11-27 1980-11-26 An apparatus for vacuum deposition and a method for forming a thin film by the use thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7961380A JPS575866A (en) 1980-06-14 1980-06-14 Vapor depositing apparatus

Publications (1)

Publication Number Publication Date
JPS575866A true JPS575866A (en) 1982-01-12

Family

ID=13694888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7961380A Pending JPS575866A (en) 1979-11-27 1980-06-14 Vapor depositing apparatus

Country Status (1)

Country Link
JP (1) JPS575866A (en)

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