JPS56123368A - Crucible for evaporation source - Google Patents

Crucible for evaporation source

Info

Publication number
JPS56123368A
JPS56123368A JP2558280A JP2558280A JPS56123368A JP S56123368 A JPS56123368 A JP S56123368A JP 2558280 A JP2558280 A JP 2558280A JP 2558280 A JP2558280 A JP 2558280A JP S56123368 A JPS56123368 A JP S56123368A
Authority
JP
Japan
Prior art keywords
crucible
coefft
heat radiation
evaporation source
outside
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2558280A
Other languages
Japanese (ja)
Other versions
JPS6043913B2 (en
Inventor
Shinsaku Nakada
Yoichi Mikami
Kazuhiro Fukaya
Masahiro Hotta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP2558280A priority Critical patent/JPS6043913B2/en
Publication of JPS56123368A publication Critical patent/JPS56123368A/en
Publication of JPS6043913B2 publication Critical patent/JPS6043913B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To prevent a substrate etc. from heat deterioration by coating the outside of the body of a crucible with a high m.p. material having a coefft. of heat radiation lower than that of the crucible body to reduce the quantity of radiant heat emitted. CONSTITUTION:The outside of the body of crucible 1 for a hermetically sealed type evaporation source used in a cluster ion beam vapor deposition method is coated with high m.p. material 3 having a coefft. of heat radiation lower than that of the material of the crucible body. When the material of the crucible body is graphite having a high coefft. of heat radiation, the most remarkable effect is produced. Material 3 is used in the form of a sheet, foil or a container, and the material used is W, Ta, Mo, Nb or the like, most preferably Mo.
JP2558280A 1980-02-29 1980-02-29 Crucible for evaporation source Expired JPS6043913B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2558280A JPS6043913B2 (en) 1980-02-29 1980-02-29 Crucible for evaporation source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2558280A JPS6043913B2 (en) 1980-02-29 1980-02-29 Crucible for evaporation source

Publications (2)

Publication Number Publication Date
JPS56123368A true JPS56123368A (en) 1981-09-28
JPS6043913B2 JPS6043913B2 (en) 1985-10-01

Family

ID=12169905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2558280A Expired JPS6043913B2 (en) 1980-02-29 1980-02-29 Crucible for evaporation source

Country Status (1)

Country Link
JP (1) JPS6043913B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60152670A (en) * 1984-01-20 1985-08-10 Ulvac Corp Vapor source using high frequency induction heating
JPS6389963U (en) * 1986-11-28 1988-06-10
WO2005098079A1 (en) * 2004-03-22 2005-10-20 Eastman Kodak Company High thickness uniformity vaporization source
FR3036710A1 (en) * 2015-05-27 2016-12-02 China Triumph Int Eng Co Ltd DIAPHRAGM WITH OPTIMIZED THERMAL EMISSION BEHAVIOR
JP2020093974A (en) * 2018-12-07 2020-06-18 昭和電工株式会社 Crystal growth apparatus and crucible
JP2021139018A (en) * 2020-03-06 2021-09-16 株式会社アドバンテック stage

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60152670A (en) * 1984-01-20 1985-08-10 Ulvac Corp Vapor source using high frequency induction heating
JPS6389963U (en) * 1986-11-28 1988-06-10
WO2005098079A1 (en) * 2004-03-22 2005-10-20 Eastman Kodak Company High thickness uniformity vaporization source
US7364772B2 (en) 2004-03-22 2008-04-29 Eastman Kodak Company Method for coating an organic layer onto a substrate in a vacuum chamber
FR3036710A1 (en) * 2015-05-27 2016-12-02 China Triumph Int Eng Co Ltd DIAPHRAGM WITH OPTIMIZED THERMAL EMISSION BEHAVIOR
JP2020093974A (en) * 2018-12-07 2020-06-18 昭和電工株式会社 Crystal growth apparatus and crucible
JP2021139018A (en) * 2020-03-06 2021-09-16 株式会社アドバンテック stage

Also Published As

Publication number Publication date
JPS6043913B2 (en) 1985-10-01

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