JPS575867A - Vapor depositing apparatus - Google Patents
Vapor depositing apparatusInfo
- Publication number
- JPS575867A JPS575867A JP7961480A JP7961480A JPS575867A JP S575867 A JPS575867 A JP S575867A JP 7961480 A JP7961480 A JP 7961480A JP 7961480 A JP7961480 A JP 7961480A JP S575867 A JPS575867 A JP S575867A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- gas
- substance
- vapor deposition
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE: To provide the vapor depositing apparatus for forming a vapor deposition film containing a specific component due to a substance of an evaporation source and the third component at a high film forming speed capable of obtaining a vapor deposition film containing the substance of the evaporation source as a composition component on the surface of a substrate plate on an electrode opposedly arranged from the evaporation source by providing a gas discharge tube being connected to a vacuum tank.
CONSTITUTION: A substrate 8 is arranged to a position in front of an electrode 6 in a vacuum tank 1 and, under such a condition that said tank is maintained under vacuum, an evaporation source (e.g.; In)3 is heated to evaporate a substance of the evaporation source. The evaporation is carried out as well as a gas (such as O2 or the like as the third component) is supplied to a gas discharge tube 4 and electric discharge is generated in said gas to generate an activated particle such as cation, electron or the like by decomposition and said particle is introduced into the tank 1. Then, these electric discharge products and a mixed gas of the undercomposed gas and the vapor from the substance of the evaporation source are subjected to glow discharge by the action of the electrode 8 in a space 5. As the result, the undecomposed gas and the vapor are ionized and the resulting activated particle is collided against the substrate 8 and a vapor deposition film comprising only the substance of the evaporation source of a vapor deposition film containing the aforementioned third component due to the electric discharge products is formed on the substrate 8 at an extremely high vapor deposition speed.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7961480A JPS575867A (en) | 1980-06-14 | 1980-06-14 | Vapor depositing apparatus |
EP80304246A EP0029747A1 (en) | 1979-11-27 | 1980-11-26 | An apparatus for vacuum deposition and a method for forming a thin film by the use thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7961480A JPS575867A (en) | 1980-06-14 | 1980-06-14 | Vapor depositing apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS575867A true JPS575867A (en) | 1982-01-12 |
Family
ID=13694917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7961480A Pending JPS575867A (en) | 1979-11-27 | 1980-06-14 | Vapor depositing apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS575867A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5956563A (en) * | 1982-08-20 | 1984-04-02 | ハンチントン・アロイス・インコ−ポレ−テツド | Controlled expansion alloy |
JPS6227566A (en) * | 1985-07-26 | 1987-02-05 | Nissin Electric Co Ltd | Film forming device |
-
1980
- 1980-06-14 JP JP7961480A patent/JPS575867A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5956563A (en) * | 1982-08-20 | 1984-04-02 | ハンチントン・アロイス・インコ−ポレ−テツド | Controlled expansion alloy |
JPH041057B2 (en) * | 1982-08-20 | 1992-01-09 | Huntington Alloys | |
JPS6227566A (en) * | 1985-07-26 | 1987-02-05 | Nissin Electric Co Ltd | Film forming device |
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