GB1268941A - A device for producing high intensity ion beams - Google Patents

A device for producing high intensity ion beams

Info

Publication number
GB1268941A
GB1268941A GB08006/69A GB1800669A GB1268941A GB 1268941 A GB1268941 A GB 1268941A GB 08006/69 A GB08006/69 A GB 08006/69A GB 1800669 A GB1800669 A GB 1800669A GB 1268941 A GB1268941 A GB 1268941A
Authority
GB
United Kingdom
Prior art keywords
plasma
chamber
plasma beam
duoplasmatron
electrons
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08006/69A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of GB1268941A publication Critical patent/GB1268941A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/10—Duoplasmatrons ; Duopigatrons
    • H01J27/12—Duoplasmatrons ; Duopigatrons provided with an expansion cup

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

1,268,941. Ion sources. THOMSON-C.S.F. 8 April, 1969 [9 April, 1968], No. 18006/69. Heading HID. An arrangement for generating a high intensity ion beam comprises a duoplasmatron, a reaction chamber 3 arranged to receive from the duoplasmatron a plasma beam which will expand in the reaction chamber and an arrangement, such as a tube 4, for introducing a gas or vapour into the plasma within the chamber, the reaction products created in the chamber escaping via an exit orifice 5. The duoplasmatron plasma beam may contain hydrogen ions and electrons and the gas or vapour may consist of B, Al, In, P, As, Sb, Li, Hg, O or a hydrocarbon and ions of these materials are created by charge exchange reactions with the hydrogen ions and by ionization by the electrons. The resultant plasma beam may be passed through a magnet 6 to filter out the hydrogen ions (path 8), the useful ions following path 9. If an ion beam rather than a plasma is required a suitably biased electrode cylinder 7 may entract the electrons. The material to be introduced into the plasma beam may be housed in a compartment in the chamber 3 and vaporized using an electric heater element, electron bombardment, or the proximity of the hot plasma beam. A refractory condensation collector may be located opposite the inner end of tube 4 to absorb the kinetic energy of the introduced vapour.
GB08006/69A 1968-04-09 1969-04-08 A device for producing high intensity ion beams Expired GB1268941A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR147478 1968-04-09

Publications (1)

Publication Number Publication Date
GB1268941A true GB1268941A (en) 1972-03-29

Family

ID=8648749

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08006/69A Expired GB1268941A (en) 1968-04-09 1969-04-08 A device for producing high intensity ion beams

Country Status (4)

Country Link
US (1) US3631283A (en)
DE (1) DE1917843C3 (en)
FR (1) FR1585902A (en)
GB (1) GB1268941A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2392549B (en) * 2001-03-07 2005-10-12 Advanced Tech Materials Improved double chamber ion implantation system

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2145012A5 (en) * 1971-07-06 1973-02-16 Thomson Csf
FR2156978A5 (en) * 1971-10-13 1973-06-01 Anvar
US3980916A (en) * 1975-07-22 1976-09-14 The United States Of America As Represented By The United States Energy Research And Development Administration Beam limiter for thermonuclear fusion devices
US5497006A (en) * 1994-11-15 1996-03-05 Eaton Corporation Ion generating source for use in an ion implanter
DE19747421A1 (en) 1997-10-27 1999-04-29 Sf Koop Gmbh Beton Konzepte Concrete paving block
US11031205B1 (en) 2020-02-04 2021-06-08 Georg-August-Universität Göttingen Stiftung Öffentlichen Rechts, Universitätsmedizin Device for generating negative ions by impinging positive ions on a target

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2507652A (en) * 1940-10-04 1950-05-16 Cornell Res Foundation Inc Ion source
US3332870A (en) * 1962-10-08 1967-07-25 Mhd Res Inc Method and apparatus for effecting chemical reactions by means of an electric arc
US3288993A (en) * 1963-11-08 1966-11-29 James F Steinhaus Plasma particle separator and analyzer having a grid structure consisting of linear tubular portions
US3287598A (en) * 1964-01-02 1966-11-22 High Voltage Engineering Corp Ion source having an expansion cup for effecting beam divergence
US3387218A (en) * 1964-05-06 1968-06-04 Trw Inc Apparatus for handling micron size range particulate material
US3476968A (en) * 1966-12-19 1969-11-04 Hitachi Ltd Microwave ion source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2392549B (en) * 2001-03-07 2005-10-12 Advanced Tech Materials Improved double chamber ion implantation system

Also Published As

Publication number Publication date
DE1917843C3 (en) 1978-09-14
DE1917843B2 (en) 1978-01-05
US3631283A (en) 1971-12-28
DE1917843A1 (en) 1969-10-16
FR1585902A (en) 1970-02-06

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