JPS55100975A - Hcd type ion plating device - Google Patents

Hcd type ion plating device

Info

Publication number
JPS55100975A
JPS55100975A JP676579A JP676579A JPS55100975A JP S55100975 A JPS55100975 A JP S55100975A JP 676579 A JP676579 A JP 676579A JP 676579 A JP676579 A JP 676579A JP S55100975 A JPS55100975 A JP S55100975A
Authority
JP
Japan
Prior art keywords
source
face
anode
intensity
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP676579A
Other languages
Japanese (ja)
Other versions
JPS6125775B2 (en
Inventor
Akikimi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Citizen Watch Co Ltd
Original Assignee
Citizen Watch Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Citizen Watch Co Ltd filed Critical Citizen Watch Co Ltd
Priority to JP676579A priority Critical patent/JPS55100975A/en
Publication of JPS55100975A publication Critical patent/JPS55100975A/en
Publication of JPS6125775B2 publication Critical patent/JPS6125775B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To permit the increase in film-forming speed and treating numbers by distributing the intensity of gas discharge plasma uniformly over a wide range by providing an anode to apply positive potential to a vaporizing source facing a base plate. CONSTITUTION:The vaporizing source 2 and the base plate 4 are provided in a mutually facing manner in the vacuum chamber 1, and the HCD type electron gun 3 is provided against the vaporizing source 2 at a position apart from the source 2-plate 4 face-to-face axle. Furthermore, the anode 5 is provided in relation to the face-to-face axle of the vacuum chamber 1 and the vaporizing source 2, and a positive potential from the anode 5 is applied to the vaporizing source 2 to change the intensity and distribution of gas discharge plasma formed in the vacuum chamber 1. Thus, the distribution and intensity of gas discharge plasma which are suitable for mass production mode can be available.
JP676579A 1979-01-23 1979-01-23 Hcd type ion plating device Granted JPS55100975A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP676579A JPS55100975A (en) 1979-01-23 1979-01-23 Hcd type ion plating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP676579A JPS55100975A (en) 1979-01-23 1979-01-23 Hcd type ion plating device

Publications (2)

Publication Number Publication Date
JPS55100975A true JPS55100975A (en) 1980-08-01
JPS6125775B2 JPS6125775B2 (en) 1986-06-17

Family

ID=11647263

Family Applications (1)

Application Number Title Priority Date Filing Date
JP676579A Granted JPS55100975A (en) 1979-01-23 1979-01-23 Hcd type ion plating device

Country Status (1)

Country Link
JP (1) JPS55100975A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5947381A (en) * 1982-09-10 1984-03-17 Joshin Uramoto Ion implanting device for large current and large area by magnetized sheet plasma
JPS62287066A (en) * 1986-06-04 1987-12-12 Showa Shinku:Kk Hybrid ion plating method and apparatus
EP1334778A2 (en) 2002-02-08 2003-08-13 Fuji Photo Film Co., Ltd. Rod for a coating device, and process for producing the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0717064U (en) * 1993-09-14 1995-03-28 ダイワ精工株式会社 Backlash prevention device for dual-bearing reels for fishing

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5947381A (en) * 1982-09-10 1984-03-17 Joshin Uramoto Ion implanting device for large current and large area by magnetized sheet plasma
JPH0461072B2 (en) * 1982-09-10 1992-09-29 Joshin Uramoto
JPS62287066A (en) * 1986-06-04 1987-12-12 Showa Shinku:Kk Hybrid ion plating method and apparatus
EP1334778A2 (en) 2002-02-08 2003-08-13 Fuji Photo Film Co., Ltd. Rod for a coating device, and process for producing the same

Also Published As

Publication number Publication date
JPS6125775B2 (en) 1986-06-17

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