JPS5689835A - Vapor phase growth apparatus - Google Patents

Vapor phase growth apparatus

Info

Publication number
JPS5689835A
JPS5689835A JP16667879A JP16667879A JPS5689835A JP S5689835 A JPS5689835 A JP S5689835A JP 16667879 A JP16667879 A JP 16667879A JP 16667879 A JP16667879 A JP 16667879A JP S5689835 A JPS5689835 A JP S5689835A
Authority
JP
Japan
Prior art keywords
electrode
electric field
ions
electrodes
vapor phase
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16667879A
Other languages
Japanese (ja)
Other versions
JPS5927214B2 (en
Inventor
Yukio Takeda
Shinji Nishiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP16667879A priority Critical patent/JPS5927214B2/en
Publication of JPS5689835A publication Critical patent/JPS5689835A/en
Publication of JPS5927214B2 publication Critical patent/JPS5927214B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Abstract

PURPOSE:To improve the uniformity of the quality of a vapor phase groweh film easily by separating an electric field for plasma generation from an electric field for ion acceleration. CONSTITUTION:While the inside of a vacuum vessel 1 is being evacuated from an exhaust port 2 with a vacuum pump, an SiH4 gas is introduced through a gas lead- in port 3, and a vacuum of about <=10torr is maintained. The grid electrode 6 through which ions can pass and an electrode 4 are used as plasma generating electrodes, and a suitable positive voltage is applied to the electrode 4, so that glow discharge is generated between both electrodes, with the electrode 6 as ground potential. A negative voltage is applied to the electrode 5, whereby the electric field which accelerates the ions of SiH4 decomposed by the glow discharge toward the substrate placed on the electrode 5 or near the same is formed between said electrode and the electrode 6. Then, only the ions are accelerated in the electric field between the electrodes 6 and 5 and deposits on the electrode 5 or the substrate; therefore, the uniformity of the film quality is attained.
JP16667879A 1979-12-21 1979-12-21 Vapor phase growth equipment Expired JPS5927214B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16667879A JPS5927214B2 (en) 1979-12-21 1979-12-21 Vapor phase growth equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16667879A JPS5927214B2 (en) 1979-12-21 1979-12-21 Vapor phase growth equipment

Publications (2)

Publication Number Publication Date
JPS5689835A true JPS5689835A (en) 1981-07-21
JPS5927214B2 JPS5927214B2 (en) 1984-07-04

Family

ID=15835688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16667879A Expired JPS5927214B2 (en) 1979-12-21 1979-12-21 Vapor phase growth equipment

Country Status (1)

Country Link
JP (1) JPS5927214B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59192833U (en) * 1983-06-08 1984-12-21 日本電子株式会社 Optical CVD equipment
JPS6077413A (en) * 1983-10-04 1985-05-02 Ulvac Corp Laser excitation process apparatus
JPS63236708A (en) * 1987-03-25 1988-10-03 Kanagawa Pref Gov Vapor synthesis of carbon thin film or carbon particle

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04189908A (en) * 1990-09-12 1992-07-08 Just Japan Kk Placement type post and guard fence using the same post

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59192833U (en) * 1983-06-08 1984-12-21 日本電子株式会社 Optical CVD equipment
JPS6077413A (en) * 1983-10-04 1985-05-02 Ulvac Corp Laser excitation process apparatus
JPS63236708A (en) * 1987-03-25 1988-10-03 Kanagawa Pref Gov Vapor synthesis of carbon thin film or carbon particle

Also Published As

Publication number Publication date
JPS5927214B2 (en) 1984-07-04

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