JPS55110774A - High vacuum ion plating apparatus - Google Patents

High vacuum ion plating apparatus

Info

Publication number
JPS55110774A
JPS55110774A JP1764679A JP1764679A JPS55110774A JP S55110774 A JPS55110774 A JP S55110774A JP 1764679 A JP1764679 A JP 1764679A JP 1764679 A JP1764679 A JP 1764679A JP S55110774 A JPS55110774 A JP S55110774A
Authority
JP
Japan
Prior art keywords
electron
positive
sourse
electrode
negative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1764679A
Other languages
Japanese (ja)
Inventor
Hiroichi Deguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP1764679A priority Critical patent/JPS55110774A/en
Publication of JPS55110774A publication Critical patent/JPS55110774A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Abstract

PURPOSE:To form a film with good quality by maitaining the discharge of a titled apparatus stably by a mechanism wherein DC or AC current is applied to an accerelating electrode in order to take out an ionizing gas or electron independently or at the sane time from a plasma generator into vaccum atmosphere. CONSTITUTION:An inert or an active gas is introduced from a gas introducing port 10 to generate plasma by a plasma generator 7 and positive or negative ion or electron taken out from the said plasma by an accerelating electrode 9 is advanced to the vicinity of an evaporating sourse 2 and a discharge electrode 5 to maintain a discharge electrode 5 in a remarkably dischargeable condition. Therefore, even if high vacuum condition is maintained within a vocuum tank 1, sufficiently stabilized high frequency electric discharge is generated and metal or dielectric substance evaporated from an evaporating sourse 2 is effectively ionized to obtain a film with god quality. If positive or negative DC voltage is applied to an electric sourse 9, negative ionized gas and electron or positive ion is taken out and, if AC voltage is applied, positive ion and electron or negative ion is mutually tanken out.
JP1764679A 1979-02-16 1979-02-16 High vacuum ion plating apparatus Pending JPS55110774A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1764679A JPS55110774A (en) 1979-02-16 1979-02-16 High vacuum ion plating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1764679A JPS55110774A (en) 1979-02-16 1979-02-16 High vacuum ion plating apparatus

Publications (1)

Publication Number Publication Date
JPS55110774A true JPS55110774A (en) 1980-08-26

Family

ID=11949612

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1764679A Pending JPS55110774A (en) 1979-02-16 1979-02-16 High vacuum ion plating apparatus

Country Status (1)

Country Link
JP (1) JPS55110774A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0266225A1 (en) * 1986-10-31 1988-05-04 Hashimoto Forming Industry Co Ltd Method of producing plastic-moulded articles with hard coated surface layers
JPH02276146A (en) * 1989-04-18 1990-11-13 Matsushita Electric Ind Co Ltd Ion irradiation device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0266225A1 (en) * 1986-10-31 1988-05-04 Hashimoto Forming Industry Co Ltd Method of producing plastic-moulded articles with hard coated surface layers
JPH02276146A (en) * 1989-04-18 1990-11-13 Matsushita Electric Ind Co Ltd Ion irradiation device

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