JPS575865A - Apparatus for forming transparent electroconductive film - Google Patents

Apparatus for forming transparent electroconductive film

Info

Publication number
JPS575865A
JPS575865A JP7961780A JP7961780A JPS575865A JP S575865 A JPS575865 A JP S575865A JP 7961780 A JP7961780 A JP 7961780A JP 7961780 A JP7961780 A JP 7961780A JP S575865 A JPS575865 A JP S575865A
Authority
JP
Japan
Prior art keywords
gas
substrate body
discharge
generated
electroconductive film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7961780A
Other languages
Japanese (ja)
Inventor
Masanari Shindo
Isao Myokan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP7961780A priority Critical patent/JPS575865A/en
Publication of JPS575865A publication Critical patent/JPS575865A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide an apparatus for vapor depositing a transparent electroconductive film on a surface of a substrate body in high productivity without heating said substrate body comprising formation of a discharge electrode discharging to a space between a substrate body transferred into a vacuum chamber and an opposedly provided evaporation source and an O2 gas discharge pipe having an outlet facing to the surface of said substrate body. CONSTITUTION:An evaporation source 6 such as In, tin or the like is heated and, on the other hand, an O2 gas is supplied to an O2 gas discharge tube 7 to decompose the O2 gas and, thereby, various oxygen ion and electron are generated and these discharge porducts is introduced into the vacuum tank 1 along with the undecomposed O2 gas. Then, introduced components are mixed with a vapor from the evaporation source 6 in the space 5 and glow discharge is generated by the action of a rear electrode 8 to ionize the aforementioned vapor and the undecomposed O2 gas and, further, reionize the O2 gas generated by re-uniting the discharge products. Then, generated activated particles are deposited on a surface of the transferred substrate body 2 and a transparent electroconductive film comprising a conventional oxide is formed.
JP7961780A 1980-06-14 1980-06-14 Apparatus for forming transparent electroconductive film Pending JPS575865A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7961780A JPS575865A (en) 1980-06-14 1980-06-14 Apparatus for forming transparent electroconductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7961780A JPS575865A (en) 1980-06-14 1980-06-14 Apparatus for forming transparent electroconductive film

Publications (1)

Publication Number Publication Date
JPS575865A true JPS575865A (en) 1982-01-12

Family

ID=13695009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7961780A Pending JPS575865A (en) 1980-06-14 1980-06-14 Apparatus for forming transparent electroconductive film

Country Status (1)

Country Link
JP (1) JPS575865A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0121443A2 (en) * 1983-04-04 1984-10-10 Energy Conversion Devices, Inc. Apparatus for and method of continuously depositing a highly conductive, highly transmissive film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0121443A2 (en) * 1983-04-04 1984-10-10 Energy Conversion Devices, Inc. Apparatus for and method of continuously depositing a highly conductive, highly transmissive film

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