JPS55161066A - Formation of covering film by ion plating - Google Patents

Formation of covering film by ion plating

Info

Publication number
JPS55161066A
JPS55161066A JP6851579A JP6851579A JPS55161066A JP S55161066 A JPS55161066 A JP S55161066A JP 6851579 A JP6851579 A JP 6851579A JP 6851579 A JP6851579 A JP 6851579A JP S55161066 A JPS55161066 A JP S55161066A
Authority
JP
Japan
Prior art keywords
ion plating
voltage
substrate
heating
electric power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6851579A
Other languages
Japanese (ja)
Inventor
Yoshihiko Doi
Akinori Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP6851579A priority Critical patent/JPS55161066A/en
Publication of JPS55161066A publication Critical patent/JPS55161066A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To form the covering film for improving abrasion-resisting property and corrosion resistance or color tone, by carring out ion plating of a specific metal vapor, such as Ti etc., on the electric conductive substrate applying a specific voltage and electric power on ionizing electrode.
CONSTITUTION: At the time of carrying out ion plating of single or multiple covering layer of carbide, nitride etc. of one kind or more of metal element, such as Ti etc., belonging to the VIa group, Va group and VIa group in a periodic table of elements or these solid solution on the electric conductive substrate 1 in the vacuum vessel 3, the above mentioned metal 15 in the crucible 14 is evaporated by heating by the electron beam 13 after introducing argon gas in the vessel 3 from the valve 6 and heating the substrate 1 by glow discharge and purifying it. Then, voltage of +20W500V and electric power of 400W100,000V.Å, are applied on the positive potential ionizing electrode 17 and negative voltage of -200W5,000V is applied on the acceleration electrodes 21, 22 and then, the ion plating is carried out on the substrate 1, applying positive voltage or making as earthed potential.
COPYRIGHT: (C)1980,JPO&Japio
JP6851579A 1979-05-31 1979-05-31 Formation of covering film by ion plating Pending JPS55161066A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6851579A JPS55161066A (en) 1979-05-31 1979-05-31 Formation of covering film by ion plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6851579A JPS55161066A (en) 1979-05-31 1979-05-31 Formation of covering film by ion plating

Publications (1)

Publication Number Publication Date
JPS55161066A true JPS55161066A (en) 1980-12-15

Family

ID=13375922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6851579A Pending JPS55161066A (en) 1979-05-31 1979-05-31 Formation of covering film by ion plating

Country Status (1)

Country Link
JP (1) JPS55161066A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6365064A (en) * 1986-09-05 1988-03-23 Mitsutoyo Corp Micrometer
JPS6373354U (en) * 1986-11-01 1988-05-16

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6365064A (en) * 1986-09-05 1988-03-23 Mitsutoyo Corp Micrometer
JPS6373354U (en) * 1986-11-01 1988-05-16

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